이 특허를 인용한 특허 (221)

1. Gurtej Sandhu ; Garo J. Derderian, ALD method to improve surface coverage.

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2. Sandhu, Gurtej; Derderian, Garo J., ALD method to improve surface coverage.

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3. Wang, Chang-gong; Shero, Eric J.; Wilk, Glen; Maes, Jan Willem, ALD of metal silicate films.

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4. Choi, Kenric T.; Narwankar, Pravin K.; Kher, Shreyas S.; Nguyen, Son T.; Deaton, Paul; Ngo, Khai; Chhabra, Paul; Ouye, Alan H.; Wu, Dien-Yeh (Daniel), Ampoule for liquid draw and vapor draw with a continuous level sensor.

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5. Lee, Wei Ti; Chiao, Steve H., Ampoule splash guard apparatus.

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6. Lee,Wei Ti; Chiao,Steve H., Ampoule splash guard apparatus.

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7. Gealy, Dan; Weimer, Ronald A., Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers.

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8. Carpenter, Craig M.; Mardian, Allen P.; Dando, Ross S.; Tschepen, Kimberly R.; Derderian, Garo J., Apparatus and method for depositing materials onto microelectronic workpieces.

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9. Carpenter,Craig M.; Mardian,Allen P.; Dando,Ross S.; Tschepen,Kimberly R.; Derderian,Garo J., Apparatus and method for depositing materials onto microelectronic workpieces.

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10. Jallepally, Ravi; Li, Shih-Hung; Duboust, Alain; Zhao, Jun; Chen, Liang-Yuh; Carl, Daniel A., Apparatus and method for fast-cycle atomic layer deposition.

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11. Chen, Ling; Ku, Vincent W.; Chung, Hua; Marcadal, Christophe; Ganguli, Seshadri; Lin, Jenny; Wu, Dien Yeh; Ouye, Alan; Chang, Mei, Apparatus and method for generating a chemical precursor.

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12. Chen,Ling; Ku,Vincent W.; Chang,Mei; Wu,Dien Yeh; Chung,Hua, Apparatus and method for hybrid chemical processing.

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13. Chen,Ling; Ku,Vincent W.; Chang,Mei; Wu,Dien Yeh; Chung,Hua, Apparatus and method for hybrid chemical processing.

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14. Chen, Chen-An; Gelatos, Avgerinos; Yang, Michael X.; Xi, Ming; Hytros, Mark M., Apparatus and method for plasma assisted deposition.

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15. Chen,Chen An; Gelatos,Avgerinos; Yang,Michael X.; Xi,Ming; Hytros,Mark M., Apparatus and method for plasma assisted deposition.

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16. Kim, Sam H.; Hosokawa, Akihiro; Suh, Dong Choon, Apparatus and method for uniform substrate heating and contaminate collection.

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17. Lei, Lawrence C., Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition.

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18. Mardian, Allen P.; Rodriguez, Santiago R., Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes.

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19. Derderian,Garo J., Apparatus and methods for plasma vapor deposition processes.

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20. Ma, Paul; Shah, Kavita; Wu, Dien-Yeh; Ganguli, Seshadri; Marcadal, Christophe; Wu, Frederick C.; Chu, Schubert S., Apparatus and process for plasma-enhanced atomic layer deposition.

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21. Ma, Paul; Shah, Kavita; Wu, Dien-Yeh; Ganguli, Seshadri; Marcadal, Christophe; Wu, Frederick C.; Chu, Schubert S., Apparatus and process for plasma-enhanced atomic layer deposition.

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22. Ma, Paul; Shah, Kavita; Wu, Dien-Yeh; Ganguli, Seshadri; Marcadal, Christophe; Wu, Frederick C.; Chu, Schubert S., Apparatus and process for plasma-enhanced atomic layer deposition.

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23. Carpenter,Craig M.; Dando,Ross S.; Mardian,Allen P., Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces.

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24. Thakur, Randhir P. S.; Mak, Alfred W.; Xi, Ming; Glenn, Walter Benjamin; Khan, Ahmad A.; Al-Shaikh, Ayad A.; Gelatos, Avgerinos V.; Umotoy, Salvador P., Apparatus for cyclical depositing of thin films.

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25. Thakur,Randhir P. S.; Mak,Alfred W.; Xi,Ming; Glenn,Walter Benjamin; Khan,Ahmad A.; Al Shaikh,Ayad A.; Gelatos,Avgerinos V.; Umotoy,Salvador P., Apparatus for cyclical deposition of thin films.

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26. Chen, Ling; Ku, Vincent W.; Chang, Mei; Wu, Dien Yeh; Chung, Hua, Apparatus for hybrid chemical processing.

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27. Derderian, Garo J.; Sandhu, Gurtej S., Apparatus for improved delivery of metastable species.

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28. Chung,Hua; Chen,Ling; Yu,Jick; Chang,Mei, Apparatus for integration of barrier layer and seed layer.

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29. Guenther,Rolf A., Apparatus for providing gas to a processing chamber.

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30. Myo, Nyi Oo; Choi, Kenric; Kher, Shreyas; Narwankar, Pravin; Poppe, Steve; Metzner, Craig R.; Deaten, Paul, Apparatuses for atomic layer deposition.

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31. Chin, Barry L.; Mak, Alfred W.; Lei, Lawrence C.; Xi, Ming; Chung, Hua; Lai, Ken Kaung; Byun, Jeong Soo, Atomic layer deposition apparatus.

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32. Chin, Barry L.; Mak, Alfred W.; Lei, Lawrence Chung-Lai; Xi, Ming; Chung, Hua; Lai, Ken Kaung; Byun, Jeong Soo, Atomic layer deposition apparatus.

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33. Chin, Barry L.; Mak, Alfred W.; Lei, Lawrence Chung-Lai; Xi, Ming; Chung, Hua; Lai, Ken Kaung; Byun, Jeong Soo, Atomic layer deposition apparatus.

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34. Chin, Barry L.; Mak, Alfred W.; Lei, Lawrence Chung-Lai; Xi, Ming; Chung, Hua; Lai, Ken Kaung; Byun, Jeong Soo, Atomic layer deposition apparatus.

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35. Chin, Barry L.; Mak, Alfred W.; Lei, Lawrence Chung-Lai; Xi, Ming; Chung, Hua; Lai, Ken Kaung; Byun, Jeong Soo, Atomic layer deposition apparatus.

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36. Chin,Barry L.; Mak,Alfred W.; Lei,Lawrence Chung Lai; Xi,Ming; Chung,Hua; Lai,Ken Kaung; Byun,Jeong Soo, Atomic layer deposition apparatus.

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37. Chung, Hua; Wang, Rongjun; Maity, Nirmalya, Atomic layer deposition of barrier materials.

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38. Ma, Yi; Kher, Shreyas S.; Ahmed, Khaled; Goyani, Tejal; Mahajani, Maitreyee; Ravi, Jallepally; Huang, Yi-Chiau, Atomic layer deposition processes for non-volatile memory devices.

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39. Ma, Yi; Kher, Shreyas S.; Ahmed, Khaled; Goyani, Tejal; Mahajani, Maitreyee; Ravi, Jallepally; Huang, Yi-Chiau, Atomic layer deposition processes for non-volatile memory devices.

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40. Tois, Eva; Haukka, Suvi; Tuominen, Marko, Atomic-layer-chemical-vapor-deposition of films that contain silicon dioxide.

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41. Kori, Moris; Mak, Alfred W.; Byun, Jeong Soo; Lei, Lawrence Chung-Lai; Chung, Hua; Sinha, Ashok; Xi, Ming, Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques.

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42. Inagawa,Makoto; Hosokawa,Akihiro, Chamber for uniform substrate heating.

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43. Shang, Quanyuan; Kardokus, Janine; Hosokawa, Akihiro, Chamber for uniform substrate heating.

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44. Shang,Quanyuan; Kardokus,Janine; Hosokawa,Akihiro, Chamber for uniform substrate heating.

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45. Chen, Ling; Ku, Vincent W.; Chung, Hua; Marcadal, Christophe; Ganguli, Seshadri; Lin, Jenny; Wu, Dien Yeh; Ouye, Alan; Chang, Mei, Chemical precursor ampoule for vapor deposition processes.

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46. Cuvalci, Olkan; Wu, Dien-Yeh; Yuan, Xiaoxiong, Chemical precursor ampoule for vapor deposition processes.

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47. Lei, Lawrence C.; Mak, Alfred W.; Tzu, Gwo-Chuan; Tepman, Avi; Xi, Ming; Glenn, Walter Benjamin, Clamshell and small volume chamber with fixed substrate support.

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48. Lu, Jiang; Ha, Hyoung-Chan; Ma, Paul F.; Ganguli, Seshadri; Aubuchon, Joseph F.; Yu, Sang-ho; Narasimhan, Murali K., Cobalt deposition on barrier surfaces.

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49. Lu, Jiang; Ha, Hyoung-Chan; Ma, Paul; Ganguli, Seshadri; Aubuchon, Joseph F.; Yu, Sang Ho; Narasimhan, Murali K., Cobalt deposition on barrier surfaces.

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50. Nguyen, Son T.; Sangam, Kedarnath; Schwartz, Miriam; Choi, Kenric; Bhat, Sanjay; Narwankar, Pravin K.; Kher, Shreyas; Sharangapani, Rahul; Muthukrishnan, Shankar; Deaton, Paul, Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system.

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51. Yang, Michael X.; Xi, Ming, Cyclical deposition of a variable content titanium silicon nitride layer.

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52. Wang, Shulin; Kroemer, Ulrich; Luo, Lee; Chen, Aihua; Li, Ming, Cyclical deposition of tungsten nitride for metal oxide gate electrode.

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53. Wang,Shulin; Kroemer,Ulrich; Luo,Lee; Chen,Aihua; Li,Ming, Cyclical deposition of tungsten nitride for metal oxide gate electrode.

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54. Derderian, Garo J.; Sandhu, Gurtej S., Deposition methods.

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55. Derderian,Garo J.; Sandhu,Gurtej S., Deposition methods.

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56. Garo J. Derderian ; Gurtej S. Sandhu, Deposition methods.

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57. Sandhu,Gurtej S.; Derderian,Garo J.; Blalock,Guy T.; Gilton,Terry L., Deposition methods and apparatuses providing surface activation.

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58. Yoon, Ki Hwan; Cha, Yonghwa Chris; Yu, Sang Ho; Ahmad, Hafiz Farooq; Wee, Ho Sun, Deposition methods for barrier and tungsten materials.

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59. Yoon,Ki Hwan; Cha,Yonghwa Chris; Yu,Sang Ho; Ahmad,Hafiz Farooq; Wee,Ho Sun, Deposition methods for barrier and tungsten materials.

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60. Derderian,Garo J.; Sandhu,Gurtej S., Deposition methods for improved delivery of metastable species.

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61. Law, Kam S.; Shang, Quanyuan; Harshbarger, William R.; Maydan, Dan; Choi, Soo Young; Park, Beom Soo; Yadav, Sanjay; White, John M., Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow.

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62. Law, Kam; Shang, Quanyuan; Harshbarger, William Reid; Maydan, Dan, Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications.

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63. Law,Kam; Shang,Quanyuan; Harshbarger,William Reid; Maydan,Dan, Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications.

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64. Yoon, Hyungsuk A.; Fang, Hongbin; Yang, Michael X., Deposition of tungsten films.

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65. Grimbergen, Michael N., Dual endpoint detection for advanced phase shift and binary photomasks.

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66. Lei, Lawrence C.; Kori, Moris, Dual robot processing system.

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67. Grimbergen, Michael, Endpoint detection for photomask etching.

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68. Grimbergen, Michael, Endpoint detection for photomask etching.

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69. Chen,Ling; Chang,Mei, Enhancement of copper line reliability using thin ALD tan film to cap the copper line.

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70. Grimbergen, Michael, Etch rate detection for anti-reflective coating layer and absorber layer etching.

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71. Grimbergen, Michael N., Etch rate detection for photomask etching.

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72. Grimbergen, Michael, Etch rate detection for reflective multi-material layers etching.

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73. Zojaji, Ali; Samoilov, Arkadii V., Etchant treatment processes for substrate surfaces and chamber surfaces.

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74. Zojaji, Ali; Samoilov, Arkadii V., Etchant treatment processes for substrate surfaces and chamber surfaces.

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75. Sandhu, Gurtej; Derderian, Garo J., Film composition.

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76. Narwankar, Pravin K.; Higashi, Gregg, Formation of a silicon oxynitride layer on a high-k dielectric material.

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77. Seutter, Sean M.; Yang, Michael X.; Xi, Ming, Formation of a tantalum-nitride layer.

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78. Seutter, Sean M.; Yang, Michael X.; Xi, Ming, Formation of a tantalum-nitride layer.

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79. Seutter, Sean M.; Yang, Michael X.; Xi, Ming, Formation of a tantalum-nitride layer.

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80. Seutter, Sean M.; Yang, Michael X.; Xi, Ming, Formation of a tantalum-nitride layer.

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81. Seutter,Sean M.; Yang,Michael X.; Xi,Ming, Formation of a tantalum-nitride layer.

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82. Byun, Jeong Soo; Mak, Alfred, Formation of boride barrier layers using chemisorption techniques.

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83. Byun,Jeong Soo; Mak,Alfred, Formation of boride barrier layers using chemisorption techniques.

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84. Byun,Jeong Soo; Mak,Alfred, Formation of boride barrier layers using chemisorption techniques.

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85. Byun,Jeong Soo; Mak,Alfred, Formation of boride barrier layers using chemisorption techniques.

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86. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus and method for atomic layer deposition.

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87. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus and method for atomic layer deposition.

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88. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus for atomic layer deposition.

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89. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman; Chang, Mei, Gas delivery apparatus for atomic layer deposition.

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90. Yudovsky, Joseph, Gas distribution system for cyclical layer deposition.

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91. Ishikawa, David; Metzner, Craig R.; Zojaji, Ali; Kim, Yihwan; Samoilov, Arkadii V., Gas manifolds for use during epitaxial film formation.

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92. Ma, Yi; Ahmed, Khaled Z.; Cunningham, Kevin L.; McIntosh, Robert C.; Mayur, Abhilash J.; Liang, Haifan; Yam, Mark; Leung, Toi Yue Becky; Olsen, Christopher; Wang, Shulin; Foad, Majeed; Miner, Gary Eugene, Gate electrode dopant activation method for semiconductor manufacturing.

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93. Ma,Yi; Ahmed,Khaled Z.; Cunningham,Kevin L.; McIntosh,Robert C.; Mayur,Abhilash J.; Liang,Haifan; Yam,Mark; Leung,Toi Yue Becky; Olsen,Christopher; Wang,Shulin; Foad,Majeed; Miner,Gary Eugene, Gate electrode dopant activation method for semiconductor manufacturing including a laser anneal.

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94. Fukada Takeshi,JPX ; Sakama Mitsunori,JPX ; Teramoto Satoshi,JPX, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.

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95. Fukada Takeshi,JPX ; Sakama Mitsunori,JPX ; Teramoto Satoshi,JPX, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.

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96. Fukada, Takeshi; Sakama, Mitsunori; Teramoto, Satoshi, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.

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97. Fukada,Takeshi; Sakama,Mitsunori; Teramoto,Satoshi, Glass substrate assembly, semiconductor device and method of heat-treating glass substrate.

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98. Chung,Hua; Maity,Nirmalya; Yu,Jick; Mosely,Roderick Craig; Chang,Mei, Integration of ALD tantalum nitride for copper metallization.

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99. Chung, Hua; Chen, Ling; Yu, Jick; Chang, Mei, Integration of barrier layer and seed layer.

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100. Chung,Hua; Chen,Ling; Yu,Jick; Chang,Mei, Integration of barrier layer and seed layer.

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101. Yang, Michael X.; Itoh, Toshio; Xi, Ming, Integration of titanium and titanium nitride layers.

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102. Yang,Michael X.; Itoh,Toshio; Xi,Ming, Integration of titanium and titanium nitride layers.

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103. Nguyen, Khiem K.; Satitpunwaycha, Peter; Mak, Alfred W., Interferometer endpoint monitoring device.

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104. Nguyen, Anh N.; Yang, Michael X.; Xi, Ming; Chung, Hua; Chang, Anzhong; Yuan, Xiaoxiong; Lu, Siqing, Lid assembly for a processing system to facilitate sequential deposition techniques.

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105. Tzu, Gwo-Chuan; Umotoy, Salvador P., Lid assembly for a processing system to facilitate sequential deposition techniques.

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106. Tzu, Gwo-Chuan; Umotoy, Salvador P., Lid assembly for a processing system to facilitate sequential deposition techniques.

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107. Mercaldi,Garry A., Low selectivity deposition methods.

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108. Mercaldi,Garry A., Low selectivity deposition methods.

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109. Hong, Sukwon; Tran, Toan; Mallick, Abhijit; Liang, Jingmei; Ingle, Nitin K., Low shrinkage dielectric films.

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110. Samoilov, Arkadii, Low temperature etchant for treatment of silicon-containing surfaces.

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111. Samoilov,Arkadii V., Low temperature etchant for treatment of silicon-containing surfaces.

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112. Yudovsky,Joseph, Membrane gas valve for pulsing a gas.

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113. Xi,Ming; Sinha,Ashok; Kori,Moris; Mak,Alfred W.; Lu,Xinliang; Lai,Ken Kaung; Littau,Karl A., Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer.

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114. Ku, Vincent W.; Chen, Ling; Wu, Dien-Yeh; Ouye, Alan H.; Wysok, Irena, Method and apparatus for gas temperature control in a semiconductor processing system.

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115. Guenther, Rolf A., Method and apparatus for generating gas to a processing chamber.

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116. Ganguli, Seshadri; Ku, Vincent W.; Chung, Hua; Chen, Ling, Method and apparatus for monitoring solid precursor delivery.

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117. Ganguli, Seshadri; Chen, Ling; Ku, Vincent W., Method and apparatus for providing precursor gas to a processing chamber.

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118. Ganguli,Seshadri; Chen,Ling; Ku,Vincent W., Method and apparatus for providing precursor gas to a processing chamber.

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119. Chen,Ling; Ku,Vincent W.; Chung,Hua; Marcadal,Christophe; Ganguli,Seshadri; Lin,Jenny; Wu,Dien Yeh; Ouye,Alan; Chang,Mei, Method and apparatus of generating PDMAT precursor.

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120. Allsop, Nicholas; Fischer, Christian-Herbert; Gledhill, Sophie; Lux-Steiner, Martha Christina, Method and arrangement for producing an N-semiconductive indium sulfide thin layer.

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121. Kori, Moris; Mak, Alfred W.; Byun, Jeong Soo; Lei, Lawrence Chung-Lai; Chung, Hua, Method and system for controlling the presence of fluorine in refractory metal layers.

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122. Kori,Moris; Mak,Alfred W.; Byun,Jeong Soo; Lei,Lawrence Chung Lai; Chung,Hua; Sinha,Ashok; Xi,Ming, Method and system for controlling the presence of fluorine in refractory metal layers.

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123. Sinha,Ashok; Xi,Ming; Kori,Moris; Mak,Alfred W.; Byun,Jeong Soo; Lei,Lawrence Chung Lai; Chung,Hua, Method and system for controlling the presence of fluorine in refractory metal layers.

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124. Yu, Keven; Chandrachood, Madhavi; Sabharwal, Amitabh; Kumar, Ajay, Method for etching EUV material layers utilized to form a photomask.

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125. Ranish, Joseph M.; Singh, Kaushal K., Method for forming silicon-containing materials during a photoexcitation deposition process.

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126. Singh, Kaushal K.; Ranish, Joseph M., Method for forming silicon-containing materials during a photoexcitation deposition process.

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127. Singh, Kaushal K.; Ranish, Joseph M., Method for forming silicon-containing materials during a photoexcitation deposition process.

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128. Kori, Moris; Mak, Alfred W.; Byun, Jeong Soo; Lei, Lawrence Chung-Lai; Chung, Hua, Method for forming tungsten materials during vapor deposition processes.

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129. Kori, Moris; Mak, Alfred W.; Byun, Jeong Soo; Lei, Lawrence Chung-Lai; Chung, Hua; Sinha, Ashok; Xi, Ming, Method for forming tungsten materials during vapor deposition processes.

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130. Kori,Moris; Mak,Alfred W.; Byun,Jeong Soo; Lei,Lawrence Chung Lai; Chung,Hua; Sinha,Ashok; Xi,Ming, Method for forming tungsten materials during vapor deposition processes.

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131. Kori,Moris; Mak,Alfred W.; Byun,Jeong Soo; Lei,Lawrence Chung Lai; Chung,Hua; Sinha,Ashok; Xi,Ming, Method for forming tungsten materials during vapor deposition processes.

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132. Chen, Ling; Cao, Wei, Method for growing thin films by catalytic enhancement.

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133. Metzner, Craig; Kher, Shreyas; Kim, Yeong Kwan; Rocklein, M. Noel; George, Steven M., Method for hafnium nitride deposition.

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134. Leem Hyeun-seog,KRX, Method for manufacturing aluminum metal interconnection layer by atomic layer deposition method.

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135. Ganguli, Seshadri; Chen, Ling; Ku, Vincent W., Method for providing gas to a processing chamber.

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136. Verplancken, Donald J.; Sinha, Ashok K., Method of delivering activated species for rapid cyclical deposition.

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137. Matsuse, Kimihiro; Otsuki, Hayashi, Method of forming a metal film for electrode.

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138. Tois, Eva; Haukka, Suvi; Tuominen, Marko, Method of growing oxide thin films.

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139. Tois, Eva; Haukka, Suvi; Tuominen, Marko, Method of growing oxide thin films.

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140. Tois, Eva; Haukka, Suvi; Tuominen, Marko, Method of growing oxide thin films.

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141. Zhang,Zhihong; Nguyen,Tai Dung; Nguyen,Tue, Method to plasma deposit on organic polymer dielectric film.

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142. Zheng,Lingyi A.; Doan,Trung T.; Breiner,Lyle D.; Ping,Er Xuan; Beaman,Kevin L.; Weimer,Ronald A.; Kubista,David J.; Basceri,Cem, Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces.

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143. Beaman,Kevin L.; Weimer,Ronald A.; Breiner,Lyle D.; Ping,Er Xuan; Doan,Trung T.; Basceri,Cem; Kubista,David J.; Zheng,Lingyi A., Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers.

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144. Carpenter,Craig M.; Dando,Ross S.; Gealy,Dan; Derderian,Garo J.; Mardian,Allen P., Methods and apparatus for vapor processing of micro-device workpieces.

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145. Beaman, Kevin L.; Doan, Trung T.; Breiner, Lyle D.; Weimer, Ronald A.; Ping, Er-Xuan; Kubista, David J.; Basceri, Cem; Zheng, Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition.

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146. Beaman, Kevin L.; Doan, Trung T.; Breiner, Lyle D.; Weimer, Ronald A.; Ping, Er-Xuan; Kubista, David J.; Basceri, Cem; Zheng, Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, E.G., CVD deposition.

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147. Beaman,Kevin L.; Doan,Trung T.; Breiner,Lyle D.; Weimer,Ronald A.; Ping,Er Xuan; Kubista,David J.; Basceri,Cem; Zheng,Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition.

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148. Myo, Nyi Oo; Cho, Kenric; Kher, Shreyas; Narwankar, Pravin; Poppe, Steve; Metzner, Craig R.; Deaten, Paul, Methods for atomic layer deposition of hafnium-containing high-K dielectric materials.

     상세보기
149. Carpenter, Craig M.; Dando, Ross S.; Mardian, Allen P., Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces.

     상세보기
150. Carpenter,Craig M.; Dynka,Danny, Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers.

     상세보기
151. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.

     상세보기
152. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.

     상세보기
153. Lai, Ken Kaung; Rajagopalan, Ravi; Khandelwal, Amit; Moorthy, Madhu; Gandikota, Srinivas; Castro, Joseph; Gelatos, Avgerinos V.; Knepfler, Cheryl; Jian, Ping; Fang, Hongbin; Huang, Chao-Ming; Xi, Ming; Yang, Michael X.; Chung, Hua; Byun, Jeong Soo, Methods for depositing tungsten layers employing atomic layer deposition techniques.

     상세보기
154. Lai,Ken Kaung; Rajagopalan,Ravi; Khandelwal,Amit; Moorthy,Madhu; Gandikota,Srinivas; Castro,Joseph; Gelatos,Averginos V.; Knepfler,Cheryl; Jian,Ping; Fang,Hongbin; Huang,Chao Ming; Xi,Ming; Yang,Michael X.; Chung,Hua; Byun,Jeong Soo, Methods for depositing tungsten layers employing atomic layer deposition techniques.

     상세보기
155. Huang, Yi-Chiau; Ishii, Masato; Sanchez, Errol, Methods for forming silicon germanium layers.

     상세보기
156. Zheng, Lingyi A.; Doan, Trung T.; Breiner, Lyle D.; Ping, Er-Xuan; Beaman, Kevin L.; Weimer, Ronald A.; Basceri, Cem; Kubista, David J., Methods for forming small-scale capacitor structures.

     상세보기
157. Derderian, Garo J.; Sandhu, Gurtej, Methods for forming thin layers of materials on micro-device workpieces.

     상세보기
158. Grimbergen, Michael N., Methods for reducing photoresist interference when monitoring a target layer in a plasma process.

     상세보기
159. Kim, Yihwan; Lam, Andrew M., Methods of controlling morphology during epitaxial layer formation.

     상세보기
160. Kim, Yihwan; Ye, Zhiyuan; Zojaji, Ali, Methods of forming carbon-containing silicon epitaxial layers.

     상세보기
161. Basceri,Cem, Methods of gas delivery for deposition processes and methods of depositing material on a substrate.

     상세보기
162. Kim, Yihwan; Samoilov, Arkadii V., Methods of selective deposition of heavily doped epitaxial SiGe.

     상세보기
163. Kim,Yihwan; Samoilov,Arkadii V., Methods of selective deposition of heavily doped epitaxial SiGe.

     상세보기
164. Samoilov,Arkadii V.; Kim,Yihwan; Sanchez,Errol; Dalida,Nicholas C., Methods to fabricate MOSFET devices using a selective deposition process.

     상세보기
165. Samoilov,Arkadii V.; Kim,Yihwan; Sanchez,Errol; Dalida,Nicholas C., Methods to fabricate MOSFET devices using selective deposition process.

     상세보기
166. Zheng,Lingyi A.; Doan,Trung T.; Breiner,Lyle D.; Ping,Er Xuan; Weimer,Ronald A.; Kubista,David J.; Beaman,Kevin L.; Basceri,Cem, Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces.

     상세보기
167. Basceri,Cem; Doan,Trung T.; Weimer,Ronald A.; Beaman,Kevin L.; Breiner,Lyle D.; Zheng,Lingyi A.; Ping,Er Xuan; Sarigiannis,Demetrius; Kubista,David J., Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces.

     상세보기
168. Basceri,Cem; Doan,Trung T.; Weimer,Ronald A.; Beaman,Kevin L.; Breiner,Lyle D.; Zheng,Lingyi A.; Ping,Er Xuan; Sarigiannis,Demetrius; Kubista,David J., Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces.

     상세보기
169. Yang, Michael Xi; Yoon, Hyungsuk Alexander; Zhang, Hui; Fang, Hongbin; Xi, Ming, Multiple precursor cyclical deposition system.

     상세보기
170. Nguyen,Tue, Plasma enhanced pulsed layer deposition.

     상세보기
171. Mahajani, Maitreyee; Yudovsky, Joseph; McDougall, Brendan, Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool.

     상세보기
172. Yang, Michael X.; Itoh, Toshio; Xi, Ming, Plasma-enhanced cyclic layer deposition process for barrier layers.

     상세보기
173. Yang,Michael X.; Itoh,Toshio; Xi,Ming, Plasma-enhanced cyclic layer deposition process for barrier layers.

     상세보기
174. Mahajani, Maitreyee, Pretreatment processes within a batch ALD reactor.

     상세보기
175. Mahajani,Maitreyee, Pretreatment processes within a batch ALD reactor.

     상세보기
176. Ganguli, Seshadri; Yu, Sang-Ho; Phan, See-Eng; Chang, Mei; Khandelwal, Amit; Ha, Hyoung-Chan, Process for forming cobalt and cobalt silicide materials in tungsten contact applications.

     상세보기
177. Ganguli, Seshadri; Yu, Sang-Ho; Phan, See-Eng; Chang, Mei; Khandelwal, Amit; Ha, Hyoung-Chan, Process for forming cobalt and cobalt silicide materials in tungsten contact applications.

     상세보기
178. Ganguli, Seshadri; Chu, Schubert S.; Chang, Mei; Yu, Sang-Ho; Moraes, Kevin; Phan, See-Eng, Process for forming cobalt-containing materials.

     상세보기
179. Ku,Vincent; Chen,Ling; Grunes,Howard; Chung,Hua, Processing chamber configured for uniform gas flow.

     상세보기
180. Lu, Xinliang; Jian, Ping; Yoo, Jong Hyun; Lai, Ken Kaung; Mak, Alfred W.; Jackson, Robert L.; Xi, Ming, Pulsed deposition process for tungsten nucleation.

     상세보기
181. Lu,Xinliang; Jian,Ping; Yoo,Jong Hyun; Lai,Ken Kaung; Mak,Alfred W.; Jackson,Robert L.; Xi,Ming, Pulsed nucleation deposition of tungsten layers.

     상세보기
182. Dando, Ross S., Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.

     상세보기
183. Dando, Ross S., Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.

     상세보기
184. Miller, Matthew W.; Basceri, Cem, Reactors, systems and methods for depositing thin films onto microfeature workpieces.

     상세보기
185. Yudovsky, Joseph, Rotary gas valve for pulsing a gas.

     상세보기
186. Carlson, David K.; Kuppurao, Satheesh; Sanchez, Errol Antonio C.; Beckford, Howard; Kim, Yihwan, Selective deposition.

     상세보기
187. Kim, Yihwan; Samoilov, Arkadii V., Selective epitaxy process with alternating gas supply.

     상세보기
188. Kim, Yihwan; Samoilov, Arkadii V., Selective epitaxy process with alternating gas supply.

     상세보기
189. Kim,Yihwan; Samoilov,Arkadii V., Selective epitaxy process with alternating gas supply.

     상세보기
190. Sandhu, Gurtej; Derderian, Garo J., Semiconductor device with novel film composition.

     상세보기
191. Sandhu, Gurtej; Derderian, Garo J., Semiconductor device with novel film composition.

     상세보기
192. Tsai Chuang-Chuang ; Yao William W. ; Fulks Ronald T., Sensor with doped microcrystalline silicon channel leads with bubble formation protection means.

     상세보기
193. Sherman, Arthur, Sequential chemical vapor deposition.

     상세보기
194. Sherman, Arthur, Sequential chemical vapor deposition.

     상세보기
195. Cao, Wei; Chung, Hua; Ku, Vincent W.; Chen, Ling, Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor.

     상세보기
196. Cao, Wei; Chung, Hua; Ku, Vincent; Chen, Ling, Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor.

     상세보기
197. Cao, Wei; Chung, Hua; Ku, Vincent; Chen, Ling, Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor.

     상세보기
198. Matero, Raija H.; Haukka, Suvi P., Silicon dioxide thin films by ALD.

     상세보기
199. Comita, Paul B.; Scudder, Lance A.; Carlson, David K., Silicon-containing layer deposition with silicon compounds.

     상세보기
200. Singh, Kaushal K.; Comita, Paul B.; Scudder, Lance A.; Carlson, David K., Silicon-containing layer deposition with silicon compounds.

     상세보기
201. Singh, Kaushal K.; Comita, Paul B.; Scudder, Lance A.; Carlson, David K., Silicon-containing layer deposition with silicon compounds.

     상세보기
202. Glenn, W. Benjamin; Verplancken, Donald J., Simultaneous cyclical deposition in different processing regions.

     상세보기
203. Olsen, Christopher; Narwankar, Pravin K.; Kher, Shreyas S.; Thakur, Randhir; Muthukrishnan, Shankar; Kraus, Philip A., Stabilization of high-k dielectric materials.

     상세보기
204. Schieve, Eric W.; Koai, Keith K.; Or, David T.; Correa, Rene T., Substrate support lift mechanism.

     상세보기
205. Xi, Ming; Yang, Michael; Zhang, Hui, System and method for forming an integrated barrier layer.

     상세보기
206. Mak, Alfred W.; Chang, Mei; Byun, Jeong Soo; Chung, Hua; Sinha, Ashok; Kori, Moris, System and method to form a composite film stack utilizing sequential deposition techniques.

     상세보기
207. Sarigiannis,Demetrius; Meng,Shuang; Derderian,Garo J., Systems and methods for depositing material onto microfeature workpieces in reaction chambers.

     상세보기
208. Kubista, David J.; Doan, Trung T.; Breiner, Lyle D.; Weimer, Ronald A.; Beaman, Kevin L.; Ping, Er-Xuan; Zheng, Lingyi A.; Basceri, Cem, Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers.

     상세보기
209. Gelatos, Avgerinos V.; Lee, Sang-Hyeob; Yuan, Xiaoxiong; Umotoy, Salvador P.; Chang, Yu; Tzu, Gwo-Chuan; Renuart, Emily; Lin, Jing; Lai, Wing-Cheong; Le, Sang Q., Temperature controlled lid assembly for tungsten nitride deposition.

     상세보기
210. Wang, Shulin; Kroemer, Ulrich; Luo, Lee; Chen, Aihua; Li, Ming, Tungsten nitride atomic layer deposition processes.

     상세보기
211. Wang,Shulin; Kroemer,Ulrich; Luo,Lee; Chen,Aihua; Li,Ming, Tungsten nitride atomic layer deposition processes.

     상세보기
212. Ye, Zhiyuan; Kim, Yihwan; Li, Xiaowei; Zojaji, Ali; Dalida, Nicholas C.; Tang, Jinsong; Chen, Xiao; Samoilov, Arkadii V., Use of CL2 and/or HCL during silicon epitaxial film formation.

     상세보기
213. Ye, Zhiyuan; Kim, Yihwan; Li, Xiaowei; Zojaji, Ali; Dalida, Nicholas C.; Tang, Jinsong; Chen, Xiao; Samoilov, Arkadii V., Use of Cl2 and/or HCl during silicon epitaxial film formation.

     상세보기
214. Ye, Zhiyuan; Kim, Yihwan; Li, Xiaowei; Zojaji, Ali; Dalida, Nicholas C.; Tang, Jinsong; Chen, Xiao; Samoilov, Arkadii V., Use of Cl2 and/or HCl during silicon epitaxial film formation.

     상세보기
215. Lu, Siqing; Chang, Yu; Sun, Dongxi; Dang, Vinh; Yang, Michael X.; Chang, Anzhong; Nguyen, Anh N.; Xi, Ming, Valve control system for atomic layer deposition chamber.

     상세보기
216. Lu,Siqing; Chang,Yu; Sun,Dongxi; Dang,Vinh; Yang,Michael X.; Chang,Anzhong (Andrew); Nguyen,Anh N.; Xi,Ming, Valve control system for atomic layer deposition chamber.

     상세보기
217. Ku,Vincent W.; Chen,Ling; Wu,Dien Yeh, Valve design and configuration for fast delivery system.

     상세보기
218. Ku,Vincent W.; Chen,Ling; Wu,Dien Yeh, Valve design and configuration for fast delivery system.

     상세보기
219. Lee, Sang-Hyeob; Gelatos, Avgerinos V.; Wu, Kai; Khandelwal, Amit; Marshall, Ross; Renuart, Emily; Lai, Wing-Cheong Gilbert; Lin, Jing, Vapor deposition of tungsten materials.

     상세보기
220. Kuse,Ronald John, Variable temperature and dose atomic layer deposition.

     상세보기
221. Doan,Trung Tri, Variable temperature deposition methods.

     상세보기
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