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Apparatus for forming a thin film with a mist forming means 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05C-011/04
출원번호 US-0877749 (1992-05-04)
발명자 / 주소
  • McMillan Larry D. (Colorado Springs CO) Paz de Araujo Carlos A. (Colorado Springs CO) Roberts Tom L. (Colorado Springs CO)
출원인 / 주소
  • Symetrix Corporation (Colorado Springs CO 02)
인용정보 피인용 횟수 : 53  인용 특허 : 0

초록 ▼

A method and apparatus are disclosed for generating fine mists of liquids using a rotating turbine blade disposed within an enclosure. A mixture of a liquid and a carrier gas are flowed into the enclosure such that it immediately impacts on the rotating turbine blade disposed near a lower end of the

대표청구항 ▼

Apparatus for forming a ferroelectric, super-conducting, or high dielectric constant thin film, said apparatus comprising: a source of a liquid, said liquid comprising one or more chemical elements; an enclosure; liquid introduction means for introducing liquid from said liquid source into said encl

이 특허를 인용한 특허 (53)

  1. Potterfield, Russell A.; Zara, Robert Joseph; Gianladis, Jim; Wasson, Mark; Birk, Adam; Cauley, Dennis, Adjustable shooting rests and shooting rest assemblies.
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  2. Potterfield, Russell A.; Zara, Robert Joseph; Gianladis, Jim; Wasson, Mark; Birk, Adam; Cauley, Dennis, Adjustable shooting rests and shooting rest assemblies.
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  3. Potterfield, Russell A.; Zara, Robert Joseph; Gianladis, Jim; Wasson, Mark; Birk, Adam; Cauley, Dennis, Adjustable shooting rests and shooting rest assemblies.
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  4. Miyano,Junichi; Toshikawa,Kiyohiko; Motoyama,Yoshikazu, Apparatus and method for manufacturing semiconductor.
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  5. Ruta Constantin I. ; Blette Russell E. ; Lyons Christopher S. ; Fleming Robert J., Apparatus and method of atomizing and vaporizing.
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  6. Klinedinst Keith A. (Marlborough MA) Lester Joseph E. (Lincoln MA), Apparatus for the controlled delivery of vaporized chemical precursor to an LPCVD reactor.
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  7. Derderian, Garo J.; Basceri, Cem; Sandhu, Gurtej S.; Sarigiannis, Demetrius, Atomic layer deposition apparatus and methods.
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  8. Potterfield, Russell A.; Kinney, Tim; Cauley, Dennis; Zhou, Yan-Jiang, Attachment mechanisms for coupling firearms to supporting structures.
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  9. Potterfield, Russell A.; Kinney, Tim; Cauley, Dennis; Zhou, Yan-Jiang, Attachment mechanisms for coupling firearms to supporting structures.
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  10. Potterfield, Russell A.; Morrow, Tim; Zhou, Yan-Jiang; Kinney, Tim; Cauley, Dennis; Yale, Dave; Zara, Robert J., Bipod device for use with a firearm.
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  11. Potterfield, Russell A.; Morrow, Tim; Zhou, Yan-Jiang; Kinney, Tim; Cauley, Dennis; Yale, David; Zara, Robert Joseph, Bipod device for use with a firearm.
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  12. Mardian, Allen P.; Sandhu, Gurtej S., Chemical vapor deposition methods, and atomic layer deposition method.
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  13. Potterfield, Russell A.; Morrow, Tim, Containers for carrying firearm accessories and/or supporting firearms.
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  14. Azuma Masamichi ; McMillan Larry D. ; Paz De Araujo Carlos A. ; Scott Michael C., Electrical component having low-leakage current and low polarization fatigue made by UV radiation process.
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  15. Coffield, III, Orus R., Firearm cleaning apparatus with protective coating.
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  16. Cauley, Jr., Dennis W.; Gianladis, James; Birk, Adam J.; Kinamore, Matthew; Poehlman, Michael, Firearm shooting rest.
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  17. Yale, Dave; Potterfield, Russell A.; Morrow, Tim, Firearm supporting devices, methods of assembling firearm supporting devices, and methods of packaging firearm supporting devices.
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  18. Potterfield, Russell A.; Morrow, Tim; Banham, Brook, Firearm supports, such as shooting bags, and firearm support assemblies.
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  19. Zara, Robert Joseph, Firearm targets and methods for manufacturing firearm targets.
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  20. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman; Chang, Mei, Gas delivery apparatus for atomic layer deposition.
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  21. Gianladis, James; Cottrell, Michael; Poehlman, Michael; Birk, Adam J.; Cauley, Dennis, Gun support apparatus.
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  22. Kong Peter C. ; Watkins Arthur D., Liquid injection plasma deposition method and apparatus.
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  23. Azuma, Masamichi; Paz de Araujo, Carlos A., Metal insulator structure with polarization-compatible buffer layer.
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  24. Sun, James J.; Liu, Benjamin Y. H., Method and apparatus for deposition of particles on surfaces.
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  25. Dick, William; Liu, Benjamin Y. H., Method and apparatus for generating charged particles for deposition on a surface.
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  26. Solayappan Narayan ; McMillan Larry D. ; Paz de Araujo Carlos A., Method and apparatus for misted deposition of integrated circuit quality thin films.
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  27. Solayappan Narayan ; Grant Robert W. ; McMillan Larry D. ; Paz de Araujo Carlos A., Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size.
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  28. Solayappan Narayan ; Grant Robert W. ; McMillan Larry D. ; Paz de Araujo Carlos A., Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size.
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  29. Paz de Araujo Carlos A. ; McMillan Larry D. ; Solayappan Narayan ; Bacon Jeffrey W., Method and apparatus for preparing integrated circuit thin films by chemical vapor deposition.
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  30. James J. Sun ; Benjamin Y. H. Liu ; Virgil A. Marple, Method and apparatus for thin film deposition on large area substrates.
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  31. Senateur Jean-Pierre,FRX ; Madar Roland,FRX ; Weiss Francois,FRX ; Thomas Olivier,FRX ; Abrutis Adulfas,FRX, Method and device for introducing precursors into chamber for chemical vapor deposition.
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  32. Hayashi, Shinichiro; McMillan, Larry D.; Paz de Araujo, Carlos A., Method of liquid deposition by selection of liquid viscosity and other precursor properties.
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  33. Shinichiro Hayashi JP; Larry D. McMillan ; Carlos A. Paz de Araujo, Method of liquid deposition by selection of liquid viscosity and other precursor properties.
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  34. Rebstock, Lutz, Methods and apparatuses for roll-on coating.
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  35. Kobayashi, Tatsuo, Mist testing device.
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  36. Hayashi Shinichiro ; McMillan Larry D. ; Azuma Masamichi,JPX ; Paz de Araujo Carlos A., Misted precursor deposition apparatus and method with improved mist and mist flow.
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  37. Potterfield, Russell A.; Yale, David, Modular shooting rests and shooting rest assemblies.
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  38. Dougherty Thomas K. ; Ramer O. Glenn, Process for making stoichiometric mixed metal oxide films.
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  39. Uchiyama, Kiyoshi; Paz de Araujo, Carlos A.; Tanaka, Keisuke, Rapid-temperature pulsing anneal method at low temperature for fabricating layered superlattice materials and making electronic devices including same.
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  40. Cauley, Dennis; Morrow, Tim, Recoil-reducing shooting rest.
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  41. Sun, James J.; Liu, Benjamin Y. H., Scanning deposition head for depositing particles on a wafer.
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  42. Morrow, Tim; Dale, Jacob; Zhou, Yan-Jiang; Kinney, Tim; Cauley, Dennis; Liang, Lucie; Potterfield, Russell A., Shooting gallery devices and methods.
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  43. Morrow, Tim; Potterfield, Larry; Potterfield, Russell A.; Zara, Robert Joseph, Shooting rests for supporting firearms.
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  44. Morrow, Tim; Potterfield, Larry; Potterfield, Russell A.; Zara, Robert Joseph; Cauley, Dennis, Shooting rests for supporting firearms.
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  45. Morrow, Tim; Potterfield, Larry; Potterfield, Russell A.; Zara, Robert Joseph; Cauley, Dennis, Shooting rests for supporting firearms.
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  46. Cauley, Dennis; Birk, Adam; Kinney, Tim; Cottrell, Michael E.; Zhou, Yan-Jiang; Potterfield, Russell A.; Gianladis, Jim; Zara, Robert J., Shooting rests with adjustable height assemblies.
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  47. Cauley, Dennis; Birk, Adam; Kinney, Tim; Cottrell, Michael E.; Zhou, Yan-Jiang; Potterfield, Russell A.; Gianladis, Jim; Zara, Robert Joseph, Shooting rests with adjustable height for supporting firearms.
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  48. Hampden-Smith Mark ; Caruso James ; Chandler Clive, Solution routes to metal oxide films through ester elimination reactions.
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  49. Potterfield, Russell A.; Kinney, Tim; Birk, Adam; Zara, Robert J.; Gianladis, Jim, Stowable shooting target assemblies.
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  50. Potterfield, Russell A.; Cauley, Dennis, System and container for organizing and carrying tools and tool sets.
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  51. Azuma Masamichi ; McMillan Larry D. ; Paz de Araujo Carlos A. ; Scott Michael C., UV radiation process for making electronic devices having low-leakage-current and low-polarization fatigue.
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  52. Lyons Christopher S. ; Ruta Constantin I. ; Fleming Robert J. ; Blette Russell E., Vapor coating apparatus.
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  53. Lyons Christopher S. ; Ruta Constantin I. ; Fleming Robert J. ; Blette Russell E. ; Wright Robin E. ; Tokie Jeffrey H., Vapor coating method.
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