초록 ▼

A method of visually aligning an optical instrument (10, 26, 28) that simultaneously operates at two different wavelengths where the first wavelength is in the visible photopic electromagnetic spectral region and the second wavelength is outside the visible photopic electromagnetic spectral region.

A method of visually aligning an optical instrument (10, 26, 28) that simultaneously operates at two different wavelengths where the first wavelength is in the visible photopic electromagnetic spectral region and the second wavelength is outside the visible photopic electromagnetic spectral region. The method for visually aligning the optical instrument (10, 26, 28) includes employing an aiming reticle (12) located at the eyepiece (18) of the optical instrument (10, 26, 28), this first reticle (12) having a reticle pattern (64) which is in focus when viewed through the eyepiece (18), and a plate (44) with a second reticle pattern (62) on one side. The second reticle pattern (62) is positioned in the optical system such that when this second reticle pattern (62) is illuminated (58) with light of the first wavelength, then this second reticle pattern (62) will be in focus and superimposed on the first reticle pattern (64) when viewed through the eyepiece (18). Alignment can then be accomplished by aligning the focused image (62′) of the second reticle pattern (62) onto the first reticle pattern (64) displayed at the eyepiece (18). The method for visual alignment allows the operator to use his/her eyes to align a coaxial optical instrument (10, 26, 28), such as visual telescope (10) and an infrared laser (26, 28) which operates outsides the visible spectrum.

대표청구항 ▼

An optical element for visually aligning an optical instrument that simultaneously operates at two different wavelengths where said first wavelength is in the visible photopic electromagnetic spectral region and said second wavelength is outside the visible photopic electromagnetic spectral region,

An optical element for visually aligning an optical instrument that simultaneously operates at two different wavelengths where said first wavelength is in the visible photopic electromagnetic spectral region and said second wavelength is outside the visible photopic electromagnetic spectral region, said optical instrument having a first plate having a first reticle pattern, said first plate being located at the eyepiece of said optical instrument, said first reticle pattern being in focus when viewed through said eyepiece, said optical element comprising a second plate which has a second reticle pattern on one side and a clear field stop on the opposite side, the position of said second plate being such that when said second reticle pattern is illuminated with light of said first wavelength and a removable retroreflector is inserted in said optical instrument, then said second reticle pattern will be in focus and superimposed on said first reticle pattern when viewed through said eyepiece such that alignment of said optical instrument can be accomplished by aligning the focused image of said second reticle pattern onto said first reticle pattern displayed at said eyepiece, and the thickness and orientation of said second plate being such that when said clear field stop is illuminated with light of said second wavelength and said removable retroreflector is inserted in said optical instrument, then said clear field stop will be in focus and superimposed on said first reticle pattern when viewed through said eyepiece.