초록 ▼

Drying of particulate materials, such as wood chips (wafers/strands) for the manufacture of oriented structural board, as well as bark, and the like. The method is characterized by advancing wafers in random array and superposed and without contact above a planar surface; forcing heated air upwardly

Drying of particulate materials, such as wood chips (wafers/strands) for the manufacture of oriented structural board, as well as bark, and the like. The method is characterized by advancing wafers in random array and superposed and without contact above a planar surface; forcing heated air upwardly through spaced apart holes defined in the stationary planar surface and through the random array of advancing wafers, while evacuating heated air and accumulated moisture above the advancing wafers. The method is distinguished by lateral shielding during forcing of heated air above the planar surface, so as to inhibit “blow-holes”among the drying wafers.

대표청구항 ▼

Flatline method of drying wafers comprising: a. advancing wafers in random array on a flat wire conveyor belt having laterally restrictive openings with the wood wafers being supported upon the conveyor and the conveyor being supported on a planar surface, such that said wafers are substantially sus

Flatline method of drying wafers comprising: a. advancing wafers in random array on a flat wire conveyor belt having laterally restrictive openings with the wood wafers being supported upon the conveyor and the conveyor being supported on a planar surface, such that said wafers are substantially suspended without contact above the planar surface; b. forcing heated air upwardly through spaced-apart holes of varying diameter and distribution defined in the planar surface, while laterally shielding heated air above the planar surface, then forcing heated air through the random array of advancing wafers, wherein the size and distribution of holes within the planar surface are a control of distributing heated air; c. evacuating heated air and accumulated moisture from above said advancing wafers, and d. recovering wafers at an end of the planar surface.