[특허]Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process

Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G01N-021/89 G02B-027/46 G06F-015/46
출원번호	US-0046720 (1993-04-16)
우선권정보	JP-0098095 (1992-04-17)
발명자 / 주소	Morioka Hiroshi (Ebina JPX) Noguchi Minori (Yokohama JPX) Ohshima Yoshimasa (Yokohama JPX) Kembo Yukio (Yokohama JPX) Nishiyama Hidetoshi (Fujisawa JPX) Matsuoka Kazuhiko (Gunma JPX) Shigyo Yoshiharu
출원인 / 주소	Hitachi, Ltd. (Tokyo JPX 03)
인용정보	피인용 횟수 : 84 인용 특허 : 0

초록 ▼

A defect detecting apparatus including an illumination system for radiating a light of a plane wave linearly to a substrate having repetitive patterns of different pitches; a focusing optical system for focusing a light image reflected from the substrate thus illuminated by the illumination system; a spatial filter disposed intermediate the focusing optical system so as to shield a diffraction light from repetitive patterns of a small pitch on the substrate; a detector for detecting the light image formed by the focusing optical system; an erasing means for comparing and erasing signals which are generated on the basis of repetitive patterns of a large pitch and obtained through the spatial filter, out of signals detected by the detector; and a defect detecting means for detecting defects on the substrate in accordance with a signal detected by the detector, as well as a method applied to the said apparatus.

대표청구항 ▼

A defect detecting apparatus including: an illumination system for radiating a light of a plane wave linearly to a substrate having repetitive patterns of different pitches; a focusing optical system for focusing a light image reflected from the substrate thus illuminated by said illumination system radiating linear light; a spatial filter disposed intermediate said focusing optical system so as to shield a diffraction light from repetitive patterns of a small pitch on the substrate; a linear detection detector for detecting the light image obtained through said spatial filter and focused by said focusing optical system; an erasing means for comparing and erasing signals which are generated on the basis of repetitive patterns of a large pitch and obtained through said spatial filter, out of signals detected by said detector; and a defect detecting means for detecting defects on the substrate in accordance with a signal detected by said detector.

이 특허를 인용한 특허 (84)

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A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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연합인증

Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process 원문보기

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대표청구항 ▼

연구과제 타임라인

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Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process 원문보기

초록 ▼

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연구과제 타임라인

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