[특허]Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups

Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G03F-007/023 G03F-007/30
출원번호	US-0876457 (1992-04-30)
우선권정보	JP-0128737 (1991-04-30); JP-0276188 (1991-09-30)
발명자 / 주소	Hayase Rumiko (Kawasaki JPX) Onishi Yasunobu (Yokohama JPX) Niki Hirokazu (Yokohama JPX) Oyasato Naohiko (Kawaguchi JPX) Kobayashi Yoshihito (Kawasaki JPX) Hayase Shuzi (Kawasaki JPX)
출원인 / 주소	Kabushiki Kaisha Toshiba (Kawasaki JPX 03)
인용정보	피인용 횟수 : 50 인용 특허 : 0

초록 ▼

Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.

대표청구항 ▼

A resist for forming patterns, comprising in admixture: (a) an acid-generating compound which generates an acid when exposed to ultraviolet rays or ionizing radiation; and (b) a compound which has an acid decomposable substituent group and which is represented by the following formula (I): [Figure] (I) where m and n are each a positive number, and where m and n have a relationship of: n/(m+n)=0.17 to 0.60. A resist for forming patterns, comprising in admixture: (a) a compound having an acid decomposable substituent group and which is represented by the following formula (I): [Figure] (I) where m and n are each a positive number, and where m and n have a relationship of: n/(m+n)=0.17 to 0.60; (b1) a first acid-generating compound which generates a strong acid when exposed to ultraviolet rays or ionizing radiation; and (b2) a second acid-generating compound which generates an acid weaker than said strong acid, when exposed to ultraviolet rays or ionizing radiation.

이 특허를 인용한 특허 (50)

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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups 원문보기

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Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups 원문보기

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