[특허]Photoimageable resist compositions containing photobase generator

[미국특허] Photoimageable resist compositions containing photobase generator 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G03C-001/73 G03F-007/031 G03F-007/032
출원번호	US-0228187 (1994-04-15)
발명자 / 주소	Pai Daniel Y. (Millbury MA) Rodriguez Stephen S. (Monument Beach MA) Cheetham Kevin J. (Millbury MA) Calabrese Gary S. (North Andover MA) Sinta Roger F. (Woburn MA)
출원인 / 주소	Shipley Company, L.L.C. (Marlborough MA 02)
인용정보	피인용 횟수 : 37 인용 특허 : 9

초록 ▼

A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.

대표청구항 ▼

An aqueous developable negative acting photoimageable resist composition that undergoes photobase-initiated hardening to produce a negative relief image upon exposure and development, the composition comprising an organic photobase generator compound, an aqueous base soluble resin binder selected from the group consisting of a novolak resin, a poly(vinylphenol) resin, a resin containing phenolic units and cyclic alcohol units, an acrylic resin, a resin having acrylic and phenolic units and a blend of an acrylic resin with a phenolic resin, and a compound that crosslinks with the resin binder in the presence of a base, said photobase generator compound being present in an amount sufficient to crosslink said compound with said resin binder to enable development of a coating layer of the photoimageable resist composition following exposure to activating radiation, the composition being free of an acid or acid generating material.

이 특허에 인용된 특허 (9) 인용/피인용 타임라인 분석

Ceintrey Claude (Neuville-les-Dieppe FRX) Crochemore Michel (Chaponost FRX), Diazotype materials which can be developed by heat and contain an activator precursor having 2-carboxy carboxamide group.
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Ochi Hideo (Kawasaki JPX) Shibata Yumi (Tokyo JPX) Nagasawa Kohtaro (Tokyo JPX), High energy radiation curable resist material and method of using the same.
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Hayashi Nobuyuki (Hitachi JA) Isobe Asao (Hitachi JA) Tsukada Katsushige (Hitachi JA) Ogawa Ken (Hitachi JA) Abo Masahiro (Hitachi JA), Image forming curable resin compositions.
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Sato Kozo (Kanagawa JPX) Naito Hideki (Kanagawa JPX), Method for forming an image.
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Irving Edward (Burwell GB2) Banks Christopher P. (Saffron Walden GB2), Method of forming images.
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Holoch Jan (Leimen DEX) Peter Roland (Mutterstadt DEX) Eisenbarth Philipp (Bad Duerkheim DEX) Allspach Thomas (Bad Duerkheim DEX), Novel polyphenol and thermosetting plastics prepared therefrom.
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Hayase Shuzi (Kawasaki JPX) Suzuki Shuichi (Yokohama JPX) Wada Moriyasu (Ninomiya JPX), Photo-curable epoxy resin type composition.
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Koike Mitsuru (Shizuoka JPX) Kita Nobuyuki (Shizuoka JPX), Photopolymerizable composition.
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Miyamura Masataka (Kamakura JPX) Wada Yusuke (Tokyo JPX) Nakagawa Toshiharu (Ayase JPX) Nakaizumi Yuji (Kawasaki JPX) Takeda Kazuhiro (Higashine JPX), Solder resist composition.
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이 특허를 인용한 특허 (37) 인용/피인용 타임라인 분석

Chen Kuang-Jung ; DellaGuardia Ronald A. ; Huang Wu-Song ; Katnani Ahmad D. ; Khojasteh Mahmoud M. ; Lin Qinghuang, Approach to formulating irradiation sensitive positive resists.
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Chen Kuang-Jung ; DellaGuardia Ronald A. ; Huang Wu-Song ; Katnani Ahmad D. ; Khojasteh Mahmoud M. ; Lin Quighuang, Approach to formulating irradiation sensitive positive resists.
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Nishimura,Isao; Bessho,Nobuo; Kumano,Atsushi; Yamada,Kenji, Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern.
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Nishimura, Isao; Bessho, Nobuo; Kumano, Atsushi; Shimokawa, Tsutomu; Yamada, Kenji, Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern.
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Kuang-Jung R. Chen ; Mark C. Hakey ; Steven J. Holmes ; Wu-Song Huang ; Paul A. Rabidoux, Hybrid resist based on photo acid/photo base blending.
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Foster Patrick ; Slater Sydney George ; Steinhausler Thomas ; Blakeney Andrew J. ; Biafore John Joseph, Hydroxy-amino thermally cured undercoat for 193 NM lithography.
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Foster,Patrick; Slater,Sydney George; Steinh？usler,Thomas; Blakeney,Andrew J.; Biafore,John Joseph, Hydroxy-amino thermally cured undercoat for 193 nm lithography.
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Matsui,Jun; Nakata,Hidehiko, Method for manufacturing device.
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Takeshita, Masaru, Method of forming resist pattern.
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Yokoya, Jiro; Nakamura, Tsuyoshi; Shimizu, Hiroaki; Nito, Hideto, Method of forming resist pattern.
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Yokoya, Jiro; Nakamura, Tsuyoshi; Shimizu, Hiroaki; Takeshita, Masaru; Nito, Hideto; Saito, Hirokuni, Method of forming resist pattern.
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Amou Satoru,JPX ; Suzuki Masao,JPX ; Suwa Tokihito,JPX ; Kawamoto Mineo,JPX ; Takahashi Akio,JPX ; Nemoto Masanori,JPX ; Fukai Hiroyuki,JPX ; Yokota Mitsuo,JPX ; Kobayashi Shiro,JPX ; Miyazaki Masash, Multilayer circuit board and photosensitive resin composition used therefor.
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Amou Satoru,JPX ; Suzuki Masao,JPX ; Suwa Tokihito,JPX ; Kawamoto Mineo,JPX ; Takahashi Akio,JPX ; Nemoto Masanori,JPX ; Fukai Hiroyuki,JPX ; Yokota Mitsuo,JPX ; Kobayashi Shiro,JPX ; Miyazaki Masash, Multilayer circuit board having insulating layer with via-holes.
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Chen, Chunwei; Lu, Ping Hung; Zhuang, Hong; Neisser, Mark, Nanocomposite photoresist composition for imaging thick films.
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Wang, Chien-Wei; Chang, Ching-Yu; Gau, Tsai-Sheng; Lin, Burn Jeng, Patterning process and chemical amplified photoresist with a photodegradable base.
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Wang, Chien-Wei; Chang, Ching-Yu; Gau, Tsai-Sheng; Lin, Burn Jeng, Patterning process and photoresist with a photodegradable base.
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Klinkenberg, Huig; Van Oorschot, Josephus Christiaan, Photoactivatable coating composition.
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Klinkenberg, Huig; Van Oorschot, Josephus Christiaan, Photoactivatable coating composition comprising a photolatent base.
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Cristiano Maria de Lurdes dos Santos,PTX ; Davies John Kynaston,GBX ; Dowd Sharon,GBX ; Johnstone Robert Alexander Walker,GBX ; Pratt Michael John,GBX ; Wade John Robert,GBX, Photoactive materials applicable to imaging systems.
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Wang, Chien-Wei; Chang, Ching-Yu; Lin, Burn Jeng, Photoresist and patterning process.
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Keesler, Ross W.; Konrad, John J.; Magnuson, Roy H.; Sinicki, Robert A., Photoresist composition with antibacterial agent.
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Tatsushi Kaneko JP; Kenji Koizumi JP; Satoshi Watanabe JP; Yoshitaka Yanagi JP, Photoresist compositions and patterning method.
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Wang, Chien-Wei; Chang, Ching-Yu, Photoresist stripping technique.
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Wang, Chien-Wei; Chang, Ching-Yu, Photoresist stripping technique.
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Arimitsu, Koji; Terada, Kiwamu, Photosensitive resin composition and cured product thereof.
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Akutsu Eiichi,JPX ; Ohtsu Shigemi,JPX ; Pu Lyong sun,JPX, Process for recording image.
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Shiraki, Shinji; Suzuki, Masayoshi; Sasaki, Hirofumi; Niwa, Kazuaki; Nishikawa, Michinori, Radiation sensitive composition for forming an insulating film, insulating film and display device.
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Yamada, Kenji; Bessho, Nobuo; Kumano, Atsushi; Konno, Keiji, Radiation sensitive refractive index changing composition and refractive index changing method.
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Hanamura,Masaaki; Nishikawa,Michinori; Kumano,Atsushi, Radiation sensitive refractive index changing composition, pattern forming method and optical material.
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Nishimura,Isao; Bessho,Nobuo; Kumano,Atsushi; Yamada,Kenji, Radiation-sensitive composition capable of having refractive index distribution.
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Nishimura,Isao; Bessho,Nobuo; Kumano,Atsushi; Shimokawa,Tsutomu; Yamada,Kenji, Radiation-sensitive composition changing in refractive index and method of changing refractive index.
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Nishimura,Isao; Bessho,Nobuo; Kumano,Atsushi; Yamada,Kenji, Radiation-sensitive composition changing in refractive index and utilization thereof.
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Nakamura, Tsuyoshi; Yokoya, Jiro; Shimizu, Hiroaki; Nito, Hideto, Resist composition and method of forming resist pattern.
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Nakamura, Tsuyoshi; Yokoya, Jiro; Shimizu, Hiroaki; Nito, Hideto, Resist composition and method of forming resist pattern.
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Shimizu, Hiroaki; Nakamura, Tsuyoshi; Yokoya, Jiro; Nito, Hideto, Resist composition and method of forming resist pattern.
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Shimizu, Hiroaki; Nakamura, Tsuyoshi; Yokoya, Jiro; Nito, Hideto, Resist composition and method of forming resist pattern.
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Shimizu, Hiroaki; Yokoya, Jiro; Nakamura, Tsuyoshi; Nito, Hideto, Resist composition and method of forming resist pattern.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] Photoimageable resist compositions containing photobase generator 원문보기