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Electron cyclotron resonance plasma source and method of operation 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H05H-001/00
출원번호 US-0048744 (1993-04-16)
발명자 / 주소
  • Dandl Raphael A. (San Marcos CA)
출원인 / 주소
  • Applied Microwave Plasma Concepts, Inc. (San Marcos CA 02)
인용정보 피인용 횟수 : 87  인용 특허 : 0

초록 ▼

A method and apparatus are disclosed employing electron cyclotron resonant (ECR) heating to produce plasma for applications including but not limited to chemical vapor deposition and etching. A magnetic field is formed by magnets circumferentially arranged about a cylindrical and symmetrical chamber

대표청구항 ▼

A method of generating plasma by electron cyclotron resonant (ECR) heating to treat specimens by processes including surface treatment, comprising the steps of forming a cylindrical chamber, introducing a gaseous medium into the chamber and maintaining low gas pressure within the chamber, supporting

이 특허를 인용한 특허 (87)

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