초록 ▼

A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invent

A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.

대표청구항 ▼

An aqueous developable negative acting photoimageable resist composition that undergoes photobase-initiated hardening to produce a negative relief image upon exposure and development, the composition comprising an organic photobase generator compound, an aqueous base soluble resin binder selected fr

An aqueous developable negative acting photoimageable resist composition that undergoes photobase-initiated hardening to produce a negative relief image upon exposure and development, the composition comprising an organic photobase generator compound, an aqueous base soluble resin binder selected from the group consisting of a novolak resin, a poly(vinylphenol) resin, a resin containing phenolic units and cyclic alcohol units, an acrylic resin, a resin having acrylic and phenolic units and a blend of an acrylic resin with a phenolic resin, and a compound that crosslinks with the resin binder in the presence of a base, said photobase generator compound being present in an amount sufficient to crosslink said compound with said resin binder to enable development of a coating layer of the photoimageable resist composition following exposure to activating radiation, the composition being free of an acid or acid generating material.