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Process for fabricating submicron single crystal electromechanical structures 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B44C-001/22
출원번호 US-0171965 (1993-12-22)
발명자 / 주소
  • MacDonald Noel C. (Ithaca NY) Zhang Zhoying L. (Ithaca NY) Porkolab Gyorgy A. (Ithaca NY)
출원인 / 주소
  • Cornell Research Foundation, Inc. (Ithaca NY 02)
인용정보 피인용 횟수 : 67  인용 특허 : 0

초록 ▼

A process for fabricating submicron movable mechanical structures utilizes chemically assisted ion beam etching and reactive ion etching which are independent of crystal orientation. The process provides released mechanical structures which may be of the same material or of different materials than

대표청구항 ▼

A process for fabricating, from a single crystal substrate, a high aspect ratio, released, single-crystal microstructure having any arbitrary structural orientation with respect to the substrate, comprising: providing a substrate of single-crystal material from which a microstructure is to be fabric

이 특허를 인용한 특허 (67)

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  26. Bashir Rashid ; Kabir Abul, Method of making high sensitivity micro-machined pressure sensors and acoustic transducers.
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  28. Gordon M. Babson ; Anthony M. Palagonia, Micro probe and method of fabricating same.
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  29. Bowers, John Edward; Helkey, Roger Jonathan; Corbalis, Charles; Sink, Robert Kehl; Lee, Seung Bok; MacDonald, Noel, Micro-electro-mechanical-system (MEMS) mirror device and methods for fabricating the same.
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  30. Lee, Seung Bok; MacDonald, Noel, Micro-electro-mechanical-system (MEMS) mirror device having large angle out of plane motion using shaped combed finger actuators and method for fabricating the same.
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  31. Sugino Rinji (Kawasaki JPX), Micro-machining minute hollow using native oxide membrane.
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