초록 ▼

A thin-film forming device including a reaction chamber having an atmosphere different from that in the outside world, a susceptor rotatably disposed in the reaction chamber for mounting a substrate thereon to form a thin film thereon, and a nozzle disposed within the reaction chamber facing the sus

A thin-film forming device including a reaction chamber having an atmosphere different from that in the outside world, a susceptor rotatably disposed in the reaction chamber for mounting a substrate thereon to form a thin film thereon, and a nozzle disposed within the reaction chamber facing the susceptor for supplying a thin-film forming material on the substrate, the thin-film forming device comprises: a levitating means including magnetic bearings for non-contact support of the susceptor; and a driving means for rotating the susceptor at high speed, to thereby increase the rotational speed of the susceptor and the thin-film forming rate.

대표청구항 ▼

A thin-film forming device including a reaction chamber having an atmosphere different from that externally thereof, a susceptor rotatably disposed in said reaction chamber for mounting a substrate thereon to form a thin film thereon, and a nozzle disposed within said reaction chamber facing said su

A thin-film forming device including a reaction chamber having an atmosphere different from that externally thereof, a susceptor rotatably disposed in said reaction chamber for mounting a substrate thereon to form a thin film thereon, and a nozzle disposed within said reaction chamber facing said susceptor for supplying a thin-film forming material on said substrate, said thin-film forming device comprising: a levitating means including magnetic bearings for non-contact support of said susceptor; and a driving means for rotating said susceptor at a speed in a range above 2,000 rpm, in order to improve the radial uniformity of the deposited layer.