IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0532802
(1995-11-08)
|
우선권정보 |
JP-0040263 (1994-03-11) |
국제출원번호 |
PCT/JP95/003
(1995-03-10)
|
§371/§102 date |
19951108
(19951108)
|
국제공개번호 |
WO-9524409
(1995-09-14)
|
발명자
/ 주소 |
- Hama Hiroshi,JPX
- Nakano Shinji,JPX
|
출원인 / 주소 |
- Otsuka Kagaku Kabushiki Kaisha, JPX
|
대리인 / 주소 |
Armstrong, Westerman, Hattori, McLeland & Naughton
|
인용정보 |
피인용 횟수 :
9 인용 특허 :
0 |
초록
▼
The compound of the present invention is a salt of a spiropyran compound and an acidic compound, the spiropyran compound being represented by the formula [ STR 1 ] wherein R.sup.1 means a C.sub.1 to C.sub.20 alkyl group, an aralkyl group, a hydroxyethyl group, an acryloxyethyl group or a methacrylox
The compound of the present invention is a salt of a spiropyran compound and an acidic compound, the spiropyran compound being represented by the formula [ STR 1 ] wherein R.sup.1 means a C.sub.1 to C.sub.20 alkyl group, an aralkyl group, a hydroxyethyl group, an acryloxyethyl group or a methacryloxyethyl group, R.sup.2 to R.sup.7 each mean a hydrogen atom, a C.sub.1 to C.sub.6 alkyl group or the like, R.sup.8 means a hydrogen atom, a vinyl group, a group --CH.sub.2 OR.sup.9 or a group --CH.sub.2 OCOC(R.sup.10).dbd.CH.sub.2 (wherein R.sup.9 means a hydrogen atom or a C.sub.1 to C.sub.4 alkyl group and R.sup.10 means a hydrogen atom or a methyl group), and X means an oxygen atom or a sulfur atom.
대표청구항
▼
[ We claim:] [1.] A salt of a spiropyran compound and an acidic compound, the spiropyran compound being represented by the formula [ STR 5 ] wherein R.sup.1 means a C.sub.1 to C.sub.20 alkyl group, an aralkyl group, a hydroxyethyl group, an acryloxyethyl group or a methacryloxyethyl group, R.sup.2 a
[ We claim:] [1.] A salt of a spiropyran compound and an acidic compound, the spiropyran compound being represented by the formula [ STR 5 ] wherein R.sup.1 means a C.sub.1 to C.sub.20 alkyl group, an aralkyl group, a hydroxyethyl group, an acryloxyethyl group or a methacryloxyethyl group, R.sup.2 and R.sup.4 are the same or different and each mean a hydrogen atom, a C.sub.1 to C.sub.6 alkyl group, an aryl group, an aralkyl group, a C.sub.1 to C.sub.5 alkoxy group, a halogen atom, a cyano group, a trichloromethyl group, a trifluoromethyl group or a nitro group, R.sup.3 and R.sup.5 are the same or different and each mean a hydrogen atom, a C.sub.1 to C.sub.6 alkyl group, an aryl group, an aralkyl group, a C.sub.1 to C.sub.5 alkoxy group, a halogen atom, a cyano group, a trichloromethyl group, a trifluoromethyl group, a nitro group, an amino group, a dimethylamino group or a diethyl amino group, R.sup.6 and R.sup.7 are the same or different and each mean a hydrogen atom, a C.sub.1 to C.sub.6 alkyl group, an aryl group, an aralkyl group, a halogen atom, a cyano group or a nitro group, R.sup.8 means a hydrogen atom, a vinyl group, a group --CH.sub.2 OR.sup.9 or a group --CH.sub.2 OCOC(R.sup.10).dbd.CH.sub.2 (wherein R.sup.9 means a hydrogen atom or a C.sub.1 to C.sub.4 alkyl group and R.sup.10 means a hydrogen atom or a methyl group), and X means an oxygen atom or a sulfur atom.
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