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Defect detection and defect removal apparatus of thin film electronic device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B23K-026/02
출원번호 US-0126209 (1993-09-24)
우선권정보 JP-0259552 (1992-09-29)
발명자 / 주소
  • Kawamura Tetsuya (Hirakata JPX) Sano Hiroshi (Hirakata JPX) Furuta Mamoru (Hirakata JPX) Yoshioka Tatsuo (Hirakata JPX) Miyata Yutaka (Ikoma JPX)
출원인 / 주소
  • Matsushita Electric Industrial Co., Ltd. (Kadoma JPX 03)
인용정보 피인용 횟수 : 48  인용 특허 : 0

초록

A laser beam is irradiated and scanned on a substrate of a liquid crystal display device of an active matrix type. Pairs of electrons and holes caused by the known internal photoelectric effect are produced by irradiation of the laser beam to electrical conductive thin films including silicon layere

대표청구항

A defect detection apparatus of a thin film electronic device comprising: laser beam generating means for generating a laser beam having a beam diameter which is smaller than a diameter of an object to be detected in the thin film electronic device, optical means for scanning said laser beam generat

이 특허를 인용한 특허 (48)

  1. Brunner,Matthias, Apparatus and method for contacting of test objects.
  2. Brunner,Matthias, Apparatus and method for contacting of test objects.
  3. Tandy, Patrick W., Apparatus and method for marking defective sections of laminate substrates.
  4. Yamada, Keizo, Contact hole standard test device.
  5. Yamada, Keizo, Contact hole standard test device, method of forming the same, method of testing contact hole, method and apparatus for measuring a thickness of a film, and method of testing a wafer.
  6. Yamada,Keizo, Contact hole standard test device, method of forming the same, method of testing contact hole, method and apparatus for measuring a thickness of a film, and method of testing a wafer.
  7. Yamada,Keizo, Contact hole standard test device, method of forming the same, method of testing contact hole, method and apparatus for measuring a thickness of a film, and method of testing a wafer.
  8. Yamada, Keizo, Contact hole standard test device, method of forming the same, method testing contact hole, method and apparatus for measuring a thickness of a film, and method of testing a wafer.
  9. Egan, Todd J.; Budiarto, Edward W.; Miller, Robert O.; Ravid, Abraham; Hoerner, Bridger E.; Batz, Jr., Robert W.; Woodruff, Daniel J., Electroplating tool with feedback of metal thickness distribution and correction.
  10. Budiarto, Edward W.; Dzilno, Dmitry A.; Egan, Todd J.; Hudgens, Jeffrey C.; Merry, Nir, Fast and continuous eddy-current metrology of a conductive film.
  11. Yamada, Keizo; Itagaki, Yousuke; Ushiki, Takeo, Film thickness measuring apparatus and a method for measuring a thickness of a film.
  12. Yamada,Keizo; Itagaki,Yousuke; Ushiki,Takeo, Film thickness measuring apparatus and a method for measuring a thickness of a film.
  13. Wu Mingde Nevil, Functional OBIC analysis.
  14. Wu Mingde Nevil, Functional OBIC analysis.
  15. Patrick W. Tandy, Integrated circuit substrate having through hole markings to indicate defective/non-defective status of same.
  16. Datta Saswati, Laser repair process for printed wiring boards.
  17. Datta Saswati, Laser repair process for printed wiring boards.
  18. Marty Michel,FRX ; Brun Alain,FRX, Localization of defects of a metallic layer of a semiconductor circuit.
  19. Marcuse, Arno G.; Most, Robert A.; North, Edward S., Method and apparatus for cleaning electronic test contacts.
  20. Prentice, Thomas C.; Crouch, Kenneth C., Method and apparatus for dispensing a viscous material on a substrate.
  21. Mizukami,Hirotaka, Method and apparatus for testing a wafer using a laser beam wavelength that does not generate photovoltage by excitation.
  22. Erickson, Brian D., Method for testing through-silicon vias at wafer sort using electron beam deflection.
  23. Schneider, Tod; Franklin, Sean; Venkataraman, Nithya; Davis, Donald, Method of simultaneous singulation and edge sealing of plastic displays.
  24. Yeh,Albert An Bon; Pabilonia,Regina Nora; Kressin,Robert William; Liu,Wei, Methods for designing and tuning one or more packaged integrated circuits.
  25. Johnston, Benjamin M.; Krishnaswami, Sriram; Nguyen, Hung T.; Brunner, Matthias; Liu, Yong, Mini-prober for TFT-LCD testing.
  26. Leong Tony P. (San Jose CA) North Edward S. (Los Altos CA) Herbst Richard L. (Palo Alto CA), Multi-wavelength laser system, probe station and laser cutter system using the same.
  27. Leong Tony P. ; North Edward S. ; Herbst Richard Linsley, Multi-wavelength laser system, probe station and laser cutter system using the same.
  28. Leong Tony P. (San Jose CA) North Edward S. (Los Altos CA) Herbst Richard Linsley (Palo Alto CA), Multi-wavelength variable attenuator and half wave plate.
  29. Leong Tony P. ; North Edward S. ; Herbst Richard Linsley, Multi-wavelength variable attenuator and half wave plate.
  30. Ravid, Abraham; Dzilno, Dmitry A.; Egan, Todd J.; Miller, Robert O., Non-contact sheet resistance measurement of barrier and/or seed layers prior to electroplating.
  31. Marshall Gordon Jones, Photomultiplier tube reprocessing.
  32. Krishnaswami, Sriram; Brunner, Matthias; Beaton, William; Liu, Yong; Johnston, Benjamin M.; Nguyen, Hung T.; Ledl, Ludwig; Schmid, Ralf, Prober for electronic device testing on large area substrates.
  33. Yamada, Keizo; Itagaki, Yousuke; Ushiki, Takeo; Tsujide, Tohru, Production managing system of semiconductor device.
  34. Yamada,Keizo; Itagaki,Yousuke; Ushiki,Takeo; Tsujide,Tohru, Production managing system of semiconductor device.
  35. Yamada, Keizo, Semiconductor device test method and semiconductor device tester.
  36. Yamada, Keizo, Semiconductor device test method and semiconductor device tester.
  37. Yamada, Keizo, Semiconductor device test method and semiconductor device tester.
  38. Yamada,Keizo, Semiconductor device test method and semiconductor device tester.
  39. Yamada,Keizo, Semiconductor device test method and semiconductor device tester.
  40. Yamada, Keizo, Semiconductor device test method for comparing a first area with a second area.
  41. Yamada, Keizo; Itagaki, Yousuke; Ushiki, Takeo; Tsujide, Tohru, Semiconductor device tester.
  42. Yamada, Keizo; Itagaki, Yousuke; Ushiki, Takeo; Tsujide, Tohru, Semiconductor device tester.
  43. Yamada,Keizo; Itagaki,Yousuke; Ushiki,Takeo; Tsujide,Tohru, Semiconductor device tester.
  44. Ushiki, Takeo; Yamada, Keizo; Itagaki, Yohsuke; Tsujide, Tohru, Surface contamination analyzer for semiconductor wafers.
  45. Ushiki, Takeo; Yamada, Keizo; Itagaki, Yohsuke; Tsujide, Tohru, Surface contamination analyzer for semiconductor wafers, method used therein and process for fabricating semiconductor device.
  46. Ushiki, Takeo; Yamada, Keizo; Itagaki, Yohsuke; Tsujide, Tohru, Surface contamination analyzer for semiconductor wafers, method used therein and process for fabricating semiconductor device.
  47. Cox,Andrew, Testing an image display device.
  48. Field, John E., Use of localized temperature change in determining the location and character of defects in flat-panel displays.
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