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CO2 cleaning nozzle and method with enhanced mixing zones 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24C-003/00
출원번호 US-0436048 (1995-05-05)
발명자 / 주소
  • Goenka Lakhi Nandlal (Ann Arbor MI)
출원인 / 주소
  • Ford Motor Company (Dearborn MI 02)
인용정보 피인용 횟수 : 22  인용 특허 : 21

초록

An apparatus and method for cleaning a workpiece with abrasive CO2 snow operates with a nozzle for creating and expelling the snow. The nozzle includes an upstream section defined by a first contour for receiving CO2 in a gaseous form. The nozzle also includes a downstream section for directing the

대표청구항

An apparatus for cleaning a workpiece with abrasive CO2 snow, comprising a nozzle for creating and expelling the CO2 snow, comprising: an upstream section for receiving CO2 gas at a first pressure, said upstream section having a first contour optimized for subsonic flow of the CO2, a downstream sect

이 특허에 인용된 특허 (21)

  1. Whitlock Walter H. (Peapack NJ) Weltmer ; Jr. William R. (Murray Hill NJ) Clark James D. (Mountainside NJ), Apparatus and method for removing minute particles from a substrate.
  2. Palmieri Beniamino (Boito Street No. 45 Modena ITX), Apparatus for intraoperative diagnosis.
  3. Hayashi Chikara (Chigasaki JPX), Apparatus for removing covering film.
  4. Layden Lawrence M. (Stanton NJ), Apparatus for removing small particles from a substrate.
  5. Shank ; Jr. James D. (Vestal NY), Blast nozzle with inlet flow straightener.
  6. Fong Calvin C. (Beverly Hills CA) Altizer John W. (Simi Valley CA) Arnold Vernon E. (Fillmore CA) Lawson John K. (Granada Hills CA), Blasting machine utilizing sublimable particles.
  7. Goenka Lakhi N. (Ann Arbor MI), CO2 cleaning system and method.
  8. Kanno Itaru (Itami City JPX) Fukumoto Takaaki (Itami City JPX) Ohmori Toshiaki (Itami City JPX), Cleaning device using fine frozen particles.
  9. Brull John J. (Chagrin Falls OH) Carnahan Michael T. (Bedford OH), Cryogen shot blast deflashing system with jointed supply conduit.
  10. Nakata, Junji, Method for removing flashes from molded resin product.
  11. Niedbala Patrick J. (Livonia MI), Method of cutting workpieces having low thermal conductivity.
  12. Lloyd Daniel L. (Mason OH) Madlener Richard J. (Cincinnati OH), Noise attenuating supersonic nozzle.
  13. Lloyd Daniel L. (Mason OH), Phase change injection nozzle.
  14. Hayashi Chikara (Chigasaki JPX), Process for removing covering film and apparatus therefor.
  15. Tada Masuo (Yao JPX) Hata Takeki (Kobe JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Processing apparatus for semiconductor wafers.
  16. Tada Masuo (Yao JPX) Hata Takeki (Kobe JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Processing apparatus for semiconductor wafers.
  17. Fong Calvin C. (Beverly Hills CA), Sandblasting with pellets of material capable of sublimation.
  18. Gardner Robert C. (Taylor MI) Horn William F. (Plymouth MI) Rhoades Mark K. (Ferndale MI) Wells Marvin D. (Redford MI) Yockey Steve J. (Farmington Hills MI), Silicon micromachined compound nozzle.
  19. Goenka Lakhi N. (Ann Arbor MI), Supersonic exhaust nozzle having reduced noise levels for CO2 cleaning system.
  20. Meuer, Gary D., Supersonic fan nozzle for abrasive blasting media.
  21. McDermott Wayne T. (Allentown PA) Ockovic Richard C. (Northampton PA) Wu Jin J. (Ossining NY) Cooper Douglas W. (Milwood NY) Schwarz Alexander (Bethlehem PA) Wolfe Henry L. (Pleasant Valley NY), Surface cleaning using an argon or nitrogen aerosol.

이 특허를 인용한 특허 (22)

  1. Rajiv S. Agarwala ; Cynthia A. Johnson, Apparatus and method for removing a label from a surface with a chilled medium.
  2. Ko,Se Jong; Kim,Jung Gwan; Yoon,Cheol Nam; Lee,Jeong Ho, Apparatus for cleaning the edges of wafers.
  3. Lehnig, Tony R., Blast media fragmenter.
  4. Broecker, Richard, Blast nozzle with blast media fragmenter.
  5. Kipp,Jens Werner, Blasting method and apparatus.
  6. Eliasson, Bertil; Hallberg, Per-Åke; Carlsson, Lennart; Engman, Fredrik, Device and use in connection with measure for combating.
  7. Millonzi, Richard P.; Foltz, Robert S.; Petralia, Richard C.; Caccamise, Leslie W.; Hammond, Harold F.; Crump, David P.; McCumiskey, Robert E.; Williams, Edward C., Hollow cylindrical imaging member treatment process with solid carbon dioxide pellets.
  8. Taylor, Andrew M., Method and apparatus for high pressure article cleaner.
  9. Benjamin Edward Andrews, Method for cleaning ductwork.
  10. Goenka Lakhi Nandlal, Method of mitigating electrostatic charge during cleaning of electronic circuit boards.
  11. Holden, James Matthew; Suh, Song-Moon; Sudheeran, Shalina D.; Mori, Glen T., Methods and apparatus for cleaning a substrate.
  12. Goenka Lakhi Nandial ; Straub Marc Alan, Nozzle.
  13. Lakhi Nandial Goenka ; Malgorzata M. Skender, Nozzle.
  14. Lakhi Nandlal Goenka ; Marc Alan Straub ; Jay D Baker, Nozzle.
  15. Goenka Lakhi Nandial ; Skender Malgorzata M., Nozzle assembly.
  16. Goenka Lakhi Nandlal ; Straub Marc Alan, Nozzle assembly.
  17. Lakhi Nandlal Goenka ; Marc Alan Straub ; Jay D Baker, Nozzle assembly.
  18. Philip G. Perry ; Rajiv S. Agarwala ; Jodie L. Morris ; Loren E. Hendrix ; Carmen W. Enos ; Gregory J. Arserio, Process for roughening a surface.
  19. Takano, Masamune, Processing apparatus, nozzle, and dicing apparatus.
  20. Kim, Se-Ho, System for forming aerosols and cooling device incorporated therein.
  21. Kim,Se Ho, System for forming aerosols and cooling device incorporated therein.
  22. Patrin John C. ; Heitzinger John M., Treating substrates by producing and controlling a cryogenic aerosol.

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