[미국특허]
Liquid radiation-curable formulation, in particular for use in stereolithography
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C08F-002/50
C08F-283/06
G03F-007/075
G03F-007/028
출원번호
US-0292654
(1994-08-18)
발명자
/ 주소
Wolf Jean-Pierre (Courtaman CHX) Schulthess Adrian (Tentlingen CHX) Steinmann Bettina (Praroman CHX) Hunziker Max (Ddingen CHX)
출원인 / 주소
Ciba-Geigy Corporation (Ardsley NY 02)
인용정보
피인용 횟수 :
16인용 특허 :
0
초록▼
Liquid radiation-curable formulation, in particular for stereolithography, based on at least one compound that contains free radically polymerisable groups, and at least one photoinitiator suitable for the polymerisation, which formulation additionally contains a polyoxyalkylene-polysiloxane block c
Liquid radiation-curable formulation, in particular for stereolithography, based on at least one compound that contains free radically polymerisable groups, and at least one photoinitiator suitable for the polymerisation, which formulation additionally contains a polyoxyalkylene-polysiloxane block copolymer that is selected from copolymers of the chemical formulae R1-(OCcH2c)d-{[T]-(CcH2cO)d-1-(CcH2c)}g-OR1 (I) (II): [Figure] and (III): [Figure] wherein: R1 is a hydrogen atom or a C1-C8 alkyl group; R2 is a methyl or phenyl group; [T]is a polysiloxane group [PS]terminated as described in the specification in more detail; [PS]is the group of formula [Figure] and [Alk]is an alkylene group of 3 to 10 carbon atoms, as well as novel block copolymers of formulae (I) and (II). The cured formulations have, inter alia, superior impact strength.
대표청구항▼
A liquid radiation-curable formulation, in particular for use in stereolithography, comprising at least one compound that contains free radically polymerisable groups, and at least one photoinitiator suitable for the polymerisation, which formulation additionally comprises a polyoxy-alkylene-polysil
A liquid radiation-curable formulation, in particular for use in stereolithography, comprising at least one compound that contains free radically polymerisable groups, and at least one photoinitiator suitable for the polymerisation, which formulation additionally comprises a polyoxy-alkylene-polysiloxane block copolymer which is selected from copolymers of the chemical formulae R1-(OCcH2c)d-{[T]-(CcH2cO)d-1-(CcH2c)}g-OR1 (I) (II): [Figure] and (III): [Figure] in which formulae the individual symbols have the following meanings: R1 is a member selected from hydrogen and C1-C8 alkyl; c is a number from 1 to 8 corresponding to the average number of carbon atoms of an alkylene unit in a polyoxyalkylene group (CcH2cO)d; d is an integer from 1 to 100; g is an integer from 1 to 4; [T]is a group selected from the groups of formulae T1 to T12: T1: O[Ps]O, T2: [Figure] T3: O[Alk][PS][Alk]O, T4: [Figure] T5: [Figure] T6: [Figure] T7: [Figure] [Figure] T8: [Figure] T9: O[G]O[PS]O[G]O, T10: [Figure] T11: O[G]O[Alk][PS][Alk]O[G]O, T12: O[G]O(CmH2mO)n[Alk][PS] [Alk](OCmH2m)nO[G]O; [PS]is a polysiloxane group of formula [Figure] R2 is a group selected from methyl and phenyl; b is an integer from 1 to 100; [Alk]is an alkylene group of 3 to 10 carbon atoms; [Alk1]is an alkylene group of 1 to 20 carbon atoms; m is a number from 1 to 8 corresponding to the average number of carbon atoms of an alkylene unit in a polyoxyalkylene group (CmH2mO)n; n is an integer from 1 to 50; [G]is a group of formula [Figure] X is an atom selected from oxygen and sulfur; [D]is a divalent hydrocarbon radical containing at least 2 carbon atoms; e is an integer from 1 to 100, and f is an integer from 1 to 50; with the proviso that when the formulation comprises a polyoxyalkylene-polysiloxane block copolymer of formula (III) then the compounds that contain free radically polymerisable groups are a mixture comprising the following components: (i) a difunctional monomeric or polymeric acrylate or methacrylate; (ii) a acrylate or methacrylate having a (meth)acrylate functionality greater than 2; (iii) an unsaturated monomer of formula [Figure] wherein R5 is a member selected from hydrogen and methyl, and R6 is a radical of formula [Figure] wherein R7 is a radical selected from the group consisting of tetrahydrofurfuryl, cyclohexyl, 2-phenoxyethyl, benzyl, isobomyl, glycidyl, dicyclopentyl, morpholinoethyl, dimethylaminoethyl and straight-chain and branched C1-C20 alkyl radicals, or if R5 is a hydrogen atom, R6, in additional to the radicals cited above, can also be a radical selected from the group consisting of pyrrolidon-2-yl, imidazonyl, carbazolyl, anthracenyl, phenyl, C5-C8 cycloalkyl, naphthenyl, 2-norbornyl, pyridyl, N-caprolactamyl, formamidyl, acetamidyl and toluolyl.
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