Extended end cap monomer for making advanced composites
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IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C07D-207/456
C07D-209/48
C07D-209/72
출원번호
US-0464989
(1995-06-05)
발명자
/ 주소
Sheppard Clyde H. (Bellevue WA) Lubowitz Hyman R. (Rolling Hills Estates CA)
출원인 / 주소
The Boeing Company (Seattle WA 02)
인용정보
피인용 횟수 :
12인용 특허 :
365
초록▼
The solvent-resistance and thermal stability of polyamideimides of the general formulae: [Figure] or [Figure] is improved by capping the amideimides with a crosslinking functionality (Y) containing a residue selected from the group of: [Figure] [Figure] [Figure] wherein R1=lower alkyl, lower alkoxy,
The solvent-resistance and thermal stability of polyamideimides of the general formulae: [Figure] or [Figure] is improved by capping the amideimides with a crosslinking functionality (Y) containing a residue selected from the group of: [Figure] [Figure] [Figure] wherein R1=lower alkyl, lower alkoxy, aryl, aryloxy, substituted alkyl, substituted aryl (either including hydroxyl or halo-substituents), halogen, or mixtures thereof; j=0, 1, or 2; G=-CH2-, -O-, -S-, -SO2-, -SO-, -CO-, -CHR-, or -C(R)2-; R=hydrogen, lower alkyl, or phenyl; T=methallyl or allyl; Me=methyl; R2=a trivalent organic radical; and R3=a divalent organic radical. The amideimide oligomers may be linear or multidimensional, and can be processed into blends, prepregs, or composites. Methods of making these amideimides and intermediates useful in the syntheses are also described. One such intermediate has the general formula: Yi-CONH-R3-NH2 and is the focus of the present application.
대표청구항▼
An amine intermediate useful in synthesizing crosslinking polyamideimide oligomers, of the formula: Yi--CONH-R3-NH2 wherein =phenyl; i=1 or 2; R3=a divalent organic radical; [Figure] [Figure] [Figure] R1=any of lower alkyl, lower alkoxy, aryl, aryloxy, substituted alkyl, substituted aryl, or haloge
An amine intermediate useful in synthesizing crosslinking polyamideimide oligomers, of the formula: Yi--CONH-R3-NH2 wherein =phenyl; i=1 or 2; R3=a divalent organic radical; [Figure] [Figure] [Figure] R1=any of lower alkyl, lower alkoxy, aryl, aryloxy, substituted alkyl, substituted aryl, or halogen, j=0, 1, or 2; G=-CH2-, -O-, -S-, -SO2-, -SO-, -CO-, -CHR-, or -C(R)2-; R=hydrogen, lower alkyl, or phenyl; T=methallyl or allyl; and Me=methyl.
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이 특허에 인용된 특허 (365)
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