이 특허를 인용한 특허 (150)

1. Fishkin Boris ; Brown Kyle A., Aerosol substrate cleaner.

   상세보기
2. McSherry, David D.; Staub, Richard K.; Tallman, Dan N.; Li, Junzhong; Lokkesmoe, Keith D., Apparatus and method for making a peroxycarboxylic acid.

   상세보기
3. McSherry, David D.; Staub, Richard K.; Tallman, Dan; Li, Junzhong; Lokkesmoe, Keith D., Apparatus and method for making a peroxycarboxylic acid.

   상세보기
4. McSherry, David D.; Staub, Richard K.; Tallman, Dan; Li, Junzhong; Lokkesmoe, Keith D., Apparatus and method for making a peroxycarboxylic acid.

   상세보기
5. Crank, Douglas; Johnson, Jr., Arthur H.; Meyers, William F.; Allen, Clinton L., Apparatus and method for the automated cleaning of articles.

   상세보기
6. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.

   상세보기
7. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John, Apparatus and system for cleaning a substrate.

   상세보기
8. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.

   상세보기
9. de Larios,John M.; Owczarz,Aleksander; Schoepp,Alan; Redeker,Fritz, Apparatuses and methods for cleaning a substrate.

   상세보기
10. Smith, Alan; Wood, Nigel Charles, Back pressure regulator.

    상세보기
11. Smith, Alan; Wood, Nigel Charles, Back pressure regulator.

    상세보기
12. Yoshida, Takashi; Iwasaki, Motoaki; Yano, Tatsuro; Habaya, Kurao; Shiroma, Takahiro, Cleaning method and apparatus.

    상세보기
13. Hopple George B. ; Crane Scott J. ; Mackey Bob L. ; Porter John D., Cleaning of flat-panel display.

    상세보기
14. Adler Robert,ATX, Cleaning of workpieces having organic residues.

    상세보기
15. DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.

    상세보기
16. DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.

    상세보기
17. DeSimone Joseph M. ; Romack Timothy J. ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.

    상세보기
18. Racette, Timothy L.; Damaso, Gene R.; Schulte, James E., Cleaning process utilizing an organic solvent and a pressurized fluid solvent.

    상세보기
19. Clark, Shan C.; Ramachandrarao, Vijayakumar S.; Turkot, Jr., Robert B., Cleaning residues from semiconductor structures.

    상세보기
20. Damaso, Gene R.; Schulte, James E.; Racette, Timothy L., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.

    상세보기
21. Damaso,Gene R.; Schulte,James E.; Racette,Timothy L., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.

    상세보기
22. Racette,Timothy L.; Damaso,Gene R.; Schulte,James E., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.

    상세보기
23. Schulte, James E.; Racette, Timothy L.; Damaso, Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.

    상세보기
24. Schulte, James E.; Racette, Timothy L.; Damaso, Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.

    상세보기
25. Schulte, James E.; Racette, Timothy L.; Damaso, Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.

    상세보기
26. Schulte, James E.; Racette, Timothy L.; Damaso, Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.

    상세보기
27. Schulte,James E.; Racette,Timothy L.; Damaso,Gene R., Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.

    상세보기
28. Timothy L. Racette ; Gene R. Damaso ; James E. Schulte, Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent.

    상세보기
29. Davenhall, Leisa B.; Rubin, James B.; Taylor, Craig M. V., Composition and method for removing photoresist materials from electronic components.

    상세보기
30. Leisa B. Davenhall ; James B. Rubin, Composition and method for removing photoresist materials from electronic components.

    상세보기
31. Daly Andrew T. ; Decker Owen H. ; Wursthorn Karl R. ; Houda Frank R., Continuous processing of powder coating compositions.

    상세보기
32. Daly Andrew T. ; Decker Owen H. ; Wursthorn Karl R. ; Houda Frank R. ; Grundowski Leo T. ; Ernst Carl W., Continuous processing of powder coating compositions.

    상세보기
33. Daly Andrew T. ; Decker Owen H. ; Wursthorn Karl R. ; Houda Frank R. ; Grundowski Leo T. ; Ernst Carl W., Continuous processing of powder coating compositions.

    상세보기
34. Daly, Andrew T.; Decker, Owen H.; Wursthorn, Karl R.; Houda, Frank R.; Grundowski, Leo T.; Ernst, Carl W., Continuous processing of powder coating compositions.

    상세보기
35. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.

    상세보기
36. Hei, Robert D. P.; Olson, Keith E.; Ryther, Robert J.; Staub, Richard K., Critical fluid antimicrobial compositions and their use and generation.

    상세보기
37. Arena Foster,Chantal J.; Awtrey,Allan Wendell; Ryza,Nicholas Alan; Schilling,Paul, Developing photoresist with supercritical fluid and developer.

    상세보기
38. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Developing photoresist with supercritical fluid and developer.

    상세보기
39. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Drying resist with a solvent bath and supercritical CO2.

    상세보기
40. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.

    상세보기
41. Jones, William D., High pressure fourier transform infrared cell.

    상세보기
42. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.

    상세보기
43. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.

    상세보기
44. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.

    상세보기
45. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.

    상세보기
46. Sano,Kan, Magnetic element.

    상세보기
47. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.

    상세보기
48. Freer, Erik M.; deLarios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a semiconductor substrate.

    상세보기
49. Freer, Erik M.; deLarios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a semiconductor substrate.

    상세보기
50. de Larios, John M.; Ravkin, Mike; Farber, Jeffrey; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a substrate using non-Newtonian fluids.

    상세보기
51. de Larios, John M.; Ravkin, Mike; Farber, Jeffrey; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a substrate using non-newtonian fluids.

    상세보기
52. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.

    상세보기
53. Zhu, Ji; Mendiratta, Arjun; Mui, David, Method and apparatus for removing contaminants from substrate.

    상세보기
54. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John, Method and apparatus for removing contamination from substrate.

    상세보기
55. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.

    상세보기
56. de Larios,John M.; Ravkin,Mike; Parks,John; Korolik,Mikhail; Redeker,Fred C., Method and apparatus for transporting a substrate using non-Newtonian fluid.

    상세보기
57. Jakimov, Andreas; Schneiderbanger, Stefan; Hertter, Manuel, Method and device for coating components.

    상세보기
58. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C., Method and material for cleaning a substrate.

    상세보기
59. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.

    상세보기
60. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.

    상세보기
61. Thomsen, Jens Peder Høg; Leth, Søren; Stenstrup, Martin Mose, Method and system for flushing a pipe system using a fluid in a supercritical state.

    상세보기
62. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.

    상세보기
63. Inoue, Yoichi; Sakashita, Yoshihiko; Watanabe, Katsumi; Kawakami, Nobuyuki; Ishii, Takahiko; Muraoka, Yusuke; Saito, Kimitsugu; Iwata, Tomomi; Mizobata, Ikuo; Miyake, Takashi; Kitakado, Ryuji, Method and system for processing substrate.

    상세보기
64. Stucker John F., Method and system for rejuvenating pressurized fluid solvents used in cleaning substrates.

    상세보기
65. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.

    상세보기
66. Korolik, Mikhail; Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Mike; Redeker, Fritz, Method and system for using a two-phases substrate cleaning compound.

    상세보기
67. Hendrix Walter A. ; Montero Gerardo A. ; Smith C. Brent ; Butcher Donald L., Method for introducing dyes and other chemicals into a textile treatment system.

    상세보기
68. Hendrix, Walter A.; Montero, Gerardo A.; Smith, C. Brent; Butcher, Donald L., Method for introducing dyes and other chemicals into a textile treatment system.

    상세보기
69. McSherry, David D.; Staub, Richard K.; Tallman, Dan N.; Li, Junzhong; Lokkesmeo, Keith E., Method for making a peroxycarboxylic acid.

    상세보기
70. McSherry, David D.; Staub, Richard; Tallman, Dan N.; Li, Junzhong; Lokkesmoe, Keith D., Method for making a peroxycarboxylic acid.

    상세보기
71. McSherry, David D.; Staub, Richard; Tallman, Dan N.; Li, Junzhong; Lokkesmoe, Keith D., Method for making a peroxycarboxylic acid.

    상세보기
72. Friedrich-Georg Martin DE; Armin Schraut DE; Josef Wekerle DE, Method for preventing, removing or reducing deposits in apparatus parts during the esterification of acrylic or methacrylic acids.

    상세보기
73. Stucker John F., Method for rejuvenating pressurized fluid solvent used in cleaning a fabric article.

    상세보기
74. Kim Jae-Jeong,KRX, Method for removing etch residue material.

    상세보기
75. Korolik, Mikhail; Ravkin, Michael; deLarios, John; Redeker, Fritz C.; Boyd, John M., Method for removing material from semiconductor wafer and apparatus for performing the same.

    상세보기
76. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.

    상세보기
77. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.

    상세보기
78. Arai Kunio,JPX ; Inomata Hiroshi,JPX ; Smith Richard Lee,JPX, Method for using high density compressed liquefied gases in cleaning applications.

    상세보기
79. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

    상세보기
80. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

    상세보기
81. Smith Carl Brent ; Montero Gerardo A. ; Hendrix Walter A., Method of dyeing hydrophobic textile fibers with colorant materials in supercritical fluid carbon dioxide.

    상세보기
82. DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Method of entraining solid particulates in carbon dioxide fluids.

    상세보기
83. Jackson, David P., Method of forming cryogenic fluid composition.

    상세보기
84. Hillman,Joseph, Method of inhibiting copper corrosion during supercritical COcleaning.

    상세보기
85. Jorgensen, Robert J.; Wagner, Burkhard E., Method of making Ziegler-Natta type catalysts.

    상세보기
86. Toma,Dorel Ioan; Schilling,Paul, Method of passivating of low dielectric materials in wafer processing.

    상세보기
87. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.

    상세보기
88. Schilling,Paul, Method of treating a composite spin-on glass/anti-reflective material prior to cleaning.

    상세보기
89. Schilling,Paul, Method of treatment of porous dielectric films to reduce damage during cleaning.

    상세보기
90. Micka, Joel; Arias, Carlos, Methods and systems for applying sprout inhibitors and/or other substances to harvested potatoes and/or other vegetables in storage facilities.

    상세보기
91. Mikhaylichenko, Katrina; Ravkin, Mike; Redeker, Fritz; de Larios, John M.; Freer, Erik M.; Korolik, Mikhail, Methods for contained chemical surface treatment.

    상세보기
92. Matts, Emory H.; Man, Victor Fuk-Pong; Magnuson, Joshua P.; Barcay, S. John; Tarara, James J.; Nelson, Thomas D., Methods for reducing the population of arthropods with medium chain peroxycarboxylic acid compositions.

    상세보기
93. Hoffman Roger J. (Cumming GA) Terry ; Jr. Wilson L. (Alpharetta GA), Methods of deblocking, extracting and cleaning polymeric articles with supercritical fluids.

    상세보기
94. Kao, Sun-Chueh; Cao, Phuong A.; Harlan, C. Jeff; Khokhani, Parul A.; Rodriguez, George; Rix, Francis C.; Giesbrecht, Garth R., Methods of preparing a catalyst system.

    상세보기
95. Man, Victor Fuk-Pong; Fasching, Gina Marie; Peitersen, Nathan Daniel; Altier, Mark Raymond, Neutral or alkaline medium chain peroxycarboxylic acid compositions and methods employing them.

    상세보기
96. Brian M. Frankie ; Robert M. Zubrin ; Scott E. Lowther, Nitrous oxide based oxygen supply system.

    상세보기
97. Frankie,Brian M.; Zubrin,Robert M.; Lowther,Scott E., Nitrous oxide based oxygen supply system.

    상세보기
98. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.

    상세보기
99. Korzenski, Michael B.; Baum, Thomas H., Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist.

    상세보기
100. Smith, Alan A.; Wood, Nigel C.; Thomas, Michael A., Paint circulating system and method.

     상세보기
101. Dwarakanath, Varadarajan; Dean, Robert M.; Kim, Do Hoon; Alexis, Dennis Arun; Thach, Sophany; Malik, Taimur; Poulsen, Anette; Subrahmanyan, Sumitra, Polymer compositions.

     상세보기
102. Dwarakanath, Varadarajan; Dean, Robert M.; Kim, Do Hoon; Alexis, Dennis Arun; Thach, Sophany; Malik, Taimur; Poulsen, Anette; Subrahmanyan, Sumitra, Polymer compositions.

     상세보기
103. Dwarakanath, Varadarajan; Dean, Robert M.; Kim, Do Hoon; Alexis, Dennis Arun; Thach, Sophany; Malik, Taimur; Poulsen, Anette; Subrahmanyan, Sumitra, Polymer compositions.

     상세보기
104. Dwarakanath, Varadarajan; Dean, Robert M.; Kim, Do Hoon; Alexis, Dennis Arun; Thach, Sophany; Malik, Taimur; Poulsen, Anette; Subrahmanyan, Sumitra, Polymer compositions.

     상세보기
105. Sauer Richard A. ; Hubert Jean-Luc ; Connors Robert W., Pressure-swing absorption based cleaning methods and systems.

     상세보기
106. John Michael Cotte ; Kenneth John McCullough ; Wayne Martin Moreau ; Keith R. Pope ; John P. Simons ; Charles J. Taft, Process and apparatus for cleaning filters.

     상세보기
107. Ryza, Nicholas A.; Awtrey, Allan W., Process and apparatus for removing a contaminant from a substrate.

     상세보기
108. Wuester,Christopher D., Process flow thermocouple.

     상세보기
109. John Michael Cotte ; Donald J. Delehanty ; Kenneth John McCullough ; Wayne Martin Moreau ; John P. Simons ; Charles J. Taft ; Richard P. Volant, Process for removing chemical mechanical polishing residual slurry.

     상세보기
110. Smith, Carl Brent; Hendrix, Walter A.; Butcher, Donald L., Process for treating textile substrates.

     상세보기
111. Mullee,William H.; de Leeuwe,Marc; Roberson, Jr.,Glenn A.; Palmer,Bentley J., Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process.

     상세보기
112. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.

     상세보기
113. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.

     상세보기
114. Bertram, Ronald Thomas; Scott, Douglas Michael, Removal of contaminants from a fluid.

     상세보기
115. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Removal of fluorine or chlorine residue by liquid CO.sub.2.

     상세보기
116. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

     상세보기
117. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

     상세보기
118. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.

     상세보기
119. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.

     상세보기
120. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.

     상세보기
121. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Residue removal by supercritical fluids.

     상세보기
122. Micka, Joel; Decker, Mark, Reverse cycle defrost method and apparatus.

     상세보기
123. Hichri, Habib; Malone, Kelly; Martin, Arthur, Semiconductor wafer including a low dielectric constant thermosetting polymer film and method of making same.

     상세보기
124. Fehr, David L.; Van Keulen, Dennis J., Spray system pump wash sequence.

     상세보기
125. Freer, Erik M.; de Larios, John M.; Ravkin, Michael; Korolik, Mikhail; Mikhaylichenko, Katrina; Redeker, Fritz C., Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions.

     상세보기
126. Dickinson, C. John; Jansen, Frank; Murphy, Daimhin P., Substrate processing apparatus and related systems and methods.

     상세보기
127. Chandra, Mohan; Mount, David J.; Costantini, Michael A.; Moritz, Heiko D.; Jafri, Ijaz; Boyd, Jim; Heathwaite, Rick M., Supercritical fluid cleaning process for precision surfaces.

     상세보기
128. Kittle, Paul A., Surface treatment of semiconductor substrates.

     상세보기
129. Wilkinson Steven Paul ; Schweighardt Frank Kenneth ; Robeson Lloyd Mahlon, Surfactants for use in liquid/supercritical CO.sub.2.

     상세보기
130. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.

     상세보기
131. Daly, Andrew T.; Decker, Owen H.; Wursthorn, Karl R.; Houda, Frank R.; Grundowski, Leo T.; Ernst, Carl W., System for continuous processing of powder coating compositions.

     상세보기
132. Stucker John F., System for rejuvenating pressurized fluid solvents used in cleaning substrates.

     상세보기
133. Wikstrom, Jon P.; Schiller, Dan; Turner, Jon R., System for use of land fills and recyclable materials.

     상세보기
134. Wikstrom,Jon P.; Schiller,Dan; Turner,Jon R., System for use of land fills and recyclable materials.

     상세보기
135. Wikstrom,Jon P.; Schiller,Dan; Turner,Jon R.; Svoboda,Charles J., System for use of land fills and recyclable materials.

     상세보기
136. Micka, Joel, Systems and methods for inhibiting spoilage of stored crops.

     상세보기
137. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.

     상세보기
138. Gutzmann, Timothy A.; Anderson, Brian J.; Reed, Pamela J.; Cords, Bruce R.; Grab, Lawrence A.; Richardson, Edward H., Treatment of animal carcasses.

     상세보기
139. Gutzmann, Timothy A.; Anderson, Brian J.; Reed, Pamela J.; Cords, Bruce R.; Grab, Lawrence A.; Richardson, Edward H., Treatment of animal carcasses.

     상세보기
140. Gutzmann, Timothy A.; Anderson, Brian J.; Reed, Pamela J.; Cords, Bruce R.; Grab, Lawrence A.; Richardson, Edward H., Treatment of animal carcasses.

     상세보기
141. Gutzmann, Timothy A.; Anderson, Brian J.; Reed, Pamela J.; Cords, Bruce R.; Grab, Lawrence A.; Richardson, Edward H., Treatment of animal carcasses.

     상세보기
142. Gutzmann, Timothy A.; Anderson, Brian J.; Reed, Pamela J.; Cords, Bruce R.; Grab, Lawrence A.; Richardson, Edward H., Treatment of animal carcasses.

     상세보기
143. Bawa Rajan S. ; Tasber Frank ; Hahn Dennis, Treatment of contact lenses with supercritical fluid.

     상세보기
144. Bawa Rajan S. ; Tasber Frank ; Hahn Dennis, Treatment of contact lenses with supercritical fluid.

     상세보기
145. Bawa, Rajan S.; Tasber, Frank; Hahn, Dennis, Treatment of contact lenses with supercritical fluid.

     상세보기
146. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.

     상세보기
147. Stokes, Jennifer; Silvernail, Carter M.; Olson, Erik C.; Lange, Steven J.; Li, Junzhong; Sun, Xin; Brewster, Allison; Staub, Richard, Two step method of cleaning, sanitizing, and rinsing a surface.

     상세보기
148. Akatsu Hiroyuki, Wafer cleaning with dissolved gas concentration control.

     상세보기
149. Knipe ; Jr. Richard E. (Montebello NY) Jacob Savarimuthu M. (Edison NJ) Mancini Thomas (Lincoln Park NJ), Water-based flushing for paints and other coatings.

     상세보기
150. Knipe ; Jr. Richard E. (Montebello NY) Jacob Savarimuthu M. (Edison NJ) Mancini Thomas (Lincoln Park NJ), Water-based flushing for paints and other coatings.

     상세보기
더보기