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Advanced equipment control system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06F-019/00
출원번호 US-0277385 (1994-07-19)
발명자 / 주소
  • Agrawal Mukul (Plymouth MN) Orrock James E. (Eden Prairie MN) Patiath Pradip K. (Brooklyn Park MN) Rachor Lloyd A. (Brooklyn Park MN)
출원인 / 주소
  • Honeywell Inc. (Minneapolis MN 02)
인용정보 피인용 횟수 : 124  인용 특허 : 0

초록

The present invention relates to a control solution development environment coupled to a runtime environment constructed to insulate the control solution designer as well as the developed control applications from both the hardware and the operating system. This insulation frees the designer from ha

대표청구항

An advanced equipment control system, comprising: a development environment further comprising a database configuration tool and a control application development tool, said database configuration tool and said control application development tool each including a processor means for defining and th

이 특허를 인용한 특허 (124)

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