[특허]Single substrate vacuum processing apparatus having improved exhaust system

Single substrate vacuum processing apparatus having improved exhaust system 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C23C-016/00
출원번호	US-0277865 (1994-04-14)
발명자 / 주소	White John M. (Hayward CA)
출원인 / 주소	Applied Materials, Inc. (Santa Clara CA 02)
인용정보	피인용 횟수 : 83 인용 특허 : 0

초록 ▼

In a single substrate vacuum processing chamber for processing large glass substrates, a novel vacuum exhaust system is built into the lid of the chamber. A plenum chamber which is connected to a continuous vacuum pump is mounted around a gas dispersion plate, also built into the lid, and has continuous access to the reaction region of the chamber by means of a restricted access passage. The plenum chamber is large with respect to the access passage which provides uniform and continuous evacuation of process gases and particulates from the full periphery of the processing region. This design minimizes the deposition of particulates onto the large area substrate and onto the port by which the substrate enters and leaves the chamber and, by the same design, creates a chamber which has a small volume in relation to the size of the substrate is can process. The close proximity of the plenum chamber and the access passage to the plasma region facilitates the use of a periodic dry etch-clean plasma to help keep these exhaust regions clean between periodic manual cleanings. A further advantage of this design is that when the chamber is to be manually cleaned periodically, the lid is easily swung open, giving ready access to the plenum chamber in which particulates have accumulated, and without disturbing gas delivery and exhaust lines which are all built into the lid.

대표청구항 ▼

A vacuum processing chamber comprising a) a lid portion having a gas dispersion plate and a vacuum exhaust system therein; b) a chamber body comprising a support for a substrate to be processed; and c) a processing region formed between said gas dispersion plate and said support when said lid portion is closed against said chamber body. A method of processing a substrate in a vacuum chamber comprising a) closing a lid having a source of processing gas therein against a chamber body including a substrate support and a substrate mounted thereon opposite said source to form a processing region; b) passing said processing gas into said processing region, c) at least partially reacting said gas and said substrate to form a processing residue; and d) exhausting said processing residue upward into said lid.

이 특허를 인용한 특허 (83)

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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
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연합인증

Single substrate vacuum processing apparatus having improved exhaust system 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

이 특허를 인용한 특허 (83)

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연합인증

Single substrate vacuum processing apparatus having improved exhaust system 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

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이 특허를 인용한 특허 (83)

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