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Optical scanning system utilizing an atomic force microscope and an optical microscope 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-007/34
출원번호 US-0564747 (1995-11-29)
우선권정보 JP-0295113 (1994-11-29)
발명자 / 주소
  • Yasutake Masatoshi (Chiba JPX) Fujino Naohiko (Hyogo JPX)
출원인 / 주소
  • Mitsubishi Electric Corporation (Hyogo JPX 03)
인용정보 피인용 횟수 : 35  인용 특허 : 5

초록

A light-scattering optical system is incorporated in an AFM instrument for a large sample. The instrument is equipped with an optical microscope. Incident light is introduced into the optical microscope to provide a dark field. The incident angle to the surface of a sample is made variable. The inci

대표청구항

In a scanning probe microscope with aligning function, said scanning probe microscope having an xyz-stage on which a sample is placed and which moves said sample, an atomic force microscope (AFM) equipped with a cantilever having a probe at its free end, the probe being scanned along a surface of sa

이 특허에 인용된 특허 (5)

  1. Kajimura Hiroshi (Tokyo JPX) Okada Takao (Hachioji JPX), Atomic probe microscope.
  2. Yasutake Masatoshi (Tokyo JPX), Composite scanning tunnelling microscope with a positioning function.
  3. Batchelder John S. (Somers NY) Taubenblatt Marc A. (Pleasantville NY), Dark field imaging defect inspection system for repetitive pattern integrated circuits.
  4. Marchman Herschel (New Providence NJ) Wetsel Grover C. (Richardson TX), Optically guided macroscopic-scan-range/nanometer resolution probing system.
  5. Linker Frederick I. (936 Crane St. Menlo Park CA 94025) Kirk Michael D. (355 S. 16th St. San Jose CA 95112) Alexander John D. (160 Aries Way ; #3 Sunnyvale CA 94086) Park Sang-il (865 Loma Verde Ave., Scanning probe microscope.

이 특허를 인용한 특허 (35)

  1. Sanjay K. Yedur ; Bhanwar Singh ; Bryan K. Choo ; Carmen L. Morales, Cantilever assembly and scanning tip therefor with associated optical sensor.
  2. Korngut,Doron; Admoni,Erez; Kadar,Ofer; Haikoviz,Lev; Feldman,Haim; Guetta,Avishay, Dark field inspection system.
  3. Vaez-Iravani, Mehdi; Rzepiela, Jeffrey Alan; Treadwell, Carl; Zeng, Andrew; Fiordalice, Robert, Defect detection system.
  4. Vaez-Iravani, Mehdi; Rzepiela, Jeffrey Alan; Treadwell, Carl; Zeng, Andrew; Fiordalice, Robert, Defect detection system.
  5. Tilman Schaffer ; Paul K. Hansma, High sensitivity deflection sensing device.
  6. Naftali, Ron; Guetta, Avishay; Feldman, Haim; Shoham, Doron, Illumination system for optical inspection.
  7. Naftali, Ron; Guetta, Avishay; Feldman, Haim; Shoham, Doron, Illumination system for optical inspection.
  8. Vaez Iravani,Mehdi, Inspection system for integrated applications.
  9. Espe, Oliver; Espe, Rolf, Method and device for producing a surface structure for a metallic press plate, endless belt or embossing roller.
  10. Jones Gary D. ; Houston Jack E. ; Gillen Kenneth T., Method for accurately positioning a device at a desired area of interest.
  11. Snel, Robert; Bleeker, Arno Jan; Van Brug, Hedser, Method of imaging radiation from an object on a detection device and an inspection device for inspecting an object.
  12. Weber Grabau,Michael; Bevis,Christopher F.; Faeyrman,Michael; Zamir,Ofir, Methods and systems for analyzing a specimen using atomic force microscopy profiling in combination with an optical technique.
  13. Shortt, David; Biellak, Stephen; Belyaev, Alexander, Methods and systems for inspection of a wafer.
  14. Samsavar Amin ; Weber Michael ; McWaid Thomas ; Kuhn William P. ; Parks Robert E., Optical profilometer combined with stylus probe measurement device.
  15. Abe, Takayuki; Tsuchiya, Hideo, Pattern inspection apparatus and method.
  16. Fujihira,Masamichi; Yasutake,Masatoshi; Ataka,Tatsuaki, Probe microscope system suitable for observing sample of long body.
  17. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  18. Mehdi Vaez-Iravani ; Stanley Stokowski ; Guoheng Zhao, Sample inspection system.
  19. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  20. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  21. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  22. Vaez-Iravani Mehdi ; Stokowski Stanley ; Zhao Guoheng, Sample inspection system.
  23. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  24. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  25. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  26. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  27. Sanjay K. Yedur ; Bhanwar Singh ; Bryan K. Choo ; Carmen L. Morales, Scanning probe microscope having optical fiber spaced from point of hp.
  28. Yagi Akira,JPX ; Nishida Hiroyuki,JPX, Scanning probe microscope incorporating an optical microscope.
  29. Ina, Hideki; Sentoku, Koichi; Matsumoto, Takahiro, Shape measuring apparatus, shape measuring method, and aligning method.
  30. Ina,Hideki; Sentoku,Koichi; Matsumoto,Takahiro, Shape measuring apparatus, shape measuring method, and aligning method.
  31. Schaffer, Tilman; Hansma, Paul K., Summing the output of an array of optical detector segments in an atomic force microscope.
  32. Biellak, Steve; Stokowski, Stanley E.; Vaez-Iravani, Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
  33. Biellak,Steve; Stokowski,Stanley E.; Vaez Iravani,Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
  34. James W. Overbeck, Wide field of view and high speed scanning microscopy.
  35. Overbeck,James W., Wide field of view and high speed scanning microscopy.
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