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Method of manufacturing a thin film transistor in which the gate insulator comprises two oxide films 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/336
출원번호 US-0280461 (1994-07-26)
우선권정보 JP-0204773 (1993-07-27); JP-0235463 (1993-08-27)
발명자 / 주소
  • Adachi Hiroki (Kanagawa JPX) Takenouchi Akira (Kanagawa JPX) Fukada Takeshi (Kanagawa JPX) Uehara Hiroshi (Kanagawa JPX) Takemura Yasuhiko (Kanagawa JPX)
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd. (Kanagawa JPX 03)
인용정보 피인용 횟수 : 291  인용 특허 : 7

초록 ▼

A method for manufacturing a semiconductor device comprises the steps of forming a semiconductor film on a substrate, oxidizing a surface of said semiconductor film in an oxidizing atmosphere with said semiconductor film heated or irradiated with light, and further depositing an oxide film on the ox

대표청구항 ▼

A method for manufacturing a semiconductor device comprising the steps of: forming a semiconductor film on a substrate having an insulating surface; oxidizing a surface of said semiconductor film to form an oxide film by irradiating said surface with light having a wavelength of 0.5 m4 m

이 특허에 인용된 특허 (7)

  1. Radosevich Joseph R. (Bethlehem PA) Roy Pradip K. (Allentown PA), Forming a device dielectric on a deposited semiconductor having sub-layers.
    상세보기
  2. Kunii Masafumi (Kanagawa JPX) Hayashi Yuji (Kanagawa JPX), Liquid crystal display device having LDD structure type thin film transistors connected in series.
    상세보기
  3. Swartz George A. (North Brunswick NJ), Method for fabricating a radiation hardened oxide having two portions.
    상세보기
  4. Tsukamoto Katsuhiro (Hyogo JPX) Tokui Akira (Hyogo JPX), Method for forming a thin layer on a semiconductor substrate.
    상세보기
  5. Chen Min-Liang (Hsin PA TWX) Roy Pradip K. (Allentown PA), Method of making thin film transistors including recrystallization and high pressure oxidation.
    상세보기
  6. Fujishiro Felix (San Antonio TX) Lee Chang-Ou (San Antonio TX) Vines Landon (Boise ID), Rapid thermal oxidation of silicon in an ozone ambient.
    상세보기
  7. So Hoe S. (Kyungki KRX), Thin film transistor and process for producing the same.
    상세보기

이 특허를 인용한 특허 (291)

  1. So,Woo Young; Yoo,Kyung Jin; Park,Sang Il, Active matrix display device and manufacturing method thereof.
    상세보기
  2. Moore, John T.; DeBoer, Scott J., Capacitors.
    상세보기
  3. Moore,John T.; DeBoer,Scott J., Capacitors, methods of forming capacitors, and methods of forming capacitor dielectric layers.
    상세보기
  4. Huh, Myung-Soo; Yoon, Tae-Seung; Yi, Jeong-Ho, Display apparatus manufacturing method.
    상세보기
  5. Yamazaki, Shunpei; Takayama, Toru; Murakami, Satoshi; Kimura, Hajime, Display device.
    상세보기
  6. Hayakawa, Masahiko; Murakami, Satoshi; Yamazaki, Shunpei; Akimoto, Kengo, Display device and method of fabricating the same.
    상세보기
  7. Yamazaki, Shunpei; Takayama, Toru; Murakami, Satoshi; Kimura, Hajime, Display device including an opening formed in a gate insulating film, a passivation film, and a barrier film.
    상세보기
  8. Yamazaki, Shunpei; Takayama, Toru; Murakami, Satoshi; Kimura, Hajime, Display device with capacitor elements.
    상세보기
  9. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Display switch with double layered gate insulation and resinous interlayer dielectric.
    상세보기
  10. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  11. Ohtani,Hisashi; Koyama,Jun; Yamazaki,Shunpei, Electro-optical device and semiconductor circuit.
    상세보기
  12. Ohtani, Hisashi; Koyama, Jun; Yamazaki, Shunpei, Electro-optical device and semiconductor device.
    상세보기
  13. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  14. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Fabrication method of semiconductor device.
    상세보기
  15. Furukawa Toshiharu ; Hakey Mark C. ; Holmes Steven J. ; Horak David V. ; Kanarsky Thomas S., Formation of out-diffused bitline by laser anneal.
    상세보기
  16. Furukawa Toshiharu ; Hakey Mark C. ; Holmes Steven J. ; Horak David V. ; Kanarsky Thomas S., Formation of out-diffused bitline by laser anneal.
    상세보기
  17. Satoshi Teramoto JP; Hisashi Ohtani JP; Akiharu Miyanaga JP; Toshiji Hamatani JP; Shunpei Yamazaki JP, Laser processing method.
    상세보기
  18. Satoshi Teramoto JP; Hisashi Ohtani JP; Akiharu Miyanaga JP; Toshiji Hamatani JP; Shunpei Yamazaki JP, Laser processing method.
    상세보기
  19. Teramoto Satoshi,JPX ; Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Hamatani Toshiji,JPX ; Yamazaki Shunpei,JPX, Laser processing method.
    상세보기
  20. Teramoto, Satoshi; Ohtani, Hisashi; Miyanaga, Akiharu; Hamatani, Toshiji; Yamazaki, Shunpei, Laser processing method.
    상세보기
  21. Yamazaki, Shunpei, Light-emitting device.
    상세보기
  22. Yamazaki, Shunpei, Light-emitting device including color filter and black matrix.
    상세보기
  23. Asami, Taketomi; Ichijo, Mitsuhiro; Toriumi, Satoshi; Ohtsuki, Takashi; Yamazaki, Shunpei, Manufacturing method for semiconductor device.
    상세보기
  24. Yamazaki, Shunpei; Arai, Yasuyuki, Manufacturing method for top-gate type and bottom-gate type thin film transistors.
    상세보기
  25. Moriwaka, Tomoaki, Manufacturing method of semiconductor device.
    상세보기
  26. Miyoshi Kozo,JPX, Manufacturing method of thin film diode for liquid crystal display device.
    상세보기
  27. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX, Manufacturing method of thin film semiconductor device.
    상세보기
  28. Ohtani, Hisashi, Metal-gettering method used in the manufacture of crystalline-Si TFT.
    상세보기
  29. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method and manufacturing semiconductor device.
    상세보기
  30. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method for fabricating a semiconductor device.
    상세보기
  31. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  32. Yamazaki,Shunpei; Teramoto,Satoshi; Koyama,Jun; Ogata,Yasushi; Hayakawa,Masahiko; Osame,Mitsuaki, Method for fabricating a semiconductor device.
    상세보기
  33. Shunpei Yamazaki JP; Satoshi Teramoto JP; Jun Koyama JP; Yasushi Ogata JP; Masahiko Hayakawa JP; Mitsuaki Osame JP, Method for fabricating a semiconductor device using a metal catalyst and high temperature crystallization.
    상세보기
  34. Choi, Duck-Kyun, Method for fabricating a thin film transistor.
    상세보기
  35. Maekawa,Shinji; Akimoto,Kengo, Method for fabricating thin film transistor.
    상세보기
  36. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Fukunaga Takeshi,JPX ; Takemura Yasuhiko,JPX, Method for forming a semiconductor device.
    상세보기
  37. Thakur Randhir P. S., Method for forming materials.
    상세보기
  38. Yamazaki Shunpei,JPX ; Komaya Jun,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX, Method for forming semiconductor thin film.
    상세보기
  39. Hisashi Ohtani JP; Hiroki Adachi JP; Akiharu Miyanaga JP; Toru Takayama JP, Method for manufacturing a semiconductor device.
    상세보기
  40. Ohtani,Hisashi; Adachi,Hiroki; Miyanaga,Akiharu; Takayama,Toru, Method for manufacturing a semiconductor device.
    상세보기
  41. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Method for manufacturing a semiconductor device.
    상세보기
  42. Yamazaki, Shunpei; Ohnuma, Hideto; Takano, Tamae; Mitsuki, Toru, Method for manufacturing a semiconductor device.
    상세보기
  43. Yamazaki,Shunpei; Yamaguchi,Naoaki; Nakajima,Setsuo, Method for manufacturing a semiconductor device.
    상세보기
  44. Yasuhiko Takemura JP, Method for manufacturing a semiconductor device.
    상세보기
  45. Yamazaki,Shunpei; Ohnuma,Hideto; Takano,Tamae; Mitsuki,Toru, Method for manufacturing a semiconductor device including top gate thin film transistor and method for manufacturing an active matrix device including top gate thin film transistor.
    상세보기
  46. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method for manufacturing a thin film transistor device.
    상세보기
  47. Yamazaki, Shunpei; Takemura, Yasuhiko, Method for manufacturing a thin film transistor using a high pressure oxidation step.
    상세보기
  48. Chang Chun Yen,TWX ; Shih Po-Sheng,TWX ; Chang Ting-Chang,TWX ; Lin Hsiao-Yi,TWX, Method for manufacturing a transistor having a low leakage current.
    상세보기
  49. Kokubo,Chiho; Yamazaki,Shunpei; Takano,Tamae; Irie,Hiroaki, Method for manufacturing semiconductor device.
    상세보기
  50. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  51. Ohtani, Hisashi; Miyanaga, Akiharu; Teramoto, Satoshi; Yamazaki, Shunpei, Method for manufacturing semiconductor device.
    상세보기
  52. Yamamoto Mutsuo,JPX, Method for manufacturing thin film transistor.
    상세보기
  53. Tanaka, Koichiro; Ohnuma, Hideto, Method for manufacturing transistor semiconductor devices with step of annealing to getter metal with phosphorous.
    상세보기
  54. Yamazaki, Shunpei; Shimada, Hiroyuki; Takenouchi, Akira; Takemura, Yasuhiko, Method for processing semiconductor device apparatus for processing a semiconductor and apparatus for processing semiconductor device.
    상세보기
  55. Yamazaki Shunpei,JPX ; Shimada Hiroyuki,JPX ; Takenouchi Akira,JPX ; Takemura Yasuhiko,JPX, Method for processing semiconductor device, apparatus for processing a semiconductor and apparatus for processing semiconductor device.
    상세보기
  56. Ohtani Hisashi,JPX, Method for producing a semiconductor device.
    상세보기
  57. Zhang Hongyong,JPX, Method for producing a semiconductor integrated circuit including a thin film transistor and a capacitor.
    상세보기
  58. Zhang, Hongyong, Method for producing a semiconductor integrated circuit including a thin film transistor and a capacitor.
    상세보기
  59. Zhang, Hongyong, Method for producing a semiconductor integrated circuit including a thin film transistor and a capacitor.
    상세보기
  60. Hongyong Zhang JP; Yasuhiko Takemura JP; Toru Takayama JP, Method for producing semiconductor device.
    상세보기
  61. Ohtani Hisashi,JPX ; Fukunaga Takeshi,JPX ; Miyanaga Akiharu,JPX, Method for producing semiconductor device.
    상세보기
  62. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Ohnuma Hideto,JPX, Method for producing semiconductor device.
    상세보기
  63. Yamazaki, Shunpei; Ohtani, Hisashi; Ohnuma, Hideto, Method for producing semiconductor device.
    상세보기
  64. Zhang Hongyong,JPX ; Takayama Toru,JPX ; Takemura Yasuhiko,JPX, Method for producing semiconductor device.
    상세보기
  65. Zhang, Hongyong; Takemura, Yasuhiko; Takayama, Toru, Method for producing semiconductor device.
    상세보기
  66. Jang, Jin; Yoon, Soo-Young; Oh, Jae-Young; Shon, Woo-Sung; Park, Seong-Jin, Method of crystallizing amorphous silicon layer and crystallizing apparatus thereof.
    상세보기
  67. Jang Jin,KRX ; Yoon Soo-Young,KRX ; Oh Jae-Young,KRX, Method of crystallizing an amorphous film.
    상세보기
  68. Jang Jin,KRX ; Yoon Soo Young,KRX ; Kim Hyun Churl,KRX, Method of crystallizing an amorphous silicon layer.
    상세보기
  69. Yasuhiko Takemura JP, Method of fabricating a semiconductor device.
    상세보기
  70. Fukunaga,Takeshi; Ohtani,Hisashi; Miyanaga,Akiharu, Method of fabricating a semiconductor device utilizing a catalyst material solution.
    상세보기
  71. Hayakawa, Masahiko; Murakami, Satoshi; Yamazaki, Shunpei; Akimoto, Kengo, Method of fabricating display device.
    상세보기
  72. Nakajima,Setsuo; Ohtani,Hisashi, Method of fabricating semiconductor device.
    상세보기
  73. Yamazaki Shunpei,JPX ; Kusumoto Naoto,JPX ; Teramoto Satoshi,JPX, Method of fabricating semiconductor device.
    상세보기
  74. Moore, John T.; DeBoer, Scott J., Method of forming a capacitor dielectric layer.
    상세보기
  75. Lin, Hui-Chu, Method of forming a low temperature polysilicon thin film transistor.
    상세보기
  76. Sandhu, Gurtej S.; Moore, John T.; Rueger, Neal R., Method of forming a nitrogen-enriched region within silicon-oxide-containing masses.
    상세보기
  77. Nakajima, Setsuo; Ohtani, Hisashi, Method of forming a semiconductor device using a group XV element for gettering by means of infrared light.
    상세보기
  78. Beaman, Kevin L.; Moore, John T., Method of forming a structure over a semiconductor substrate.
    상세보기
  79. Beaman, Kevin L.; Moore, John T., Method of forming a structure over a semiconductor substrate.
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  80. Beaman,Kevin L.; Moore,John T., Method of forming a structure over a semiconductor substrate.
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  81. Ohtani, Hisashi, Method of forming crystalline silicon film.
    상세보기
  82. Moore, John T., Method of forming transistors associated with semiconductor substrates comprising forming a nitrogen-comprising region across an oxide region of a transistor gate.
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  83. Shunpei Yamazaki JP; Mitsunori Sakama JP; Yasuhiko Takemura JP, Method of making crystal silicon semiconductor and thin film transistor.
    상세보기
  84. Lee, Yul-Kyu; Cho, Kyu-Sik; Park, Sun, Method of manufacturing a dual-gate thin film transistor.
    상세보기
  85. Hisashi Ohtani JP; Akiharu Miyanaga JP; Junichi Takeyama JP, Method of manufacturing a semiconductor device.
    상세보기
  86. Isobe,Atsuo; Arao,Tatsuya, Method of manufacturing a semiconductor device.
    상세보기
  87. Ohnuma, Hideto; Yamazaki, Shunpei; Nakajima, Setsuo; Ohtani, Hisashi, Method of manufacturing a semiconductor device.
    상세보기
  88. Yamazaki Shunpei,JPX, Method of manufacturing a semiconductor device.
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  89. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Hamatani Toshiji,JPX, Method of manufacturing a semiconductor device.
    상세보기
  90. Yamazaki, Shunpei; Mitsuki, Toru; Takano, Tamae, Method of manufacturing a semiconductor device.
    상세보기
  91. Yamazaki, Shunpei; Mitsuki, Toru; Takano, Tamae, Method of manufacturing a semiconductor device.
    상세보기
  92. Yamazaki, Shunpei; Nakamura, Osama; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  93. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi; Dairiki, Koji; Mitsuki, Toru; Takayama, Toru; Ohnuma, Hideto; Asami, Taketomi; Ichijo, Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  94. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  95. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Ohnuma,Hideto; Asami,Taketomi; Ichijo,Mitsuhiro, Method of manufacturing a semiconductor device.
    상세보기
  96. Yamazaki,Shunpei; Ohnuma,Hideto; Dairiki,Koji; Mitsuki,Toru; Takayama,Toru; Akimoto,Kengo, Method of manufacturing a semiconductor device.
    상세보기
  97. Yamazaki,Shunpei; Ohtani,Hisashi; Hamatani,Toshiji, Method of manufacturing a semiconductor device.
    상세보기
  98. Hamada,Takashi; Murakami,Satoshi; Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi; Takayama,Toru, Method of manufacturing a semiconductor device comprising doping steps using gate electrodes and resists as masks.
    상세보기
  99. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Ogata Yasushi,JPX ; Hayakawa Masahiko,JPX ; Osame Mitsuaki,JPX, Method of manufacturing a semiconductor device including reduction of a catalyst.
    상세보기
  100. Maekawa,Shinji, Method of manufacturing a semiconductor device that includes forming a material with a high tensile stress in contact with a semiconductor film to getter impurities from the semiconductor film.
    상세보기
  101. Isobe, Atsuo; Arao, Tatsuya, Method of manufacturing a semiconductor device, utilizing a laser beam for crystallization.
    상세보기
  102. Shunpei Yamazaki JP, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
    상세보기
  103. Yamazaki, Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device.
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  104. Yamazaki,Shunpei, Method of manufacturing a semiconductor film and method of manufacturing a semiconductor device by transferring crystallization promoting material in the first semiconductor film to the second semico.
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  105. Yamazaki,Shunpei; Mitsuki,Toru; Takano,Tamae, Method of manufacturing a semiconductor film with little warp.
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  106. Zhang, Hongyong; Uochi, Hideki; Takayama, Toru; Fukunaga, Takeshi; Takemura, Yasuhiko, Method of manufacturing a thin film transistor device.
    상세보기
  107. Ohtani Hisashi,JPX, Method of manufacturing a thin film transistor involving laser treatment.
    상세보기
  108. Ishiu Takehiko,JPX, Method of manufacturing array substrate of a liquid crystal display device.
    상세보기
  109. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  110. Nakamura, Osamu; Yamazaki, Shunpei; Dairiki, Koji; Kajiwara, Masayuki; Koezuka, Junichi; Murakami, Satoshi, Method of manufacturing semiconductor device.
    상세보기
  111. Nakamura,Osamu; Yamazaki,Shunpei; Dairiki,Koji; Kajiwara,Masayuki; Koezuka,Junichi; Murakami,Satoshi, Method of manufacturing semiconductor device.
    상세보기
  112. Ohtani Hisashi,JPX, Method of manufacturing semiconductor device.
    상세보기
  113. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
    상세보기
  114. Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Koyama Jun,JPX ; Miyanaga Akiharu,JPX, Method of manufacturing semiconductor device.
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  115. Yamazaki,Shunpei; Mitsuki,Toru, Method of manufacturing semiconductor device.
    상세보기
  116. Yamazaki, Shunpei; Nakamura, Osamu; Kajiwara, Masayuki; Koezuka, Junichi, Method of manufacturing semiconductor device and semiconductor device.
    상세보기
  117. Yamazaki, Shunpei; Ohtani, Hisashi, Method of manufacturing semiconductor device including thin film transistor over thermal oxidation film over a glass substrate having distortion point of not lower than 750° C.
    상세보기
  118. Yamazaki,Shunpei; Nakamura,Osamu; Kajiwara,Masayuki; Koezuka,Junichi, Method of manufacturing semiconductor device that includes selectively adding a noble gas element.
    상세보기
  119. Mishima, Yasuyoshi; Suga, Katsuyuki; Takei, Michiko; Hara, Akito, Method of manufacturing semiconductor device with polysilicon film.
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  120. Shunpei Yamazaki JP; Hisashi Ohtani JP, Method of producing crystalline semiconductor.
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  121. Sandhu,Gurtej S.; Moore,John T.; Rueger,Neal R., Methods of forming a nitrogen enriched region.
    상세보기
  122. Moore, John T.; DeBoer, Scott J., Methods of forming capacitors.
    상세보기
  123. Eppich,Denise M.; Beaman,Kevin L., Methods of forming capacitors and methods of forming capacitor dielectric layers.
    상세보기
  124. Moore, John T., Methods of forming dielectric materials and methods of processing semiconductor substrates.
    상세보기
  125. Moore, John T., Methods of forming oxide regions over semiconductor substrates.
    상세보기
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  201. Ohtani, Hisashi; Fujimoto, Etsuko, Semiconductor device and method of fabricating the same.
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  226. Zhang, Hongyong; Takayama, Toru, Semiconductor device having channel formation region comprising silicon and containing a group IV element.
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  251. Saito, Satoru, Semiconductor element and method for manufacturing the same.
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  253. Doan Trung Tri, Semiconductor processing method of depositing polysilicon.
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  254. Doan Trung Tri, Semiconductor processing method of reducing thickness depletion of a silicide layer at a junction of different underlying layers.
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  259. Shunpei Yamazaki JP; Hisashi Ohtani JP; Toru Mitsuki JP; Akiharu Miyanaga JP; Yasushi Ogata JP, Semiconductor thin film and semiconductor device.
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  260. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Mitsuki Toru,JPX ; Miyanaga Akiharu,JPX ; Ogata Yasushi,JPX, Semiconductor thin film and semiconductor device.
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