초록 ▼

A method for forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field is described, characterized by that the electric power for generating the plasma has a pulsed waveform. The electric power typically is supplied by microwave, and the p

A method for forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field is described, characterized by that the electric power for generating the plasma has a pulsed waveform. The electric power typically is supplied by microwave, and the pulsed wave may be a complex wave having a two-step peak, or may be a complex wave obtained by complexing a pulsed wave with a stationary continuous wave of an electromagnetic wave having the same or different wavelength as that of the pulsed wave. The process enables deposition of a uniform film having an excellent adhesion to the substrate, at a reduced power consumption.

대표청구항 ▼

A plasma processing method comprising the steps of: introducing a reactive gas into a reaction chamber; inputting pulsed high frequency electromagnetic waves to said reaction chamber in order to produce a plasma of said reactive gas; treating a substrate with said plasma in said chamber; wherein the

A plasma processing method comprising the steps of: introducing a reactive gas into a reaction chamber; inputting pulsed high frequency electromagnetic waves to said reaction chamber in order to produce a plasma of said reactive gas; treating a substrate with said plasma in said chamber; wherein the high frequency electromagnetic waves are complex such that each pulse of said pulsed high frequency electromagnetic waves comprises at least first and second rectangular pulses having a different pulse height and occurring with a lapse of time therebetween, said second pulse occurring after said first pulse.