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Door drive mechanisms for substrate carrier and load lock 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-049/07
출원번호 US-0498597 (1995-07-06)
발명자 / 주소
  • Muka Richard S. (Topsfield MA)
출원인 / 주소
  • Brooks Automation, Inc. (Chelmsford MA 02)
인용정보 피인용 횟수 : 30  인용 특허 : 24

초록

A system is provided for batch loading semiconductor wafers into a load lock from a portable carrier used for supporting a plurality of the wafers in spaced relationship and transporting them in a particle free environment. The carrier is supported adjacent a load lock chamber which also has a parti

대표청구항

In combination with a system for batch loading semiconductor wafers including a portable carrier for supporting and transporting in a substantially particle free environment a plurality of the wafers in spaced generally stacked relationship, said carrier having a carrier port for providing access to

이 특허에 인용된 특허 (24)

  1. Cruz Didier (Grenoble FRX), Apparatus for placing or storing flat articles in a cassette with intermediate racks.
  2. Davis James C. (Carlisle MA) Brooks Norman B. (Carlisle MA), Articulated arm transfer device.
  3. Hendrickson Ruth A. (Lincoln MA), Articulated arm transfer device.
  4. Uehara, Akira; Hijikata, Isamu; Nakane, Hisashi; Nakayama, Muneo, Automatic plasma processing device and heat treatment device for batch treatment of workpieces.
  5. Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise JPX) Kawano Hitoshi (Ise JPX), Automatic transferring system using portable closed container.
  6. Maney George A. (Palo Alto CA) Faraco W. George (Saratoga CA) Parikh Mihir (San Jose CA), Box door actuated retainer.
  7. Parikh Mihir (San Jose CA) Bonora Anthony C. (Menlo Park CA) Faraco W. George (Saratoga CA) Huang Barney H. (Sunnyvale CA), Container having disposable liners.
  8. Shiraiwa Hirotsugu (Hino JPX), Conveyor apparatus.
  9. Thomas Michael E. (Milpitas CA) van de Van Everhardus P. (Cupertino CA) Broadbent Eliot K. (San Jose CA), Gas-based backside protection during substrate processing.
  10. Maney George A. (Sunnyvale CA) Bonora Anthony C. (Menlo Park CA) Parikh Mihir (San Jose CA) Brain Michael D. (Oakland CA), Intelligent system for processing and storing articles.
  11. Bonora Anthony C. (Menlo Park CA) O\Sullivan Andrew W. (Gilroy CA), Long arm manipulator for standard mechanical interface apparatus.
  12. Bonora Anthony C. (Menlo Park CA) O\Sullivan Andrew W. (Gilroy CA), Manipulator for standard mechanical interface apparatus.
  13. Bonora Anthony C. (Menlo Park CA) Guerre Gilles (Les Loges en Josas CA FRX) Parikh Mihir (San Jose CA) Rosenquist Frederick T. (Redwood City CA) Jain Sudhir (Santa Clara CA), Method and apparatus for transferring articles between two controlled environments.
  14. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.
  15. Maher, Jr., Joseph A.; Zafiropoulo, Arthur W., Multi-planar electrode plasma etching.
  16. Maher Joseph A. (South Hamilton MA) Vowles E. John (Goffstown NH) Napoli Joseph D. (Winham NH) Zafiropoulo Arthur W. (Manchester MA) Miller Mark W. (Burlington MA), Quad processor.
  17. Parikh Mihir (San Jose CA) Bonora Anthony C. (Menlo Park CA), Sealable transportable container having a particle filtering system.
  18. Bonora Anthony C. (Menlo Park CA) Rosenquist Frederick T. (Redwood City CA), Sealable transportable container having improved latch mechanism.
  19. Maney George A. (Palo Alto CA) O\Sullivan Andrew W. (Gilroy CA) Faraco W. George (Saratoga CA), Sealed standard interface apparatus.
  20. Bonora Anthony C. (Menlo Park CA), Short arm manipulator for standard mechanical interface apparatus.
  21. Duffy Thomas P. (Endicott NY) Hecht Lewis C. (Vestal NY) Sulger ; deceased Merritt P. (late of Brackney PA by Ellen Sulger ; executrix) Thiele Ernst E. (Endicott NY) Pierson Mark V. (Binghamton NY) W, Vacuum loading chuck and fixture for flexible printed circuit panels.
  22. Asano Takanobu (Yokohama JPX) Kitayama Hirofumi (Aikawa JPX) Iwai Hiroyuki (Sagamihara JPX) Ono Yuuji (Sagamihara JPX), Vertical heat-treatment apparatus having a wafer transfer mechanism.
  23. Sato Mitsuya (Yokohama JPX) Imai Shunzo (Yamato JPX) Hiraga Ryozo (Kanaga JPX), Wafer handling apparatus and method.
  24. Takahashi Kiyoshi (17-25 Hirai 7-chome Edogawa-ku ; Tokyo JPX) Takahashi Kazuo (17-3 Higashikasai 2-chome Edogawa-ku ; Tokyo JPX), Wafer transfer device.

이 특허를 인용한 특허 (30)

  1. Cook, Gregory; Chidlow, Craig; Ow, Rodney; Nugyen, Lang Van; Gomez, J. Rafael; Reyling, Steve; Aalund, Martin P.; Remis, Steven J., Apparatus and method for using a robot to remove a substrate carrier door.
  2. Genov ; deceased Genco ; Botev Roumen G. ; Todorov Alexander D., Automated opening and closing of ultra clean storage containers.
  3. Muka Richard S., Automated wafer buffer for use with wafer processing equipment.
  4. Miyajima, Toshihiko, Clean box, clean transfer method and apparatus therefor.
  5. Sasaki Yoshiaki,JPX ; Asakawa Teruo,JPX, Controlling gas in a multichamber processing system.
  6. Saeki, Hiroaki; Sasaki, Yoshiaki; Taniyama, Yasushi, Device for attaching target substrate transfer container to semiconductor processing apparatus.
  7. Nakashima, Takanobu; Matsunaga, Tatsuhisa; Yanagawa, Hidehiro, Dual loading port semiconductor processing equipment.
  8. Nakashima, Takanobu; Matsunaga, Tatsuhisa; Yanagawa, Hidehiro, Dual loading port semiconductor processing equipment.
  9. Provencher, Timothy J.; Hickson, Craig B., High temperature ALD inlet manifold.
  10. Todorov, Alexander; Genov, Mila, Integrated substrate handler having pre-aligner and storage pod access mechanism.
  11. Aggarwal, Ravinder K.; Stoutjesdijk, Jeroen; Hill, Eric R.; Davis, Loring G.; DiSanto, John T., Load lock having secondary isolation chamber.
  12. Aggarwal, Ravinder; Stoutjesdijk, Jeroen; Hill, Eric; Davis, Loring G.; DiSanto, John T., Load lock having secondary isolation chamber.
  13. Kenji Tokunaga JP, Load port system for substrate processing system, and method of processing substrate.
  14. Raaijmakers,Ivo; Aggarwal,Ravinder; Kusbel,James, Loadlock with integrated pre-clean chamber.
  15. Albert Hasper NL; Frank Huussen NL; Cornelis Marinus Kooijman NL; Theodorus Gerardus Maria Oosterlaken NL; Jack Herman Van Putten NL; Christianus Gerardus Maria Ridder NL; Gert-Jan Snijders NL, Method and device for transferring wafers.
  16. Sundar, Satish; Matthews, Ned G., Pneumatically actuated flexure gripper for wafer handling robots.
  17. Bonora, Anthony C.; Fosnight, William J.; Martin, Raymond S., Port door removal and wafer handling robotic system.
  18. Dunn, Todd; White, Carl; Halpin, Mike; Shero, Eric; Terhorst, Herbert; Winkler, Jerry, Pulsed valve manifold for atomic layer deposition.
  19. Iizuka Yoji,JPX ; Asakawa Teruo,JPX, Relay apparatus for relaying object to be treated.
  20. Weber, René, Robot-actuated door-opening device for a draft shield enclosure of an analytical balance.
  21. Yamagishi, Takayuki; Suwada, Masaei; Watanabe, Takeshi, Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections.
  22. Yamagishi,Takayuki; Suwada,Masaei; Watanabe,Takeshi, Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections.
  23. Kevin Thomas Ryan ; Peter Lawrence Kellerman ; Frank Sinclair ; Ernest Everett Allen ; Roger Bradford Fish, Serial wafer handling mechanism.
  24. Hofmeister Christopher, Substrate carrier as batchloader.
  25. Issei Ueda JP; Masami Akimoto JP; Kazuhiko Ito JP; Mitiaki Matsushita JP; Masatoshi Kaneda JP; Yuji Matsuyama JP, Substrate treatment system, substrate transfer system, and substrate transfer method.
  26. Ueda Issei,JPX ; Akimoto Masami,JPX ; Ito Kazuhiko,JPX ; Matsushita Mitiaki,JPX ; Kaneda Masatoshi,JPX ; Matsuyama Yuji,JPX, Substrate treatment system, substrate transfer system, and substrate transfer method.
  27. Ueda, Issei; Akimoto, Masami; Ito, Kazuhiko; Matsushita, Mitiaki; Kaneda, Masatoshi; Matsuyama, Yuji, Substrate treatment system, substrate transfer system, and substrate transfer method.
  28. Miyajima Toshihiko,JPX, Vacuum clean box, clean transfer method and apparatus therefor.
  29. White, Carl L.; Shero, Eric, Vapor flow control apparatus for atomic layer deposition.
  30. Kevin Thomas Ryan ; Peter Lawrence Kellerman ; Frank Sinclair ; Ernest Everett Allen ; Roger Bradford Fish, Wafer processing chamber having separable upper and lower halves.
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