[특허]Precision cleaning vessel

Precision cleaning vessel 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B08B-003/10 B08B-003/12
출원번호	US-0339026 (1994-11-14)
발명자 / 주소	Smith Jr. Charles W. (Fairview PA) Rosio Larry R. (Fairview PA) Shore Stephen H. (Erie PA)
출원인 / 주소	Snap-Tite, Inc. (Erie PA 02)
인용정보	피인용 횟수 : 69 인용 특허 : 0

초록 ▼

A method for precision cleaning of a workpiece with a cleaning fluid comprising liquid and/or supercritical fluid carbon dioxide and a primary solvent which is liquid at ambient temperatures and pressures comprises first placing the workpiece in a pressurizable vessel with a removable lid and within an inner tank open at the top; supplying the primary solvent to the inner tank; flushing the primary solvent through the pressure vessel; draining the inner tank to remove the primary solvent; and then supplying liquid and/or supercritical fluid carbon dioxide to the pressure vessel and flushing it through the vessel by withdrawing it from near the bottom of the inner tank.

대표청구항 ▼

Apparatus for precision cleaning of a workpiece with a cleaning fluid which includes liquid carbon dioxide and/or supercritical fluid carbon dioxide and a primary solvent which is liquid at ambient temperatures and pressures comprising: a pressure vessel with a removable outer lid having a magnetic coupling mounted therein; an inner tank open at the top defining a workspace into which the workpiece can be placed, said inner tank positioned within the pressure vessel; a baffle within the inner tank which in cooperation with the inner tank defines a recirculation space, said baffle having openings therein near the bottom of the tank; an inner lid for closing the top of the inner tank, said inner lid defining an impeller chamber separately in communication with the workspace and the recirculation space; an impeller in said impeller chamber connected to a drive shaft extending into said magnetic coupling; means to supply the primary solvent to the inner tank without contaminating the interior walls of the pressure vessel; means to withdraw the primary solvent from the inner tank without contaminating the inner walls of the pressure vessel; means to supply liquid carbon dioxide and/or supercritical fluid carbon dioxide to the pressure vessel; means to withdraw liquid carbon dioxide and/or supercritical carbon dioxide through the vessel drawing the liquid carbon dioxide and/or supercritical fluid carbon dioxide from the interior of the tank; whereby when said inner tank is filled with the cleaning fluid, the impeller can be driven through the magnetic coupling to draw the cleaning fluid up out of the workspace and to direct the cleaning fluid into the recirculation space between the baffle and inner wall of the inner tank.

이 특허를 인용한 특허 (69)

Mount, David J., Adding energy to a cleaning process fluid for removing photo resist, residues and particles from semiconductor substrates, photo masks, reticles, disks and flat-panel displays.
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Shrinivasan,Krishnan; Banerjee,Souvik; Juarez,Francisco; Reinhardt,Karen A.; Gopinath,Sanjay, Apparatus and methods for processing semiconductor substrates using supercritical fluids.
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Marshall, Mary C.; Franjione, John G.; Freitas, Christopher J.; Roberds, William T.; Pollard, Gordon D.; Blake, Jill, Apparatus for contaminant removal using natural convection flow and changes in solubility concentrations by temperature.
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Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
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Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
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Birtcher, Charles Michael; Martinez, Martin Castaneda; Steidl, Thomas Andrew; Vivanco, Gil; Silva, David James, Cabinet for chemical delivery with solvent purging.
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Birtcher,Charles Michael; Martinez,Martin Castaneda; Steidl,Thomas Andrew; Vivanco,Gil; Silva,David James, Cabinet for chemical delivery with solvent purging and removal.
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Kabashima, Kazuo; Kato, Kenichi; Matsumoto, Shoji, Cleaning agent, cleaning method and cleaning apparatus.
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Kabashima, Kazuo; Kato, Kenichi; Matsumoto, Shoji, Cleaning agent, cleaning method and cleaning apparatus.
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Wohlgemuth, Oliver, Cleaning device for rotationally symmetrical bodies.
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DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.
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DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.
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DeSimone Joseph M. ; Romack Timothy J. ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.
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Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
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McDermott,Wayne Thomas; Ockovic,Richard Carl; Schwarz,Alexander, Dense phase processing fluids for microelectronic component manufacture.
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Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
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Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
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Jones, William D., High pressure fourier transform infrared cell.
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Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
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Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
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Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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Luczak, Mariusz J., Manual check valve for priming a collapsible fluid liner for a sprayer.
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Tix, Joseph E.; Quam, Paul R.; Ross, Daniel P., Melter.
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Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
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Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
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Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
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Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
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Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
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Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
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Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
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Zorn, Christof; Grimme, Ralf, Method and tool for cleaning cavities.
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Hendrix Walter A. ; Montero Gerardo A. ; Smith C. Brent ; Butcher Donald L., Method for introducing dyes and other chemicals into a textile treatment system.
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Hendrix, Walter A.; Montero, Gerardo A.; Smith, C. Brent; Butcher, Donald L., Method for introducing dyes and other chemicals into a textile treatment system.
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Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
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Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
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Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
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Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
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Smith Carl Brent ; Montero Gerardo A. ; Hendrix Walter A., Method of dyeing hydrophobic textile fibers with colorant materials in supercritical fluid carbon dioxide.
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DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Method of entraining solid particulates in carbon dioxide fluids.
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Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
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Zorich, Robert Sam; Roberts, David Allen; Voloshin, George Oleg, Multiple contents container assembly for ultrapure solvent purging.
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Zorich, Robert Sam; Roberts, David Allen; Voloshin, George Oleg, Multiple contents container assembly for ultrapure solvent purging.
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Zorich, Robert Sam; Roberts, David Allen; Voloshin, George Oleg, Multiple contents container assembly for ultrapure solvent purging.
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Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
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Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
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Wuester,Christopher D., Process flow thermocouple.
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Smith, Carl Brent; Hendrix, Walter A.; Butcher, Donald L., Process for treating textile substrates.
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McDermott,Wayne Thomas; Subawalla,Hoshang; Johnson,Andrew David; Schwarz,Alexander, Processing of semiconductor components with dense processing fluids and ultrasonic energy.
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Steidl, Thomas Andrew; Vivanco, Gildardo; Birtcher, Charles Michael, Purgeable container for low vapor pressure chemicals.
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Birtcher, Charles Michael; Martinez, Martin Castaneda; Steidl, Thomas Andrew; Vivanco, Gil; Silva, David James, Purgeable manifold for low vapor pressure chemicals containers.
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Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.
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Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
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Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
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William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.
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Voloshin George Oleg ; Zorich Robert Sam, Solvent purge mechanism.
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Voloshin George Oleg ; Zorich Robert Sam, Solvent purge mechanism.
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Shultz, Mark D.; Hines, Bradley H.; Wojciechowski, Craig J., Sprayer fluid supply with collapsible liner.
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Chandra, Mohan; Mount, David J.; Costantini, Michael A.; Moritz, Heiko D.; Jafri, Ijaz; Boyd, Jim; Heathwaite, Rick M., Supercritical fluid cleaning process for precision surfaces.
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Costantini, Michael A.; Chandra, Mohan; Moritz, Heiko D.; Jafri, Ijaz H.; Mount, David J.; Heathwaite, Rick M., Supercritical fluid delivery and recovery system for semiconductor wafer processing.
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Joyce, Patrick C.; Tipton, Adrianne; Shrinivasan, Krishnan; Hess, Dennis W.; Myneni, Satyanarayana; Levitin, Galit, Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials.
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Fury,Michael A.; Sherrill,Robert Wade, System and method for mid-pressure dense phase gas and ultrasonic cleaning.
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Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
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Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
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Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
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Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
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Severns, John Cort; Hartman, Frederick Anthony; Burckett-St. Laurent, James Charles Theophile Roger; Noyes, Anna Vadimovna; Radomyselski, Arseni V.; France, Paul Amaat; Scheibel, Jeffrey John; Thoen,, Washing apparatus.
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Severns,John Cort; Hartman,Frederick Anthony; Burckett St. Laurent,James Charles Theophile Roger; Noyes,Anna Vadimovna; Radomyselski,Arseni V.; France,Paul Amaat; Scheibel,Jeffrey John; Thoen,Christiaan Arthur Jacques Kamiel; Deak,John Christopher; Vinson,Phillip Kyle; Sakkab,Nabil Yaqub, Washing apparatus.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
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저장형식	Text(ASCII format) Excel format PIAS분석(.xls)
메일정보	받는사람 (필수) @ 보내는사람 (선택) @ 제목 내용 KISTI 검색결과 이메일 서비스
안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

연합인증

Precision cleaning vessel 원문보기

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Precision cleaning vessel 원문보기

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이 특허를 인용한 특허 (69)

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