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Method and containment vessel for producing fused silica glass and the fused silica blank produced 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03B-020/00
출원번호 US-0712296 (1996-09-11)
발명자 / 주소
  • Maxon John E. (Canton NY)
출원인 / 주소
  • Corning Incorporated (Corning NY 02)
인용정보 피인용 횟수 : 27  인용 특허 : 25

초록

Fused silica boules (19) having improved homogeneity are produced by causing the boule (19) to flow radially during its formation to achieve local mixing between portions of the boule which may have experienced different laydown conditions. The mixing is achieved by one or a combination of: (1) use

대표청구항

A fused silica blank which has a homogeneity which is less than or equal to 0.25×10-6 for a blank size greater than or equal to 125 millimeters.

이 특허에 인용된 특허 (25)

  1. Akaike Nobuya (Yokohama JPX), Apparatus for VAD with a vibration detector to eliminate natural vibrations.
  2. Miller Stewart Edward (Locust NJ), Axial fabrication of optical fibers.
  3. Kao Charles K. (Roanoke VA) Goell James E. (Roanoke VA) Maklad Mokhtar S. (Roanoke VA), Continuous process for manufacturing optical fibers.
  4. Uchikawa Akira (Takefu JPX) Iwasaki Atsushi (Takefu JPX) Fukuoka Toshio (Sabae JPX) Matsumura Mitsuo (Takefu JPX) Matsui Hiroshi (Takefu JPX) Sato Yasuhiko (Annaka JPX) Aoyama Masaaki (Kouriyama JPX), Manufacture of a quartz glass vessel for the growth of single crystal semiconductor.
  5. Kanamori Hiroo (Yokohama JPX) Urano Akira (Yokohama JPX) Aikawa Haruhiko (Yokohama JPX) Ishikawa Shinji (Yokohama JPX) Hirose Chisai (Yokohama JPX) Saito Masahide (Yokohama JPX), Method for fabricating an optical waveguide.
  6. French William George (Plainfield NJ) MacChesney John Burnette (Stirling NJ), Method for making optical fibers with helical gradations in composition.
  7. Achener Claude (Paris FRX), Method for preparing a preform for optical waveguides.
  8. Sempolinski Daniel R. (Painted Post NY) Swaroop Latha I. (Painted Post NY), Method for producing fused silica with low sodium ion contamination level.
  9. Kyoto Michihisa (Yokohama JPX) Watanabe Minoru (Yokohama JPX) Kanamori Hiroo (Yokohama JPX), Method for producing glass preform for optical fiber.
  10. Maklad Mokhtar S. (Roanoke VA), Method of fabricating large optical preforms.
  11. Sawada Renshi (Tokorozawa JPX) Watanabe Junji (Tokyo JPX), Method of joining semiconductor substrates.
  12. Blackwell Jeffery L. (Corning NY) Dobbins Michael S. (Wilmington NC) McLay Robert E. (Corning NY) Truesdale Carlton M. (Corning NY), Method of making fused silica.
  13. Dobbins Michael S. (Wilmington NC) McLay Robert E. (Corning NY), Method of making fused silica by decomposing siloxanes.
  14. Bachman David L. (Lindley NY) Lewis ; Jr. William C. (Big Flats NY) Schultz Peter C. (Painted Post NY) Voorhees Francis W. (Painted Post NY), Method of making fused silica-containing material.
  15. Schultz Peter C. (Painted Post NY) Wusirika Raja R. (Corning NY), Method of making nitrogen-doped graded index optical waveguides.
  16. Rss Dieter (Hsbach-Feldkahl DEX) Rau Karlheinz (Hanau DEX) Bonewitz Hans-Ulrich (Hammersbach DEX), Method of manufacturing a glass body having a non-uniform refractive index.
  17. Fujiwara Kunio (Yokohama JPX) Tanaka Gotaro (Yokohama JPX) Kurosaki Shiro (Kamakura JPX), Method of manufacturing glass for optical waveguide.
  18. Schultz Peter C. (Painted Post NY), Method of producing glass optical filaments.
  19. Sarkar Arnab (West Hills CA), Methods of making optical waveguides.
  20. Powers Dale R. (Painted Post NY), Optical fiber preform and method.
  21. Yamagata Shigeru (Kohriyama JPX) Kuriyama Michiyou (Kohriyama JPX) Inaki Kyoichi (Kohriyama JPX) Takke Ralf (Hanau DEX), Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank the.
  22. Nishimura Hiroyuki (Fukushima JPX) Fujinoki Akira (Fukushima JPX) Matsuya Toshikatsu (Fukushima JPX) Inaki Kyoichi (Fukushima JPX) Kato Toshiyuki (Fukushima JPX) Shimada Atsushi (Fukushima JPX), Optical member of synthetic quartz glass for excimer lasers and method for producing same.
  23. Nishimura Hiroyuki (Fukushima JPX) Fujinoki Akira (Fukushima JPX) Matsuya Toshikatsu (Fukushima JPX) Inaki Kyoichi (Fukushima JPX) Kato Toshiyuki (Fukushima JPX) Shimada Atsushi (Fukushima JPX), Optical member of synthetic quartz glass for excimer lasers and method for producing same.
  24. Yamagata Shigeru (Kohriyama JPX) Inaki Kyoichi (Kohriyama JPX) Matsuya Toshikatu (Kohriyama JPX) Takke Ralf (Hanau DEX) Thomas Stephan (Grosskrotzenburg DEX) Fabian Heinz (Hanau DEX), Optical members and blanks or synthetic silica glass and method for their production.
  25. Martin John (Monterrey MX), Press molded hot glassware handling apparatus.

이 특허를 인용한 특허 (27)

  1. Marley Floyd E. ; Misra Mahendra K. ; Sproul Merrill F., Apparatus for minimizing air infiltration in the production of fused silica glass.
  2. Coriand, Frank; Menzel, Andreas; Voitsch, Andreas, Apparatus for producing synthetic quartz glass.
  3. Schermerhorn Paul M., Furnace for producing fused silica glass.
  4. Marley, Floyd E.; Sempolinski, Daniel R.; Sproul, Merrill F., Furnaces for fused silica production.
  5. Pandelisev, Kiril A., Hot substrate deposition of fused silica.
  6. Hrdina,Kenneth E.; Maxon,John E.; Wasilewski,Michael H., Light weight porous structure.
  7. Kenneth E. Hrdina ; Daniel R. Sempolinski ; Michael H. Wasilewski ; C. Charles Yu, Light weight porous structure.
  8. Davis ; Jr. Claude L. ; Linder Michael W.,DEX, Low cost light weight mirror blank.
  9. Floyd E. Marley ; Mahendra K. Misra ; Merrill F. Sproul, Method and apparatus for minimizing air infiltration in the production of fused silica glass.
  10. Raymond E. Lindner ; Robert E. McLay ; Mahendra K. Misra ; Michael H. Wasilewski, Method and apparatus for preventing burner-hole build-up in fused silica processes.
  11. Marley, Floyd E.; Sempolinski, Daniel R.; Sproul, Merrill F., Methods and furnaces for fused silica production.
  12. Laufer, Timo; Zellner, Johannes, Optical component, comprising a material with a predetermined homogeneity of thermal expansion.
  13. Richard S. Priestley ; Daniel R. Sempolinski ; Chunzhe C. Yu, Photolithography method, photolithography mask blanks, and method of making.
  14. Richard S. Priestley ; Daniel R. Sempolinski ; Chunzhe C. Yu, Photolithography method, photolithography mask blanks, and method of making.
  15. Berkey, George Edward; Moore, Lisa Anne; Yu, Charles Chunzhe, Projection lithography photomask blanks, preforms and method of making.
  16. Berkey George Edward ; Moore Lisa Anne ; Yu Charles Chunzhe, Projection lithography photomask blanks, preforms and methods of making.
  17. Berkey, George Edward; Moore, Lisa Anne; Pierson, Michelle Diane, Projection lithography photomasks and method of making.
  18. Berkey, George Edward; Moore, Lisa Anne; Pierson, Michelle Diane, Projection lithography photomasks and method of making.
  19. Berkey George Edward ; Moore Lisa Anne ; Pierson Michelle Diane, Projection lithography photomasks and methods of making.
  20. Pavlik, Jr., Robert S.; Kotacska, Lawrence H., Pure fused silica, furnace and method.
  21. Alkemper,Jochen; Schuhmacher,Joerg; Hack,Hrabanus; Sohr,Oliver, SiO-TiOglass body with improved resistance to radiation.
  22. Yajima Shouji,JPX ; Yamaguchi Norihisa,JPX ; Nakagawa Kazuhiro,JPX ; Jinbo Hiroki,JPX, Synthetic silica glass manufacturing apparatus.
  23. Ohashi Norio,JPX ; Kuriyama Michiyo,JPX ; Yamagata Shigeru,JPX ; Sunada Shigemasa,JPX, Synthetic silica glass used with uv-rays and method producing the same.
  24. Lisa A. Moore ; Charlene Smith, Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass.
  25. Moore Lisa A. ; Smith Charlene, Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass.
  26. Moore, Lisa A.; Smith, Charlene M., Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass.
  27. Moore, Lisa A.; Smith, Charlene M., Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass.
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