IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0878570
(1992-05-05)
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우선권정보 |
JP-0135385 (1991-05-13) |
발명자
/ 주소 |
- Yamaguchi Toshio (Narashino JPX) Kobayashi Yasushi (Chiba JPX)
|
출원인 / 주소 |
- Toyo Engineering Corporation (Tokyo JPX 03)
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인용정보 |
피인용 횟수 :
9 인용 특허 :
0 |
초록
▼
Separation process of gaseous impurities from hydrogen gas by the known pressure swing adsorption method uses a holding column of the feed-in/feed-out sequence retaining type and at least three adsorption columns containing adsorbents. Each adsorption column is pressurized and depressurized in cycle
Separation process of gaseous impurities from hydrogen gas by the known pressure swing adsorption method uses a holding column of the feed-in/feed-out sequence retaining type and at least three adsorption columns containing adsorbents. Each adsorption column is pressurized and depressurized in cycle to repeat adsorption and desorption, during which the holding column is used as an intermediate gas reservoir so that the efficiency of the separation of the impurity can be improved. In this invention, at least one of the following structures is used as the holding column: j) at least one row of spaces divided by partition walls and arranged in series; k) at least one hollow body; and l) at least one row of divided compartments arranged in series.
대표청구항
▼
A process for separating gaseous impurities from a gaseous mixture by using a multiplicity of adsorption columns containing adsorbents, thereby to obtain a purified gas; the process including repeating alternate, cyclic adsorption and desorption as to at least three of the adsorption columns, which
A process for separating gaseous impurities from a gaseous mixture by using a multiplicity of adsorption columns containing adsorbents, thereby to obtain a purified gas; the process including repeating alternate, cyclic adsorption and desorption as to at least three of the adsorption columns, which comprises the following steps a to i: a) feeding the gaseous mixture into a first adsorption column through an inlet thereof, discharging the purified gas through an outlet of the first adsorption column, and terminating the feeding and discharging before the first adsorption column has no remaining adsorbing ability any longer and the purity of the purified gas falls below a target level; b) communicating an outlet of at least one other adsorption column, whose adsorbent has been regenerated, to the outlet of the first adsorption column already subjected to the step a, whereby both the adsorption columns are equalized in pressure, and then eliminating the communication; c) communicating the outlet of the first adsorption column, which has been subjected to step b, to a first end of a holding column which is a feed-in/feed-out sequence retaining type and contains a gas received as a result of communication of a second end of the holding column with at least one outlet of the other adsorption columns having been subjected to steps a and b like the first adsorption column, whereby the gas inside the first adsorption column is allowed to enter the holding column until the breakthrough of the components adsorbed on the adsorbent bed of the first adsorption column begins to occur in the gas; and, during the entrance of the gas from the first adsorption column into the holding column, maintaining the second end of the holding column in communication with an outlet of a second adsorption column already subjected to steps a, b and c and also to the below-described step e, whereby the second adsorption column is purged with the gas forced out of the holding column by the gas flowed into the holding column, the last-mentioned gas optionally containing a portion of the purified gas as needed; d) closing a purge valve of the second adsorption column as needed, whereby the second adsorption column and the first adsorption column are communicated to each other and equalized in pressure, and then eliminating the communication; e) closing the outlet of the first adsorption column already subjected to step c or d and depressurizing the first adsorption column to a lowest pressure by a purge valve provided on the side of the inlet of the first adsorption column, whereby the components adsorbed on the adsorbent bed of the first adsorption column is desorbed and eliminated; f) communicating an outlet of a third adsorption column, which has been subjected to steps a and b like the first adsorption column, to the second end of the holding column, whereby the gas inside the third adsorption column is allowed to enter the holding column until the breakthrough of the components adsorbed on the adsorbent bed of the third adsorption column begins to occur in the gas, said gas entering the holding column optionally containing a portion of the purified gas as needed; and, during the entrance of the gas from the third adsorption column into the holding column, maintaining the first end of the holding column in communication with the outlet of the first adsorption column already subjected to step e, whereby the first adsorption column is purged with the gas forced out of the holding column by the gas flowed into the holding column, the last-mentioned gas optionally containing a portion of the purified gas as needed; g) closing the purge valve of the first adsorption column as needed, whereby the first adsorption column and the third adsorption column are communicated to each other and equalized in pressure, and then eliminating the communication; h) communicating the outlet of at least one other absorption column, which has been subjected to step a or steps a and b like the first adsorption column, to the outlet of the first adsorption column, which has been subjected to step f or g, while closing both an inlet of said at least one other adsorption column and the inlet of the first adsorption column, whereby the gas inside said at least one other adsorption column is allowed to enter the first adsorption column, the last-mentioned gas optionally containing a portion of the purified gas as needed, to subject both said at least one other adsorption column and the first adsorption column to at least one pressure equalizing operation, and then eliminating the communication; and i) causing a gas of the same quality as the purified gas to flow into the first adsorption column, which has been subjected to step h, through the outlet thereof while closing the inlet thereof, whereby the pressure of the first adsorption column is equalized with that of the gas of the same quality as the purified gas, and then closing the outlet of the first adsorption column; wherein said holding column comprises one or a combination of the following structures: j) at least one row of spaces divided by partition walls and arranged in series; k) at least one hollow body; and l) at least one row of divided compartments arranged in series; and where the holding column is either said j or k, the holding column has L3/V of at least 200, L being the length of the flow passage of the holding column as expressed in terms of meters (m) and V being the volume of the flow passage of the holding column as expressed in terms of cubic meters (m3); and, where the holding column is said l, the total number (N) of the divided compartments in each row is at least 20.
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