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Particulate-free epitaxial process 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C30B-023/06
  • C30B-025/10
출원번호 US-0214080 (1994-03-14)
발명자 / 주소
  • Logar Roger E. (San Jose CA)
출원인 / 주소
  • Applied Materials, Inc. (Santa Clara CA 02)
인용정보 피인용 횟수 : 46  인용 특허 : 0

초록

Particles and particle-generated defects during gas phase processing such as during epitaxial deposition are substantially decreased by the process of controlling the various particle transport mechanisms, for example, by applying low level radiant energy during cold purge cycles in barrel reactors.

대표청구항 ▼

A process for effecting improved, low particulate gas phase processing of a semiconductor wafer in a reactor chamber system which includes means for heating the interior of the chamber to the gas phase processing temperature, comprising: heating the wafer while the wafer is outside the reactor chamb

이 특허를 인용한 특허 (46)

  1. McDiarmid James ; Johnsgard Kristian E. ; Parks Steven E. ; Johnsgard Mark W., Apparatus and method for CVD and thermal processing of semiconductor substrates.
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  2. Allen,Susan Davis, Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition.
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  3. Chu, Xinsheng; Kang, Ming-Du, Cassette optimized for an inline annealing system.
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  4. Chae, Yongkee; Fu, Jianming, Chemical vapor deposition tool and process for fabrication of photovoltaic structures.
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  5. Raaijmakers, Ivo; Van Bilsen, Franciscus B., Cleaning of semiconductor processing chambers.
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  6. Raaijmakers, Ivo; Van Bilsen, Franciscus B., Cleaning of semiconductor processing chambers.
    상세보기
  7. Bauer, Matthias; Thomas, Shawn G., Cyclical epitaxial deposition and etch.
    상세보기
  8. Hammond Peter M. ; Kearney Kevin J., Detachment and removal of microscopic surface contaminants using a pulsed detach light.
    상세보기
  9. Sogard,Michael R., Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles.
    상세보기
  10. Sogard, Michael R., Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles and other objects.
    상세보기
  11. Roberson ; Jr. Glenn A. (Hollister CA) Genco Robert M. (Atlanta GA) Mundt G. Kyle (Duluth GA), Docking and environmental purging system for integrated circuit wafer transport assemblies.
    상세보기
  12. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Mundt G. Kyle, Docking and environmental purging system for integrated circuit wafer transport assemblies.
    상세보기
  13. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Mundt G. Kyle, Docking and environmental purging system for integrated circuit wafer transport assemblies.
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  14. Hellwig, Lance G.; Kommu, Srikanth; Pitney, John A., Epitaxial barrel susceptor having improved thickness uniformity.
    상세보기
  15. Bauer, Matthias, High throughput cyclical epitaxial deposition and etch process.
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  16. Boydston Mark R. ; Mitchell Dena C. A., In-situ epitaxial passivation for resistivity measurement.
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  17. Brabant,Paul D.; Italiano,Joe P.; Wen,Jianqing, Low temperature load and bake.
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  18. Brabant,Paul D.; Italiano,Joe P.; Wen,Jianqing, Low temperature load and bake.
    상세보기
  19. Allen, Susan Davis, Method and apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition.
    상세보기
  20. Hellwig Lance G., Method and system for monocrystalline epitaxial deposition.
    상세보기
  21. Klebanoff Leonard E. ; Rader Daniel J., Method for protection of lithographic components from particle contamination.
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  22. Matsushita, Kiyohiro; Fukuda, Hideaki; Kagami, Kenichi, Method of cleaning UV irradiation chamber.
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  23. Van Bilsen Franciscus Bernardus Maria ; Layton Jason Mathew ; Raaijmakers Ivo, Method of processing wafers with low mass support.
    상세보기
  24. Van Bilsen Franciscus Bernardus Maria ; Layton Jason Mathew ; Raaijmakers Ivo, Method of processing wafers with low mass support.
    상세보기
  25. Zhang, Jingyan; Ping, Er-Xuan, Methods for epitaxial silicon growth.
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  26. Zhang, Jingyan; Ping, Er-Xuan, Methods for epitaxial silicon growth.
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  27. Zhang,Jingyan; Ping,Er Xuan, Methods for epitaxial silicon growth.
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  28. Glenn A. Roberson, Jr. ; Robert M. Genco ; Robert B. Eglinton ; Wayland Comer ; Gregory K. Mundt, Molecular contamination control system.
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  29. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
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  30. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
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  31. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
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  32. Rozenzon, Yan; Trujillo, Robert T.; Beese, Steven C., Multi-channel gas-delivery system.
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  33. Scott, Robin Charis; Johnson, Matt, Process and apparatus for treating wafers.
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  34. Klebanoff Leonard E. ; Rader Daniel J., Protection of lithographic components from particle contamination.
    상세보기
  35. Halpin, Michael W.; Jacobson, Paul T., Rapid bake of semiconductor substrate with upper linear heating elements perpendicular to horizontal gas flow.
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  36. Rader Daniel J. ; Dykhuizen Ronald C. ; Geller Anthony S., Reduction of particle deposition on substrates using temperature gradient control.
    상세보기
  37. Dirksen, Peter; Morton, Robert Duncan; Zandbergen, Peter; Van Steenwinckel, David; Aksenov, Yuri; Lammers, Jeroen Herman; Van Wingerden, Johannes; Marinier, Laurent, Removable pellicle for immersion lithography.
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  38. Bauer, Matthias; Weeks, Keith Doran, Selective epitaxial formation of semiconductive films.
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  39. Bauer, Matthias; Weeks, Keith Doran, Selective epitaxial formation of semiconductor films.
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  40. Thomas, Shawn; Tomasini, Pierre, Stressor for engineered strain on channel.
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  41. Doley, Allan; Goodwin, Dennis; O'Neill, Kenneth; Vrijburg, Gerben; Rodriguez, David; Aggarwal, Ravinder, Substrate handling chamber.
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  42. Sullivan Steven M., Susceptor for barrel reactor.
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  43. Zajac, Piotr, System and method for curing conductive paste using induction heating.
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  44. Doley Allan ; Goodwin Dennis ; O'Neill Kenneth ; Vrijburg Gerben ; Rodriguez David, System and method for reducing particles in epitaxial reactors.
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  45. Sung, Edward; Zu-Yi Liu, James, Systems, method and apparatus for curing conductive paste.
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  46. Sung, Edward; Zu-Yi Liu, James, Systems, method and apparatus for curing conductive paste.
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