초록

A method and apparatus for cleaning a substrate in preparation for thin film coating. The invention involves cleaning the substrate in a cleaning chamber under controlled conditions by a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium.

대표청구항 ▼

A method of cleaning a substrate in preparation for thin film coating comprising the steps of: providing a cleaning chamber having air inlet means and air exhaust means and introducing air into said cleaning chamber through said air inlet means and exhausting air form said cleaning chamber through s

A method of cleaning a substrate in preparation for thin film coating comprising the steps of: providing a cleaning chamber having air inlet means and air exhaust means and introducing air into said cleaning chamber through said air inlet means and exhausting air form said cleaning chamber through said air exhaust means for maintaining air pressure and flow within said cleaning chamber at desired levels, wherein said cleaning chamber includes a substrate entry and a substrate exit maintaining air pressure within said cleaning chamber at a positive pressure relative to atmospheric pressure; providing an entry chamber adjacent to said substrate entry in which said entry chamber includes an air inlet means and air exhaust means for maintaining air pressure and flow within said entry chamber at desired levels; transporting a substrate to be cleaned to a cleaning position within said cleaning chamber; and exposing said substrate to a blast of carbon dioxide pellets suspended in and transported by a compressed gas medium, said blast of carbon dioxide pellets being effective to clean said substrate in preparation for thin film coating.