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Thin film transistor having crystalline semiconductor layer obtained by irradiation 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-029/76
  • H01L-027/01
출원번호 US-0487166 (1995-06-07)
우선권정보 JP-0156647 (1994-06-14)
발명자 / 주소
  • Kusumoto Naoto (Kanagawa JPX) Takemura Yasuhiko (Shiga JPX) Ohtani Hisashi (Kanagawa JPX)
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd. (Kanagawa-ken JPX 03)
인용정보 피인용 횟수 : 220  인용 특허 : 0

초록

An amorphous semiconductor film having a thickness of 400Åor more is formed on an insulating surface and is wholly or selectively etched to form a region having a thickness 300Åor less. This is used as a channel-forming region in a TFT.

대표청구항 ▼

A thin film transistor having a maximum value of electric field effect mobility of 50 cm2/Vs or more and comprising an active layer of thin fill semiconductor which is present on an insulating surface, and a marker for aligning a mask comprising the same semiconductor with said active layer and prov

이 특허를 인용한 특허 (220)

  1. Yamazaki, Shunpei; Ohtani, Hisashi, Display device having thin film transistors.
    상세보기
  2. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Display switch with double layered gate insulation and resinous interlayer dielectric.
    상세보기
  3. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  4. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  5. Ohtani, Hisashi; Koyama, Jun; Yamazaki, Shunpei, Electro-optical device and semiconductor device.
    상세보기
  6. Takano Tamae,JPX ; Ohtani Hisashi,JPX, Electronic apparatus having thin film transistors.
    상세보기
  7. Sasagawa, Shinya; Fujiki, Hiroshi; Furukawa, Shinobu; Miyairi, Hidekazu, Etching method using mixed gas and method for manufacturing semiconductor device.
    상세보기
  8. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  9. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  10. Yamazaki, Shunpei; Shibata, Hiroshi; Tanaka, Koichiro; Hiroki, Masaaki; Akiba, Mai, Laser irradiation method and method of manufacturing a semiconductor device.
    상세보기
  11. Yamazaki, Shunpei; Shimomura, Akihisa; Ohtani, Hisashi; Hiroki, Masaaki; Tanaka, Koichiro; Shiga, Aiko; Akiba, Mai; Kasahara, Kenji, Manufacturing method for a semiconductor device using a marker on an amorphous semiconductor film to selectively crystallize a region with a laser light.
    상세보기
  12. Yamazaki,Shunpei; Shimomura,Akihisa; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai; Kasahara,Kenji, Manufacturing method for a thin film transistor that uses a pulse oscillation laser crystallize an amorphous semiconductor film.
    상세보기
  13. Yamazaki, Shunpei; Arai, Yasuyuki, Manufacturing method for top-gate type and bottom-gate type thin film transistors.
    상세보기
  14. Ohtani, Hisashi, Metal-gettering method used in the manufacture of crystalline-Si TFT.
    상세보기
  15. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method for fabricating a semiconductor device.
    상세보기
  16. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  17. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  18. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP, Method for fabricating a semiconductor device using a metal catalyst and high temperature crystallization.
    상세보기
  19. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Ohnuma Hideto,JPX, Method for fabricating semiconductor device.
    상세보기
  20. Maekawa,Shinji; Akimoto,Kengo, Method for fabricating thin film transistor.
    상세보기
  21. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Method for forming a semiconductor device.
    상세보기
  22. Yamazaki Shunpei,JPX ; Komaya Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Method for forming semiconductor thin film.
    상세보기
  23. Hisashi Ohtani JP; Hiroki Adachi JP; Akiharu Miyanaga JP; Toru Takayama JP, Method for manufacturing a semiconductor device.
    상세보기
  24. Ohtani,Hisashi; Adachi,Hiroki; Miyanaga,Akiharu; Takayama,Toru, Method for manufacturing a semiconductor device.
    상세보기
  25. Yamazaki,Shunpei; Yamaguchi,Naoaki; Nakajima,Setsuo, Method for manufacturing a semiconductor device.
    상세보기
  26. Yasuhiko Takemura JP, Method for manufacturing a semiconductor device.
    상세보기
  27. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method for manufacturing a thin film transistor device.
    상세보기
  28. Azami, Munehiro; Kokubo, Chiho; Shiga, Aiko; Isobe, Atsuo; Shibata, Hiroshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  29. Azami, Munehiro; Kokubo, Chiho; Shiga, Aiko; Isobe, Atsuo; Shibata, Hiroshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  30. Azami,Munehiro; Kokubo,Chiho; Shiga,Aiko; Isobe,Atsuo; Shibata,Hiroshi; Yamazaki,Shunpei, Method for manufacturing semiconductor device.
    상세보기
  31. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  32. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  33. Yokoi, Tomokazu; Isobe, Atsuo; Kurata, Motomu; Shichi, Takeshi; Ohgarane, Daisuke; Shingu, Takashi, Method for manufacturing semiconductor device.
    상세보기
  34. Tanaka, Koichiro; Ohnuma, Hideto, Method for manufacturing transistor semiconductor devices with step of annealing to getter metal with phosphorous.
    상세보기
  35. Ohtani Hisashi,JPX, Method for producing a semiconductor device.
    상세보기
  36. Hongyong Zhang JP; Yasuhiko Takemura JP; Toru Takayama JP, Method for producing semiconductor device.
    상세보기
  37. Ohtani Hisashi,JPX ; Fukunaga Takeshi,JPX ; Miyanaga Akiharu,JPX, Method for producing semiconductor device.
    상세보기
  38. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Ohnuma Hideto,JPX, Method for producing semiconductor device.
    상세보기
  39. Yamazaki, Shunpei; Ohtani, Hisashi; Ohnuma, Hideto, Method for producing semiconductor device.
    상세보기
  40. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Method for producing semiconductor device.
    상세보기
  41. Zhang, Hongyong; Takemura, Yasuhiko; Takayama, Toru, Method for producing semiconductor device.
    상세보기
  42. Yasuhiko Takemura JP, Method of fabricating a semiconductor device.
    상세보기
  43. Fukunaga,Takeshi; Ohtani,Hisashi; Miyanaga,Akiharu, Method of fabricating a semiconductor device utilizing a catalyst material solution.
    상세보기
  44. Kokubo,Chiho; Shiga,Aiko; Tanada,Yoshifumi; Yamazaki,Shunpei, Method of fabricating a semiconductor device utilizing crystallization of semiconductor region with laser beam.
    상세보기
  45. Nakajima,Setsuo; Ohtani,Hisashi, Method of fabricating semiconductor device.
    상세보기
  46. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Teramoto Satoshi,JPX, Method of fabricating semiconductor device.
    상세보기
  47. Naoto Kusumoto JP; Yasuhiko Takemura JP; Hisashi Ohtani JP, Method of fabrication of a crystalline silicon thin film semiconductor with a thin channel region.
    상세보기
  48. Nakajima, Setsuo; Ohtani, Hisashi, Method of forming a semiconductor device using a group XV element for gettering by means of infrared light.
    상세보기
  49. Ohtani, Hisashi, Method of forming crystalline silicon film.
    상세보기
  50. Shunpei Yamazaki JP; Mitsunori Sakama JP; Yasuhiko Takemura JP, Method of making crystal silicon semiconductor and thin film transistor.
    상세보기
  51. Hisashi Ohtani JP; Akiharu Miyanaga JP; Junichi Takeyama JP, Method of manufacturing a semiconductor device.
    상세보기
  52. Isobe,Atsuo; Arao,Tatsuya, Method of manufacturing a semiconductor device.
    상세보기
  53. Ohnuma, Hideto; Yamazaki, Shunpei; Nakajima, Setsuo; Ohtani, Hisashi, Method of manufacturing a semiconductor device.
    상세보기
  54. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Method of manufacturing a semiconductor device.
    상세보기
  55. Yamazaki, Shunpei; Nakamura, Osama; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  56. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  57. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  58. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  59. Yamazaki,Shunpei; Ohnuma,Hideto; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Akimoto,Kengo, Method of manufacturing a semiconductor device.
    상세보기
  60. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Method of manufacturing a semiconductor device.
    상세보기
  61. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Method of manufacturing a semiconductor device comprising doping steps using gate electrodes and resists as masks.
    상세보기
  62. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method of manufacturing a semiconductor device including reduction of a catalyst.
    상세보기
  63. Yamazaki,Shunpei; Shibata,Hiroshi; Tanaka,Koichiro; Hiroki,Masaaki; Akiba,Mai, Method of manufacturing a semiconductor device that includes patterning sub-islands.
    상세보기
  64. Isobe, Atsuo; Arao, Tatsuya, Method of manufacturing a semiconductor device, utilizing a laser beam for crystallization.
    상세보기
  65. Shunpei Yamazaki JP, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
    상세보기
  66. Yamazaki, Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
    상세보기
  67. Yamazaki,Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device by transferring crystallization promoting material in the first semiconductor film to the second semico.
    상세보기
  68. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method of manufacturing a thin film transistor device.
    상세보기
  69. Ohtani Hisashi,JPX, Method of manufacturing a thin film transistor involving laser treatment.
    상세보기
  70. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  71. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  72. Nakamura,Osamu; Yamazaki,Shunpei; Dairiki,Koji; Kajiwara,Masayuki; Koezuka,Junichi; Murakami,Satoshi, Method of manufacturing semiconductor device.
    상세보기
  73. Ohtani Hisashi,JPX, Method of manufacturing semiconductor device.
    상세보기
  74. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
    상세보기
  75. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
    상세보기
  76. Yamazaki,Shunpei; Mitsuki,Toru, Method of manufacturing semiconductor device.
    상세보기
  77. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi, Method of manufacturing semiconductor device and semiconductor device.
    상세보기
  78. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi, Method of manufacturing semiconductor device that includes selectively adding a noble gas element.
    상세보기
  79. Yamazaki, Yasushi; Hirabayashi, Yukiya, Method of manufacturing semiconductor substrate, semiconductor substrate, electro-optical apparatus and electronic equipment.
    상세보기
  80. Shunpei Yamazaki JP; Hisashi Ohtani JP, Method of producing crystalline semiconductor.
    상세보기
  81. Yamazaki Shunpei,JPX ; Arai Yasuyuki,JPX, Microcrystal silicon film and its manufacturing method, and photoelectric conversion device and its manufacturing method.
    상세보기
  82. Yamazaki Shunpei,JPX, Photoelectric conversion device and method manufacturing same.
    상세보기
  83. Lee, Ki-Yong, Poly-silicon layer of a thin film transistor and display device having the same.
    상세보기
  84. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Process for fabricating a thin film transistor semiconductor device.
    상세보기
  85. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  86. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Ohnuma,Hideto; Takano,Tamae; Kasahara,Kenji; Dairiki,Koji, Process for manufacturing a semiconductor device.
    상세보기
  87. Yamazaki,Shunpei; Arai,Yasuyuki, Process for producing a photoelectric conversion device that includes using a gettering process.
    상세보기
  88. Kusumoto Naoto,JPX ; Takemura Yasuhiko,JPX ; Ohtani Hisashi,JPX, Production method for a thin film semiconductor device with an alignment marker made out of the same layer as the active.
    상세보기
  89. Miyanaga, Akiharu; Mukao, Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
    상세보기
  90. Miyanaga, Akiharu; Mukao, Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
    상세보기
  91. Miyanaga,Akiharu; Mukao,Kyouichi, Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer.
    상세보기
  92. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor active region of TFTs having radial crystal grains through the whole area of the region.
    상세보기
  93. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Shunpei Yamazaki JP; Yasuhiko Takemura JP, Semiconductor and process for fabricating the same.
    상세보기
  94. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Semiconductor and process for fabricating the same.
    상세보기
  95. Zhang, Hongyong; Takayama, Toru; Takemura, Yasuhiko, Semiconductor circuit and method of fabricating the same.
    상세보기
  96. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Semiconductor circuit for electro-optical device and method of manufacturing the same.
    상세보기
  97. Yamazaki, Shunpei; Akimoto, Kengo, Semiconductor device.
    상세보기
  98. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device.
    상세보기
  99. Hisashi Ohtani JP; Tamae Takano JP; Chiho Kokubo JP, Semiconductor device and fabricating method thereof.
    상세보기
  100. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  101. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Semiconductor device and fabrication method thereof.
    상세보기
  102. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki, Semiconductor device and fabrication method thereof.
    상세보기
  103. Shunpei Yamazaki JP, Semiconductor device and its manufacturing method.
    상세보기
  104. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP; Hisashi Ohtani JP; Toshiji Hamatani JP, Semiconductor device and its manufacturing method.
    상세보기
  105. Yamazaki Shunpei,JPX, Semiconductor device and its manufacturing method.
    상세보기
  106. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  107. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  108. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and its manufacturing method.
    상세보기
  109. Matsukura, Hideki, Semiconductor device and manufacture method thereof.
    상세보기
  110. Matsukura, Hideki, Semiconductor device and manufacture method thereof.
    상세보기
  111. Nakamura, Osamu; Kajiwara, Masayuki; Yamazaki, Shunpei; Ohnuma, Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  112. Nakamura,Osamu; Kajiwara,Masayuki; Yamazaki,Shunpei; Ohnuma,Hideto, Semiconductor device and manufacturing method of the same.
    상세보기
  113. Kokubo, Chiho; Shiga, Aiko; Tanada, Yoshifumi; Yamazaki, Shunpei, Semiconductor device and manufacturing method therefor.
    상세보기
  114. Miyairi, Hidekazu, Semiconductor device and manufacturing method thereof.
    상세보기
  115. Miyairi, Hidekazu, Semiconductor device and manufacturing method thereof.
    상세보기
  116. Shingu, Takashi; Matsukura, Hideki, Semiconductor device and manufacturing method thereof.
    상세보기
  117. Tanaka, Koichiro; Ohnuma, Hideto, Semiconductor device and manufacturing method thereof.
    상세보기
  118. Yamazaki, Shunpei; Suzuki, Yukie; Arai, Yasuyuki; Moriya, Yoshitaka; Ikeda, Kazuko; Tanada, Yoshifumi; Takahashi, Shuhei, Semiconductor device and manufacturing method thereof.
    상세보기
  119. Yamazaki, Shunpei; Suzuki, Yukie; Arai, Yasuyuki; Moriya, Yoshitaka; Ikeda, Kazuko; Tanada, Yoshifumi; Takahashi, Shuhei, Semiconductor device and manufacturing method thereof.
    상세보기
  120. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Semiconductor device and method for fabricating the same.
    상세보기
  121. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  122. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  123. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method for fabricating the same.
    상세보기
  124. Yamazaki Shunpei,JPX ; Zhang Hongyong,JPX, Semiconductor device and method for forming the same.
    상세보기
  125. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  126. Yamazaki,Shunpei; Zhang,Hongyong, Semiconductor device and method for forming the same.
    상세보기
  127. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  128. Adachi Hiroki,JPX ; Takenouchi Akira,JPX ; Fukada Takeshi,JPX ; Uehara Hiroshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  129. Hiroki Adachi JP; Akira Takenouchi JP; Takeshi Fukada JP; Hiroshi Uehara JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
    상세보기
  130. Hongyong Zhang JP; Hideki Uochi JP; Toru Takayama JP; Takeshi Fukunaga JP; Yasuhiko Takemura JP, Semiconductor device and method for manufacturing the same.
    상세보기
  131. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  132. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  133. Miyanaga,Akiharu; Ohtani,Hisashi; Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  134. Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Yamazaki,Shunpei; Kuwabara,Hideaki, Semiconductor device and method for manufacturing the same.
    상세보기
  135. Sasagawa, Shinya, Semiconductor device and method for manufacturing the same.
    상세보기
  136. Sasagawa, Shinya, Semiconductor device and method for manufacturing the same.
    상세보기
  137. Sasagawa, Shinya, Semiconductor device and method for manufacturing the same.
    상세보기
  138. Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  139. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  140. Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  141. Takemura,Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  142. Takemura,Yasuhiro, Semiconductor device and method for manufacturing the same.
    상세보기
  143. Yamazaki, Shunpei; Suzawa, Hideomi; Sasagawa, Shinya; Kurata, Motomu, Semiconductor device and method for manufacturing the same.
    상세보기
  144. Yamazaki, Shunpei; Suzawa, Hideomi; Sasagawa, Shinya; Kurata, Motomu, Semiconductor device and method for manufacturing the same.
    상세보기
  145. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for manufacturing the same.
    상세보기
  146. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  147. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Semiconductor device and method for manufacturing the same.
    상세보기
  148. Yamazaki, Shunpei; Yamaguchi, Naoaki; Nakajima, Setsuo, Semiconductor device and method for producing it.
    상세보기
  149. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  150. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Teramoto Satoshi,JPX, Semiconductor device and method for producing the same.
    상세보기
  151. Yamazaki Shunpei,JPX, Semiconductor device and method of fabricating same.
    상세보기
  152. Yamazaki, Shunpei; Teramoto, Satoshi; Koyama, Jun; Ogata, Yasushi; Hayakawa, Masahiko; Osame, Mitsuaki; Ohtani, Hisashi; Hamatani, Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  153. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  154. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  155. Yamazaki,Shunpei, Semiconductor device and method of fabricating same.
    상세보기
  156. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device and method of fabricating same.
    상세보기
  157. Takemura, Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  158. Takemura,Yasuhiko, Semiconductor device and method of fabricating the same.
    상세보기
  159. Hamada, Takashi; Murakami, Satoshi; Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Takayama, Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  160. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Semiconductor device and method of manufacturing the same.
    상세보기
  161. Miyanaga, Akiharu; Ohtani, Hisashi; Takemura, Yasuhiko, Semiconductor device and method of manufacturing the same.
    상세보기
  162. Shunpei Yamazaki JP, Semiconductor device and method of manufacturing the same.
    상세보기
  163. Yamazaki, Shunpei, Semiconductor device and method of manufacturing the same.
    상세보기
  164. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  165. Zhang Hongyong,JPX, Semiconductor device and method of manufacturing the same.
    상세보기
  166. Zhang, Hongyong, Semiconductor device and method of manufacturing the same.
    상세보기
  167. Zhang,Hongyong, Semiconductor device and method of manufacturing the same.
    상세보기
  168. Hongyong Zhang JP; Satoshi Teramoto JP, Semiconductor device and process for manufacturing the same, and electronic device.
    상세보기
  169. Shunpei Yamazaki JP; Naoaki Yamaguchi JP; Setsuo Nakajima JP, Semiconductor device comprising a bottom gate type thin film transistor.
    상세보기
  170. Ohtani, Hisashi; Adachi, Hiroki; Miyanaga, Akiharu; Takayama, Toru, Semiconductor device comprising first insulating film, second insulating film comprising organic resin on the first insulating film, and pixel electrode over the second insulating film.
    상세보기
  171. Hongyong Zhang JP; Toru Takayama JP; Yasuhiko Takemura JP; Akiharu Miyanaga JP; Hisashi Ohtani JP, Semiconductor device forming method.
    상세보기
  172. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX ; Miyanaga Akiharu,JPX ; Ohtani Hisashi,JPX, Semiconductor device forming method.
    상세보기
  173. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device forming method.
    상세보기
  174. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor device having a catalyst enhanced crystallized layer.
    상세보기
  175. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki; Ohtani,Hisashi; Hamatani,Toshiji, Semiconductor device having a crystalline semiconductor film.
    상세보기
  176. Zhang, Hongyong; Takayama, Toru, Semiconductor device having channel formation region comprising silicon and containing a group IV element.
    상세보기
  177. Ohnuma, Hideto; Isobe, Atsuo; Godo, Hiromichi, Semiconductor device including semiconductor layer over insulating layer and manufacturing method thereof.
    상세보기
  178. Ogawa, Hiroyuki; Akita, Noritaka; Taniguchi, Yukio; Hiramatsu, Masato; Jyumonji, Masayuki; Matsumura, Masakiyo, Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus for the semiconductor thin film.
    상세보기
  179. Ohtani, Hisashi; Takano, Tamae; Kokubo, Chiho, Semiconductor device method of manufacturing.
    상세보기
  180. Zhang,Hongyong; Takayama,Toru; Takemura,Yasuhiko; Miyanaga,Akiharu; Ohtani,Hisashi, Semiconductor device structure.
    상세보기
  181. Yamazaki, Shunpei, Semiconductor device with heat-resistant gate.
    상세보기
  182. Yamazaki,Shunpei; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai, Semiconductor fabricating apparatus.
    상세보기
  183. Shunpei Yamazaki JP; Hisashi Ohtani JP; Hideto Ohnuma JP, Semiconductor film manufacturing with selective introduction of crystallization promoting material.
    상세보기
  184. Ueda Kimio,JPX, Semiconductor integrated circuit device with operation in partial depletion type mode and perfect depletion type mode.
    상세보기
  185. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  186. Yamazaki, Shunpei; Koyama, Jun; Miyanaga, Akiharu; Fukunaga, Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  187. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film and method of manufacturing the same and semiconductor device and method of manufacturing the same.
    상세보기
  188. Ohtani Hisashi,JPX ; Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Miyanaga Akiharu,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  189. Shunpei Yamazaki JP; Hisashi Ohtani JP; Toru Mitsuki JP; Akiharu Miyanaga JP; Yasushi Ogata JP, Semiconductor thin film and semiconductor device.
    상세보기
  190. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Mitsuki Toru,JPX ; Miyanaga Akiharu,JPX ; Ogata Yasushi,JPX, Semiconductor thin film and semiconductor device.
    상세보기
  191. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  192. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  193. Yamazaki, Shunpei; Ohtani, Hisashi; Mitsuki, Toru; Miyanaga, Akiharu; Ogata, Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  194. Yamazaki,Shunpei; Ohtani,Hisashi; Mitsuki,Toru; Miyanaga,Akiharu; Ogata,Yasushi, Semiconductor thin film and semiconductor device.
    상세보기
  195. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  196. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  197. Yamazaki,Shunpei; Koyama,Jun; Miyanaga,Akiharu; Fukunaga,Takeshi, Semiconductor thin film, semiconductor device and manufacturing method thereof.
    상세보기
  198. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  199. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX ; Zhang Hongyong,JPX ; Takayama Toru,JPX ; Uochi Hideki,JPX, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  200. Yamazaki,Shunpei; Takemura,Yasuhiko; Zhang,Hongyong; Takayama,Toru; Uochi,Hideki, Semiconductor, semiconductor device, and method for fabricating the same.
    상세보기
  201. Yamazaki,Shunpei; Ohtani,Hisashi; Hiroki,Masaaki; Tanaka,Koichiro; Shiga,Aiko; Akiba,Mai, Semiconductror fabricating apparatus.
    상세보기
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    상세보기
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    상세보기
  204. Kusumoto, Naoto; Takemura, Yasuhiko; Ohtani, Hisashi, Thin film semiconductor device and production method for the same.
    상세보기
  205. Iwanaga Toshihiko,JPX ; Ino Masumitsu,JPX ; Kaise Kikuo,JPX ; Urazono Takenobu,JPX ; Ikeda Hiroyuki,JPX, Thin film semiconductor device for active matrix panel.
    상세보기
  206. Miyairi, Hidekazu; Sasagawa, Shinya; Kurata, Motomu, Thin film transistor.
    상세보기
  207. Sasagawa, Shinya; Ishizuka, Akihiro; Furukawa, Shinobu; Kurata, Motomu, Thin film transistor and manufacturing method thereof.
    상세보기
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    상세보기
  209. Miyairi, Hiekazu; Sasagawa, Shinya; Kurata, Motomu; Tadokoro, Asami, Thin film transistor with channel including microcrystalline and amorphous semiconductor regions.
    상세보기
  210. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Thin film type monolithic semiconductor device.
    상세보기
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    상세보기
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    상세보기
  213. Hiramatsu, Masato; Kimura, Yoshinobu; Ogawa, Hiroyuki; Jyumonji, Masayuki; Matsumura, Masakiyo, Thin-film semiconductor substrate, method of manufacturing thin-film semiconductor substrate, method of crystallization, apparatus for crystallization, thin-film semiconductor device, and method of manufacturing thin-film semiconductor device.
    상세보기
  214. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Thin-film transistor and fabrication method for same.
    상세보기
  215. Ohnuma Hideto,JPX ; Yamazaki Shunpei,JPX, Thin-film transistor and semiconductor device using thin-film transistors.
    상세보기
  216. Ohnuma, Hideto; Yamazaki, Shunpei, Thin-film transistor and semiconductor device using thin-film transistors.
    상세보기
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    상세보기
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    상세보기
  220. Nanba Norihiro,JPX, Zoom lens and optical apparatus having the same.
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