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Surface cleaning using an argon or nitrogen aerosol 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-005/00
출원번호 US-0970346 (1992-11-02)
발명자 / 주소
  • McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Northampton PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Milwood NY) Schwarz Alexander (Bethlehem PA) Wolfe Henry L. (Pleasant Valley NY)
출원인 / 주소
  • Air Products and Chemicals, Inc. (Allentown PA 02) International Business Machines Corporation (Hopewell Junction NY 02)
인용정보 피인용 횟수 : 170  인용 특허 : 0

초록

A method is disclosed for cleaning microelectronic surfaces using an aerosol of at least substantially solid argon or nitrogen particles which impinge upon the surface to be cleaned and then evaporate and the resulting gas is removed by venting along with the contaminants dislodged by the cleaning m

대표청구항

A method for removing contaminating particles and/or films from a particle and/or film-containing surface using an impinging stream of an at least substantially solid argon or nitrogen particle-containing aerosol, comprising: expanding a pressurized liquid argon or gaseous and/or liquid nitrogen-con

이 특허를 인용한 특허 (170)

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