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Closed container to be used in a clean room 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65B-001/04
  • H01L-021/00
출원번호 US-0042644 (1993-04-05)
우선권정보 JP-0084411 (1992-04-07)
발명자 / 주소
  • Yamashita, Teppei
  • Murata, Masanao
  • Tanaka, Tsuyoshi
  • Morita, Teruya
  • Kawano, Hitoshi
  • Okuno, Atsushi
  • Tsuda, Masanori
  • Hayashi, Mitsuhiro
출원인 / 주소
  • Shinko Electric Co., Ltd.
대리인 / 주소
    Bacon & Thomas
인용정보 피인용 횟수 : 43  인용 특허 : 4

초록

A wafer storing, closed container for use in a clean room of a semiconductor manufacturing system is provided with an attached inert gas tank so as to eliminate the need to convey the container to an inert gas purge station to supplement the inert gas supply in the container due to leakage. A gas pa

대표청구항

1. A portable container adapted to store wafers in a clean room of a semiconductor manufacturing system comprising: a container body having an opening for accessing a storage area defined within said container; a lid member attached to said container body and adapted to extend across said openin

이 특허에 인용된 특허 (4)

  1. Arii Katsuyuki (Tama JPX), Apparatus for loading and unloading a vacuum processing chamber.
  2. Shigeki Susumu (Fukuoka JPX), Apparatus for producing semiconductor devices.
  3. Parikh Mihir (San Jose CA) Bonora Anthony C. (Menlo Park CA), Sealable transportable container having a particle filtering system.
  4. Ishii Kaoru (Garland TX), Semiconductor wafer carrier design.

이 특허를 인용한 특허 (43)

  1. Kimura Norifumi,JPX, Cap for use in a semiconductor wafer heat processing apparatus.
  2. Babbs, Daniel; Fosnight, William, Carrier gas system and coupling substrate carrier to a loadport.
  3. Kinpara Mineo,JPX ; Ishikawa Toshio,JPX, Container.
  4. Doche Claude,FRX, Device for transporting flat objects and process for transferring said objects between said device and a processing machine.
  5. Miyajima, Toshihiko; Suzuki, Hitoshi; Igarashi, Hiroshi, Enclosed container lid opening/closing system and enclosed container lid opening/closing method.
  6. Kimura Norifumi,JPX, Fin for use in a semiconductor wafer heat processing apparatus.
  7. Kimura Norifumi,JPX, Fin for use in a semiconductor wafer heat processing apparatus.
  8. Wang, Sheng-Hung; Chiu, Ming-Long, Gas filling apparatus.
  9. Sasaki, Mutsuo; Emoto, Jun; Igarashi, Hiroshi, Gas purge unit, load port apparatus, and installation stand for purging container.
  10. Shimazu Tomohisa,JPX, Heat retaining tube base for use in a semiconductor wafer head processing apparatus.
  11. Matsushima Noriaki,JPX, Inner tube for use in a semiconductor wafer heat processing apparatus.
  12. Shimazu Tomohisa,JPX, Inner tube for use in a semiconductor wafer heat processing apparatus.
  13. Sugawara, Yudo, Lid opening and closing device.
  14. Kawachi Satoshi,JPX, Manifold cover for use in a semiconductor wafer heat processing apparatus.
  15. Yamazaki, Shunpei; Matsuda, Noriyuki, Manufacturing method and method for operating treatment apparatus.
  16. Yamazaki, Shunpei; Matsuda, Noriyuki, Manufacturing method by treating substrate introduced into treatment apparatus from transfer container.
  17. Brooks Ray G. (Irving TX) Brooks Timothy W. (Irving TX), Method and apparatus for maintaining sensitive articles in a contaminant-free environment.
  18. Brooks Ray G. ; Brooks Timothy W., Method and apparatus for maintaining sensitive articles in a contaminant-free environment.
  19. Wen Ziying, Method for chemical processing semiconductor wafers.
  20. Glenn A. Roberson, Jr. ; Robert M. Genco ; Robert B. Eglinton ; Wayland Comer ; Gregory K. Mundt, Molecular contamination control system.
  21. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
  22. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
  23. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
  24. Shimazu Tomohisa,JPX, Outer tube for use in a semiconductor wafer heat processing apparatus.
  25. Hanagata Tetsuya,JPX ; Watanabe Shingo,JPX, Processing tube for use in a semiconductor wafer heat processing apparatus.
  26. Hanagata Tetsuya,JPX ; Watanabe Shingo,JPX, Processing tube for use in a semiconductor wafer heat processing apparatus.
  27. Shimazu Tomohisa,JPX, Processing tube for use in a semiconductor wafer heat processing apparatus.
  28. Shikata, Nobuhide; Izumi, Takanori, Purging apparatus and purging method.
  29. Ishii Katsutoshi,JPX, Ring for use in a semiconductor wafer heat processing apparatus.
  30. Babbs, Daniel; Fosnight, William; May, Robert C.; Weaver, William, Side opening unified pod.
  31. Babbs, Daniel; Fosnight, William; May, Robert C.; Weaver, William, Side opening unified pod.
  32. Symons Richard Daniel,GB3 ; Matthews Robert James,GB3 ; Manchip Toby Alan,GB3, Storage of sensitive media.
  33. Yu,Chen Hua; Hsiao,Yi Li, Substrate carrier and facility interface and apparatus including same.
  34. Shimazu Tomohisa,JPX, Tube for use in a semiconductor wafer heat processing apparatus.
  35. Evans Bryce ; Rebenne Helen E., Ultra high purity gas distribution component with integral valved coupling and methods for its use.
  36. Ooyabu Jun,JPX, Upper electrode for manufacturing semiconductors.
  37. Honma Manabu,JPX, Wafer boat for use in a semiconductor wafer heat processing apparatus.
  38. Shimazu Tomohisa,JPX, Wafer boat for use in a semiconductor wafer heat processing apparatus.
  39. Shimazu Tomohisa,JPX, Wafer boat for use in a semiconductor wafer heat processing apparatus.
  40. Shimazu Tomohisa,JPX, Wafer boat for use in a semiconductor wafer heat processing apparatus.
  41. Inoue, Kiyotaka; Muguruma, Terumi; Kuroda, Yuichi; Yoshikawa, Noriaki, Wafer container.
  42. Inoue, Kiyotaka; Muguruma, Terumi; Kuroda, Yuichi; Yoshikawa, Noriaki, Wafer container.
  43. Kwon Chang-Heon,KRX ; Lee Ki-Ho,KRX ; Ryoo Hae-San,KRX ; Kim Yong-Pyo,KRX, Wafer conveyor system.
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