[특허]Manufacture of high precision electronic components with ultra-high purity liquids

Manufacture of high precision electronic components with ultra-high purity liquids 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B08B-003/08 H01L-021/306
출원번호	US-0672665 (1991-03-19)
발명자 / 주소	Clark R. Scot (Fallbrook CA) Baird Stephen S. (Vista CA) Hoffman Joe G. (Cardiff-By-The-Sea CA)
출원인 / 주소	Startec Ventures, Inc. (Fallbrook CA 02)
인용정보	피인용 횟수 : 25 인용 특허 : 0

초록 ▼

Semiconductor wafers and other electronic parts which similarly require ultra-high purity manufacturing environments are treated with ultra-high purity liquid cleaning and etching agents prepared at the site of use from gaseous raw materials which have been purified to a level compatible with semico

대표청구항 ▼

A system for the manufacture of a high-precision electronic component, said system comprising: (a) a production line containing a plurality of workstations successively arranged for treating a workpiece to be formed into said electronic component, one such workstation selected for application of a liquid treatment agent to said workpiece; (b) means for conveying said workpiece to said workstations in succession along said production line; and (c) a subunit adjoining said production line at said selected workstation to supply said liquid treatment agent in ultra-high purity form, said subunit supplied by raw materials including a gaseous raw material selected from the group consisting of ammonia, hydrogen fluoride, hydrogen chloride, hydrogen bromide, phosphine, arsine, diborane and sulfur dioxide, and said subunit comprising: (i) means for purifying said gaseous raw material to a purity compatible with semiconductor manufacturing standards defined as a resistivity of at least about 15 megohm-cm at 25°C., less than about 25 ppb of electrolytes other than said raw material itself, a particulate content of less than about 150/cm3 and a particle size of less than 0.2 micron, a microorganism content of less than about 10/cm3and total organic carbon of less than 100 ppb; (ii) means for combining said gaseous raw material so purified with further raw material of a purity compatible with said semiconductor manufacturing standards, under conditions such that said gaseous raw material and said further raw material are converted to said ultra-high purity liquid treatment agent at a rate approximately equal to that at which said liquid treatment agent will be applied to a workpiece; and (iii) means for applying said ultra-high purity liquid treatment agent thus formed directly to a workpiece at said workstation; said production line, said conveying means and said subunit all being contained in an environment maintained free of contamination by said semiconductor manufacturing standards.

이 특허를 인용한 특허 (25)

Tansy,Brian L., Ammonia reclamation system.
상세보기
Pham Thanh, Apparatus and method for controlling process chamber pressure.
상세보기
Barton Jerome C., Apparatus and method for providing pulsed fluids.
상세보기
Munroe James Platt ; Samsal Richard Linton ; Greenawald Bruce Herman, Chemical generator with controlled mixing and concentration feedback and adjustment.
상세보기
Rodney L. Hill, Deionized water degasification for semiconductor fabrication.
상세보기
Takahashi,Osamu; Ogasawara,Kunio, Fabrication method of semiconductor integrated circuit device.
상세보기
Takahashi,Osamu; Ogasawara,Kunio, Fabrication method of semiconductor integrated circuit device.
상세보기
Takahashi,Osamu; Ogasawara,Kunio, Fabrication method of semiconductor integrated circuit device.
상세보기
Vines Landon B. ; Fujishiro Felix H. ; Han Yu-Pin, Integrated-circuit manufacture method with aqueous hydrogen-fluoride and nitric-acid oxide etch.
상세보기
Joe G. Hoffman ; Wallace I. Yuan, Ionic purifier.
상세보기
Christian M. Gronet ; Peter A. Knoot ; Gary E. Miner ; Guangcai Xing ; David R. Lopes ; Satheesh Kuppurao, Method and apparatus for insitu vapor generation.
상세보기
Tokai, Nobuo; Maeda, Yuji; Hashimoto, Masayuki, Method and system for forming film, semiconductor device and fabrication method thereof.
상세보기
Christenson Kurt K., Method and system to control the concentration of dissolved gas in a liquid.
상세보기
Gronet Christian M. ; Knoot Peter A. ; Miner Gary E. ; Xing Guangcai ; Lopes David R. ; Kuppurao Satheesh, Method for insitu vapor generation for forming an oxide on a substrate.
상세보기
Steven L. Nelson ; Kurt K. Christenson, Method for treating a substrate with heat sensitive agents.
상세보기
Shin, Seung Koo; Kim, Won Jung; Lim, Sung Jun, Method of etching semiconductor nanocrystals.
상세보기
Nelson, Steven L.; Christenson, Kurt K., Method to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized.
상세보기
Steven L. Nelson ; Kurt K. Christenson, Method to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized.
상세보기
Hoffman Joe G. ; Clark R. Scot, On-site ammonia purification for semiconductor manufacture.
상세보기
Joe G. Hoffman ; R. Scot Clark, On-site generation of ultra-high-purity buffered-HF and ammonium fluoride.
상세보기
Hoffman Joe G. ; Clark R. Scot, Point-of-use ammonia purification for electronic component manufacture.
상세보기
Grant Donald C. (Excelsior MN), Point-of-use recycling of wafer cleaning substances.
상세보기
Starner, Thomas C., Purification of ammonia.
상세보기
Tadahiro Ohmi JP; Kazuhiko Kawada JP; Toshihiro II JP; Masatoshi Hashino JP; Noboru Kubota JP, Wet cleaning apparatus utilizing ultra-pure water rinse liquid with hydrogen gas.
상세보기
Verhaverbeke Steven ; McConnell Christopher F. ; Trissel Charles F., Wet processing methods for the manufacture of electronic components using sequential chemical processing.
상세보기

IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표IPC 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 공고번호, 공고일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표출원인, 출원인국적, 출원인주소, 발명자, 발명자E, 발명자코드, 발명자주소, 발명자 우편번호, 발명자국적, 대표IPC, IPC코드, 요약, 미국특허분류, 대리인주소, 대리인코드, 대리인(한글), 대리인(영문), 국제공개일자, 국제공개번호, 국제출원일자, 국제출원번호, 우선권, 우선권주장일, 우선권국가, 우선권출원번호, 원출원일자, 원출원번호, 지정국, Citing Patents, Cited Patents
저장형식	Text(ASCII format) Excel format PIAS분석(.xls)
메일정보	받는사람 (필수) @ 보내는사람 (선택) @ 제목 내용 KISTI 검색결과 이메일 서비스
안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

연합인증

Manufacture of high precision electronic components with ultra-high purity liquids 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

이 특허를 인용한 특허 (25)

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

연합인증

Manufacture of high precision electronic components with ultra-high purity liquids 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

전체(0) 논문(0) 특허(0) 보고서(0)

전체(0) 논문(0) 특허(0) 보고서(0)

이 특허를 인용한 특허 (25)

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트