초록 ▼

A multilayer antireflection coating designed for deposition in in-line coating machines by DC reactive sputtering. About half of the total thickness of the coating may be formed from zinc oxide which has a high sputtering rate. Conductive transparent materials including aluminum doped zinc oxide, an

A multilayer antireflection coating designed for deposition in in-line coating machines by DC reactive sputtering. About half of the total thickness of the coating may be formed from zinc oxide which has a high sputtering rate. Conductive transparent materials including aluminum doped zinc oxide, antimony doped tin oxide, cadmium tin oxide, and indium tin oxide may be included in the coating.

대표청구항 ▼

An antireflection coating for a substrate, comprising: five adjoining layers, said layers designated the first, second, third, fourth, and fifth in consecutive numerical order beginning with the layer farthest from said substrate; said first layer having a refractive index less than the refractive i

An antireflection coating for a substrate, comprising: five adjoining layers, said layers designated the first, second, third, fourth, and fifth in consecutive numerical order beginning with the layer farthest from said substrate; said first layer having a refractive index less than the refractive index of said substrate and an optical thickness of about 0.25 l0; said second layer having a refractive index greater than about 2.20 and an optical thickness less than about 0.25 l0; said third layer having a refractive index less than said second layer and an optical thickness between about 0.25 l0 and 0.5 l0, said third layer including a transparent electrically conductive material; said fourth layer having a refractive index less than that of said third layer and an optical thickness less than about 0.25 l0; said fifth layer having a refractive index greater than the refractive index of said substrate and said fourth layer, and an optical thickness less than about 0.25 l0; and l0 being between about 480 nm and 560 nm.