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Optical apparatus and method for measuring temperature of a substrate material with a temperature dependent band gap 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01K-011/00
  • G01J-005/48
출원번호 US-0343097 (1994-11-21)
발명자 / 주소
  • Johnson Shane R. (2626 Tennis Crescent Vancouver
  • B.C. CAX) Lavoie Christian (2626 Tennis Crescent Vancouver
  • B.C. CAX V6T 2E1 ) Nissen Mark K. (215-2190 West 7th Avenue Vancouver
  • B.C. CAX V6K 4K
인용정보 피인용 횟수 : 39  인용 특허 : 0

초록

An optical method for measuring the temperature of a substrate material with a temperature dependent bandgap. The substrate is illuminated with a broad spectrum lamp and the bandgap is determined from the spectrum of the diffusely scattered light. The spectrum of the light from the lamp is sufficien

대표청구항

An optical method for measuring the temperature of a substrate material in a process chamber comprising: (a) emitting radiation from an external light source to thereby cause broad spectrum radiation to be incident upon the front surface of the substrate; (b) placing a diffuse scattering element at

이 특허를 인용한 특허 (39)

  1. Taylor, II, Charles A.; Barlett, Darryl; Perry, Douglas; Clarke, Roy; Williams, Jason, Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing.
  2. Taylor, II, Charles A.; Barlett, Darryl; Perry, Douglas; Clarke, Roy; Williams, Jason, Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing.
  3. Johnson,Shane R.; Zhang,Yong Hang; Johnson,Wayne L., Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy.
  4. Alers Glenn B. ; Fleming Robert M. ; Levine Barry Franklin ; Thomas Gordon Albert, Apparatus for processing silicon devices with improved temperature control.
  5. Barlett, Darryl; Wissman, Barry D.; Taylor, II, Charles A., Blackbody fitting for temperature determination.
  6. Wang, Fuchao; Le Neel, Olivier; Shankar, Ravi, Closed loop temperature controlled circuit to improve device stability.
  7. Haran,Frank M., Combined paper sheet temperature and moisture sensor.
  8. Mullin, Richard S.; Kuzmichev, Anatoly; Belousov, Igor V.; Kononenko, Yuriy G.; Pankov, Oleg G.; Ryzhikov, Dmitriy, Deposition substrate temperature and monitoring.
  9. Timans, Paul Janis, Determining the temperature of silicon at high temperatures.
  10. Patalay, Kailash Kiran, Low temperature measurement and control using low temperature pyrometry.
  11. Bates,Daniel, Material analysis.
  12. Sasson Somekh ; Manoocher Birang, Method and apparatus for measuring reflectivity of deposited films.
  13. Yaroslavsky, Mikhail, Method and apparatus for non-contact, in-situ temperature measurement of a substrate film during chemical vapor deposition of the substrate film.
  14. Ignatowicz,Steven, Method and apparatus for obtaining a temperature measurement using an InGaAs detector.
  15. Trupke, Thorsten; Bardos, Robert Andrew, Method and system for inspecting indirect bandgap semiconductor structure.
  16. Trupke, Thorsten; Bardos, Robert Andrew, Method and system for inspecting indirect bandgap semiconductor structure.
  17. Dils Ray ; Meadows Robert D., Method for controlling the temperature of a layer growing on a wafer.
  18. Johnson Shane R. ; Tiedje J. Thomas,CAXITX V6T 1W1, Method for determining the temperature of semiconductor substrates from bandgap spectra.
  19. Simpson, Ceber, Method to measure the characteristics in an electrical component.
  20. Steger, Robert J., Methods and apparatus for in situ substrate temperature monitoring.
  21. Camm, David Malcolm; Sempere, Guillaume; Kaludjercic, Ljubomir; Stuart, Gregory; Bumbulovic, Mladen; Tran, Tim; Dets, Sergiy; Komasa, Tony; Rudolph, Marc; Cibere, Joseph, Methods and systems for supporting a workpiece and for heat-treating the workpiece.
  22. Timans, Paul Janis, Methods for determining wafer temperature.
  23. Szetsen Steven Lee TW, Optical temperature measurement as an in situ monitor of etch rate.
  24. Kawano, Hiroyuki; Okamoto, Tatsuki; Nakashima, Toshirou; Takashima, Kazuo, Radiant-temperature measurement device, light-source temperature control device, image projection apparatus and radiant-temperature measurement method.
  25. Ni Tuqiang ; Barnes Michael, Rapid IR transmission thermometry for wafer temperature sensing.
  26. Nishimura Yoji,JPX, Reduction projection aligner free from reaction product tarnishing photo-mask and method for transferring pattern image through the photo-mask.
  27. Holm Ronald T., Specular reflection optical bandgap thermometry.
  28. Shepard, Chester L.; Cannon, Bret D.; Khaleel, Mohammad A., System and method for glass processing and temperature sensing.
  29. Xiao Guoqing ; Paniccia Mario John, System and method for optically determining the temperature of a test object.
  30. Timans, Paul Janis, System and process for calibrating pyrometers in thermal processing chambers.
  31. Timans, Paul Janis, System and process for calibrating pyrometers in thermal processing chambers.
  32. Timans, Paul Janis, System and process for calibrating pyrometers in thermal processing chambers.
  33. Timans, Paul Janis, System and process for calibrating pyrometers in thermal processing chambers.
  34. Wada, Naoyuki; Kishi, Hiroyuki, Temperature control method of epitaxial growth apparatus.
  35. William G. Breiland ; Alexander I. Gurary ; Vadim Boguslavskiy, Temperature determination using pyrometry.
  36. Camm,David M.; Kervin,Shawna; Lefrancois,Marcel Edmond; Stuart,Greg, Temperature measurement and heat-treating methods and system.
  37. Camm, David M.; Kervin, Shawna; Lefrancois, Marcel Edmond; Stuart, Greg, Temperature measurement and heat-treating methods and systems.
  38. Barlett, Darryl; Taylor, II, Charles A.; Wissman, Barry D., Thin film temperature measurement using optical absorption edge wavelength.
  39. Camm, David Malcolm; Cibere, Joseph; Stuart, Greg; McCoy, Steve, Workpiece breakage prevention method and apparatus.
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