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[미국특허] Method of making masks for phase shifting lithography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-009/00
출원번호 US-0133633 (1993-10-07)
발명자 / 주소
  • Rolfson J. Brett (Boise ID)
출원인 / 주소
  • Micron Semiconductor, Inc. (Boise ID 02)
인용정보 피인용 횟수 : 59  인용 특허 : 0

초록 ▼

An improved method of fabricating phase shifting masks for semiconductor manufacture includes protecting an opaque layer of the mask during the mask fabrication process with a toughened layer of resist. For forming a Levenson phase shifting mask, an opaque layer is deposited on a transparent substra

대표청구항 ▼

A method of forming a phase shifting mask comprising: depositing an opaque layer on a transparent substrate; depositing a first layer of resist on the opaque layer; transferring a predetermined pattern onto the opaque layer using the first layer of resist; toughening and desensitizing the first laye

이 특허를 인용한 특허 (59) 인용/피인용 타임라인 분석

  1. Willis, Stephen L., Chemical mechanical planarization of conductive material.
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  4. Chen Chien-Hau ; Wenzel Donald E. ; Liu Qin ; Kawamura Naoto ; Seaver Richard W. ; Wu Carl ; Van Vooren Colby ; Hess Jeffery S. ; Davis Colin C., Direct imaging polymer fluid jet orifice.
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  5. Chen, Chien-Hau; Wenzel, Donald E.; Liu, Qin; Kawamura, Naoto; Seaver, Richard W.; Wu, Carl; Van Vooren, Colby; Hess, Jeffery S.; Davis, Colin C., Direct imaging polymer fluid jet orifice.
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  6. Chen, Chien-Hua; Wenzel, Donald E.; Liu, Qin; Kawamura, Naoto; Vooren, Colby Van; Davis, Colin C; Seaver, Richard W; Wu, Carl; Hess, Jeffery S, Direct imaging polymer fluid jet orifice.
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  7. Chien-Hau Chen ; Donald E. Wenzel ; Qin Liu ; Naoto Kawamura ; Richard W. Seaver ; Carl Wu ; Colby Van Vooren ; Jeffery S. Hess ; Colin C. Davis, Direct imaging polymer fluid jet orifice.
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  8. Racanelli,Marco; Hu,Chun; Sherman,Phil N., Double-implant high performance varactor and method for manufacturing same.
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  10. Gonzales, David B.; Bartlett, Aaron T., Endpoint stabilization for polishing process.
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  11. Hotta, Shoji; Hasegawa, Norio, Fabrication method of semiconductor integrated circuit device.
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  12. Hotta, Shoji; Hasegawa, Norio; Tanaka, Toshihiko, Fabrication method of semiconductor integrated circuit device and mask.
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  13. Hsu Jung-Hsien (Hsin-Chu TWX) Lee Chung-Kuang (Hsin-Chu TWX) Tsai Chia S. (Hsin-Chu TWX), Fabrication of self-aligned attenuated rim phase shift mask.
    상세보기
  14. Qian, Qi-De, Integrated circuits having in-situ constraints.
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  15. Rothenberg, Joshua E.; Sheng, Yunlong, Lithographic fabrication of phase mask for fiber Bragg gratings.
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  16. Winder, Amy A.; Chipman, Paul, METHOD OF FORMING AN ALTERNATING PHASE SHIFT CIRCUITRY FABRICATION MASK, METHOD OF FORMING A CIRCUITRY FABRICATION MASK HAVING A SUBTRACTIVE ALTERNATING PHASE SHIFT REGION, AND ALTERNATING PHASE SHIF.
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  17. Hasegawa, Norio; Tanaka, Toshihiko; Okada, Joji; Mori, Kazutaka; Miyazaki, Ko, Manufacturing method of photomask and photomask.
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  18. Hasegawa, Norio; Tanaka, Toshihiko; Okada, Joji; Mori, Kazutaka; Miyazaki, Ko, Manufacturing method of photomask and photomask.
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  19. Richard E. Schenker, Method and apparatus that compensates for phase shift mask manufacturing defects.
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  20. Choi Yong Kyoo,KRX, Method for fabricating phase shifting mask.
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  21. Jeng Nanseng ; Pierrat Christophe, Method for forming a spacer for semiconductor manufacture.
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  22. Nanseng Jeng ; Christophe Pierrat, Method for forming a spacer for semiconductor manufacture.
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  23. Jeng Nanseng ; Pierrat Christophe, Method for forming a spacer out of photosensitive material.
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  24. Jeng Nanseng ; Pierrat Christophe, Method for forming a spacer using photosensitive material.
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  25. Bae Sang Man,KRX, Method for forming fine patterns of a semiconductor device.
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  26. Lin, Chih-Yung; Lai, Chien-Wen, Method for improving process window in semi-dense area by using phase shifter.
    상세보기
  27. Rolson J. Brett, Method for making multi-phase, phase shifting masks.
    상세보기
  28. Pas, Sylvia D., Method for manufacturing a phase shift photomask.
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  29. Hasegawa, Norio; Terasawa, Tsuneo; Tanaka, Toshihiko, Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor.
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  30. Chao, Chu Chu, Method for processing a photomask for semiconductor devices.
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  31. Trung Tri Doan, Method of fabricating attenuated phase shift mask.
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  32. Hasegawa, Norio; Tanaka, Toshihiko, Method of fabrication of semiconductor integrated circuit device.
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  33. Yang, Baorui, Method of forming a circuitry fabrication mask having a subtractive alternating phase shift region.
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  34. Rolfson J. Brett, Method of forming a phase shifting reticle.
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  35. Torek Kevin J., Method of making an oxide structure having a finely calibrated thickness.
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  36. Hasegawa, Norio; Okada, Joji; Tanaka, Toshihiko; Mori, Kazutaka; Miyazaki, Ko, Method of manufacturing integrated circuit.
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  37. Hasegawa, Norio; Okada, Joji; Tanaka, Toshihiko; Mori, Kazutaka; Miyazaki, Ko, Method of manufacturing integrated circuit.
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  38. Hasegawa, Norio; Okada, Joji; Tanaka, Toshihiko; Mori, Kazutaka; Miyazaki, Ko, Method of manufacturing integrated circuit.
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  39. Hasegawa, Norio; Hayano, Katsuya; Kubo, Shinji; Koizumi, Yasuhiro; Takaya, Hironobu; Hoga, Morihisa, Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device.
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  40. Hayano, Katsuya; Hasegawa, Norio, Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device.
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  41. Hayano, Katsuya; Hasegawa, Norio, Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device.
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  42. Hasegawa,Norio; Terasawa,Tsuneo; Tanaka,Toshihiko, Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks.
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  43. Chang, Ching-Yu, Method of repairing a phase shifting mask.
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  44. Chance,Randall W.; Rolfson,J. Brett; Zerrade,Azeddine, Methods for converting reticle configurations.
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  45. Chance, Randall W.; Rolfson, J. Brett; Zerrade, Azeddine, Methods for converting reticle configurations and methods for modifying reticles.
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  46. J. Brett Rolfson, Methods of determining processing alignment in the forming of phase shift regions.
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  47. Baggenstoss, Bill, Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools.
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  48. Baggenstoss, Bill, Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools.
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  49. Baggenstoss, Bill, Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools.
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  50. Baggenstoss,Bill, Methods of patterning radiation, methods of forming radiation-patterning tools, and radiation-patterning tools.
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  51. Hsu Jung-Hsien,TWX ; Hsu Sung-Mu,TWX, Multi-phase mask using multi-layer thin films.
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  52. Kevin J. Torek, Oxide structure having a finely calibrated thickness.
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  53. Hieda Hiroyuki,JPX ; Ishino Takashi,JPX ; Tanaka Kuniyoshi,JPX ; Naito Katsuyuki,JPX, Pattern forming method and method of manufacturing device having fine pattern.
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  54. N철lscher,Christoph, Photolithographic mask.
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  55. Le Chin Aik ; Pierrat Christophe, Process for designing and checking a mask layout.
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  56. Huh Hoon,KRX, Semiconductor mask and method of manufacturing the same.
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  57. Howard E. Rhodes, Single-level masking with partial use of attenuated phase-shift technology.
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  58. Guangming Xiao, Step mask.
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  59. Ho,Bang Chein; Chen,Jian Hong; Takano,Yusuke; Lu,Ping Hung, Water soluble negative tone photoresist.
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