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11. Gorsuch, Thomas E.; Amalfitiano, Carlo, Dynamic bandwidth allocation to transmit a wireless protocol across a code division multiple access (CDMA) radio link.

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13. Allen, David; Centanni, Michael A., Method and apparatus for detection of contaminants in a fluid.

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14. Centanni, Michael A., Method and apparatus for formulating and controlling chemical concentration in a gas mixture.

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15. Centanni, Michael A., Method and apparatus for formulating and controlling chemical concentrations in a solution.

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16. Centanni, Michael A., Method and apparatus for measuring chemical concentration in a fluid.

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17. Centanni, Michael A., Method and apparatus for measuring concentration of a chemical component in a gas mixture.

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18. Korenev, Sergey A.; Korenev, Ivan S.; Centanni, Michael A., Method and apparatus for measuring the concentration of hydrogen peroxide in a fluid.

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19. Kaiser, Herbert J.; Allen, David G.; Centanni, Michael A.; McGinley, Mark D., Method and apparatus for monitoring detergent concentration in a decontamination process.

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20. Kaiser,Herbert J.; Centanni,Michael A., Method and apparatus for monitoring the purity and/or quality of steam.

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21. Kaiser, Herbert J.; Centanni, Michael A., Method and apparatus for monitoring the state of a chemical solution for decontamination of chemical and biological warfare agents.

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22. Kaiser, Herbert J.; Centanni, Michael A., Method and apparatus for real time monitoring of metallic cation concentrations in a solution.

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23. Centanni, Michael A., Method for determining the efficiency of a vaporizer in a decontamination system.

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24. Bodo Peter,SEX ; Hesselbom Hjalmar,SEX, Method for making elastic bumps from a wafer mold having grooves.

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25. Guldi Richard L. (Dallas TX) Kunesh Robert F. (Plano TX), Method for rotational wafer cleaning in solution.

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26. Toko Konishi JP; Cozy Ban JP; Yasuhiro Asaoka JP, Method for treating semiconductor substrates.

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27. Hase Ushio,JPX ; Yamamoto Kenichi,JPX ; Nakamura Akinobu,JPX, Method for treatment of semiconductor substrate with chemical solution and apparatus used for said treatment.

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28. Song Jong Kook,KRX, Method of cleaning a silicon wafer using a standard cleaning solution.

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29. Tadashi Shimomura JP; Masaru Ohto JP; Hiroya Watanabe JP, Method of controlling NOx gas emission by hydrogen peroxide.

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30. Geomini,Marcellinus J. H. J., Method of manufacturing electronic devices, and apparatus for carrying out such a method.

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31. Centanni,Michael A, Method of monitoring operational status of sensing devices for determining the concentration of chemical components in a fluid.

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32. Ohmi,Tadahiro; Sugawa,Shigetoshi; Teramoto,Akinobu; Akahori,Hiroshi; Nii,Keiichi, Method of surface treatment for manufacturing semiconductor device.

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33. Shih, Hong; Avoyan, Armen; Deshmukh, Shashank C.; Carman, David, Methodology for cleaning of surface metal contamination from an upper electrode used in a plasma chamber.

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34. Tong, Weidong; Salvati, Larry; Kadambi, Pooja, Methods and devices for implants with calcium phosphate.

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35. Fisher, Matthew L.; Snyder, David L.; Misra, Ashutosh, Methods and systems for controlling the concentration of a component in a composition with absorption spectroscopy.

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36. Wen,Hai Bo; Li,Panjian; Smith,Todd, Methods for producing metallic implants having roughened surfaces.

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37. Nakao Shuji,JPX, Monitoring method and apparatus of surface area of semiconductor wafer.

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38. Proctor, Jr., James A., Multi-detection of heartbeat to reduce error probability.

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39. Proctor, Jr., James A., Multi-detection of heartbeat to reduce error probability.

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40. Homma Yoshio,JPX ; Kusukawa Kikuo,JPX ; Moriyama Shigeo,JPX ; Nagasawa Masayuki,JPX, Polishing agent and polishing method.

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41. Homma Yoshio,JPX ; Kusukawa Kikuo,JPX ; Moriyama Shigeo,JPX ; Nagasawa Masayuki,JPX, Polishing agent and polishing method.

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42. Wochner, Hanns; Gailer, Thomas; Kellner, Rudolf, Process for cleaning polycrystalline silicon chunks.

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43. Eaton,Andrew; Entwistle,Andrew; Read,Howard; Abou Shakra,Fadi, Sample introduction system.

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44. Eaton,Andrew; Entwistle,Andrew; Read,Howard; Abou Shakra,Fadi, Sample introduction system.

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45. Hui-Ju Yoo TW; Szu-An Wu TW; Cheng-Kun Lin TW; Shiow-Jye Jenq TW, Silicon monitor for detection of H2O2 in acid bath.

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46. Ulyashin, Alexander; Bentzen, Andreas; Svensson, Bengt; Holt, Arve; Sauar, Erik, Surface passivation of silicon based wafers.

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47. Campbell, Mark A.; Tang, Phuong-Anh; Anderson, Gary R, System and method for monitoring and/or controlling attributes of multiple chemical mixtures with a single sensor.

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48. Hase Ushio,JPX ; Yamamoto Kenichi,JPX ; Miyazawa Ichiro,JPX, Wet-chemical treatment method, treatment method of semiconductor substrate, and manufacturing method of semiconductor device.

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