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Photoimageable resist compositions containing photobase generator

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03C-001/73
  • G03F-007/031
  • G03F-007/032
출원번호 US-0228187 (1994-04-15)
발명자 / 주소
  • Pai Daniel Y. (Millbury MA) Rodriguez Stephen S. (Monument Beach MA) Cheetham Kevin J. (Millbury MA) Calabrese Gary S. (North Andover MA) Sinta Roger F. (Woburn MA)
출원인 / 주소
  • Shipley Company, L.L.C. (Marlborough MA 02)
인용정보 피인용 횟수 : 37  인용 특허 : 9

초록

A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invent

대표청구항

An aqueous developable negative acting photoimageable resist composition that undergoes photobase-initiated hardening to produce a negative relief image upon exposure and development, the composition comprising an organic photobase generator compound, an aqueous base soluble resin binder selected fr

이 특허에 인용된 특허 (9)

  1. Ceintrey Claude (Neuville-les-Dieppe FRX) Crochemore Michel (Chaponost FRX), Diazotype materials which can be developed by heat and contain an activator precursor having 2-carboxy carboxamide group.
  2. Ochi Hideo (Kawasaki JPX) Shibata Yumi (Tokyo JPX) Nagasawa Kohtaro (Tokyo JPX), High energy radiation curable resist material and method of using the same.
  3. Hayashi Nobuyuki (Hitachi JA) Isobe Asao (Hitachi JA) Tsukada Katsushige (Hitachi JA) Ogawa Ken (Hitachi JA) Abo Masahiro (Hitachi JA), Image forming curable resin compositions.
  4. Sato Kozo (Kanagawa JPX) Naito Hideki (Kanagawa JPX), Method for forming an image.
  5. Irving Edward (Burwell GB2) Banks Christopher P. (Saffron Walden GB2), Method of forming images.
  6. Holoch Jan (Leimen DEX) Peter Roland (Mutterstadt DEX) Eisenbarth Philipp (Bad Duerkheim DEX) Allspach Thomas (Bad Duerkheim DEX), Novel polyphenol and thermosetting plastics prepared therefrom.
  7. Hayase Shuzi (Kawasaki JPX) Suzuki Shuichi (Yokohama JPX) Wada Moriyasu (Ninomiya JPX), Photo-curable epoxy resin type composition.
  8. Koike Mitsuru (Shizuoka JPX) Kita Nobuyuki (Shizuoka JPX), Photopolymerizable composition.
  9. Miyamura Masataka (Kamakura JPX) Wada Yusuke (Tokyo JPX) Nakagawa Toshiharu (Ayase JPX) Nakaizumi Yuji (Kawasaki JPX) Takeda Kazuhiro (Higashine JPX), Solder resist composition.

이 특허를 인용한 특허 (37)

  1. Chen Kuang-Jung ; DellaGuardia Ronald A. ; Huang Wu-Song ; Katnani Ahmad D. ; Khojasteh Mahmoud M. ; Lin Qinghuang, Approach to formulating irradiation sensitive positive resists.
  2. Chen Kuang-Jung ; DellaGuardia Ronald A. ; Huang Wu-Song ; Katnani Ahmad D. ; Khojasteh Mahmoud M. ; Lin Quighuang, Approach to formulating irradiation sensitive positive resists.
  3. Nishimura,Isao; Bessho,Nobuo; Kumano,Atsushi; Yamada,Kenji, Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern.
  4. Nishimura, Isao; Bessho, Nobuo; Kumano, Atsushi; Shimokawa, Tsutomu; Yamada, Kenji, Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern.
  5. Kuang-Jung R. Chen ; Mark C. Hakey ; Steven J. Holmes ; Wu-Song Huang ; Paul A. Rabidoux, Hybrid resist based on photo acid/photo base blending.
  6. Foster Patrick ; Slater Sydney George ; Steinhausler Thomas ; Blakeney Andrew J. ; Biafore John Joseph, Hydroxy-amino thermally cured undercoat for 193 NM lithography.
  7. Foster,Patrick; Slater,Sydney George; Steinh?usler,Thomas; Blakeney,Andrew J.; Biafore,John Joseph, Hydroxy-amino thermally cured undercoat for 193 nm lithography.
  8. Matsui,Jun; Nakata,Hidehiko, Method for manufacturing device.
  9. Takeshita, Masaru, Method of forming resist pattern.
  10. Yokoya, Jiro; Nakamura, Tsuyoshi; Shimizu, Hiroaki; Nito, Hideto, Method of forming resist pattern.
  11. Yokoya, Jiro; Nakamura, Tsuyoshi; Shimizu, Hiroaki; Takeshita, Masaru; Nito, Hideto; Saito, Hirokuni, Method of forming resist pattern.
  12. Amou Satoru,JPX ; Suzuki Masao,JPX ; Suwa Tokihito,JPX ; Kawamoto Mineo,JPX ; Takahashi Akio,JPX ; Nemoto Masanori,JPX ; Fukai Hiroyuki,JPX ; Yokota Mitsuo,JPX ; Kobayashi Shiro,JPX ; Miyazaki Masash, Multilayer circuit board and photosensitive resin composition used therefor.
  13. Amou Satoru,JPX ; Suzuki Masao,JPX ; Suwa Tokihito,JPX ; Kawamoto Mineo,JPX ; Takahashi Akio,JPX ; Nemoto Masanori,JPX ; Fukai Hiroyuki,JPX ; Yokota Mitsuo,JPX ; Kobayashi Shiro,JPX ; Miyazaki Masash, Multilayer circuit board having insulating layer with via-holes.
  14. Chen, Chunwei; Lu, Ping Hung; Zhuang, Hong; Neisser, Mark, Nanocomposite photoresist composition for imaging thick films.
  15. Wang, Chien-Wei; Chang, Ching-Yu; Gau, Tsai-Sheng; Lin, Burn Jeng, Patterning process and chemical amplified photoresist with a photodegradable base.
  16. Wang, Chien-Wei; Chang, Ching-Yu; Gau, Tsai-Sheng; Lin, Burn Jeng, Patterning process and photoresist with a photodegradable base.
  17. Klinkenberg, Huig; Van Oorschot, Josephus Christiaan, Photoactivatable coating composition.
  18. Klinkenberg, Huig; Van Oorschot, Josephus Christiaan, Photoactivatable coating composition comprising a photolatent base.
  19. Cristiano Maria de Lurdes dos Santos,PTX ; Davies John Kynaston,GBX ; Dowd Sharon,GBX ; Johnstone Robert Alexander Walker,GBX ; Pratt Michael John,GBX ; Wade John Robert,GBX, Photoactive materials applicable to imaging systems.
  20. Wang, Chien-Wei; Chang, Ching-Yu; Lin, Burn Jeng, Photoresist and patterning process.
  21. Keesler, Ross W.; Konrad, John J.; Magnuson, Roy H.; Sinicki, Robert A., Photoresist composition with antibacterial agent.
  22. Tatsushi Kaneko JP; Kenji Koizumi JP; Satoshi Watanabe JP; Yoshitaka Yanagi JP, Photoresist compositions and patterning method.
  23. Wang, Chien-Wei; Chang, Ching-Yu, Photoresist stripping technique.
  24. Wang, Chien-Wei; Chang, Ching-Yu, Photoresist stripping technique.
  25. Arimitsu, Koji; Terada, Kiwamu, Photosensitive resin composition and cured product thereof.
  26. Akutsu Eiichi,JPX ; Ohtsu Shigemi,JPX ; Pu Lyong sun,JPX, Process for recording image.
  27. Shiraki, Shinji; Suzuki, Masayoshi; Sasaki, Hirofumi; Niwa, Kazuaki; Nishikawa, Michinori, Radiation sensitive composition for forming an insulating film, insulating film and display device.
  28. Yamada, Kenji; Bessho, Nobuo; Kumano, Atsushi; Konno, Keiji, Radiation sensitive refractive index changing composition and refractive index changing method.
  29. Hanamura,Masaaki; Nishikawa,Michinori; Kumano,Atsushi, Radiation sensitive refractive index changing composition, pattern forming method and optical material.
  30. Nishimura,Isao; Bessho,Nobuo; Kumano,Atsushi; Yamada,Kenji, Radiation-sensitive composition capable of having refractive index distribution.
  31. Nishimura,Isao; Bessho,Nobuo; Kumano,Atsushi; Shimokawa,Tsutomu; Yamada,Kenji, Radiation-sensitive composition changing in refractive index and method of changing refractive index.
  32. Nishimura,Isao; Bessho,Nobuo; Kumano,Atsushi; Yamada,Kenji, Radiation-sensitive composition changing in refractive index and utilization thereof.
  33. Nakamura, Tsuyoshi; Yokoya, Jiro; Shimizu, Hiroaki; Nito, Hideto, Resist composition and method of forming resist pattern.
  34. Nakamura, Tsuyoshi; Yokoya, Jiro; Shimizu, Hiroaki; Nito, Hideto, Resist composition and method of forming resist pattern.
  35. Shimizu, Hiroaki; Nakamura, Tsuyoshi; Yokoya, Jiro; Nito, Hideto, Resist composition and method of forming resist pattern.
  36. Shimizu, Hiroaki; Nakamura, Tsuyoshi; Yokoya, Jiro; Nito, Hideto, Resist composition and method of forming resist pattern.
  37. Shimizu, Hiroaki; Yokoya, Jiro; Nakamura, Tsuyoshi; Nito, Hideto, Resist composition and method of forming resist pattern.
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