초록 ▼

A plasma processing apparatus for etching, ashing, or otherwise processing silicon wafers has a pair of spaced reaction chambers each for processing a silicon wafers in a plasma, a pair of spaced cassette table mechanisms each for supporting a wafer cassette which houses a plurality of wafers therei

A plasma processing apparatus for etching, ashing, or otherwise processing silicon wafers has a pair of spaced reaction chambers each for processing a silicon wafers in a plasma, a pair of spaced cassette table mechanisms each for supporting a wafer cassette which houses a plurality of wafers therein, and a transfer robot disposed between the pair of spaced reaction chambers and the pair of spaced cassette table mechanisms, for transferring the wafers, one at a time, between the wafer cassette supported by one of the workpiece table mechanisms and one of the reaction chambers. Each of the cassette table mechanisms has a turntable for placing the wafer thereon, the turntable being rotatable to orient the wafer cassette out of physical interference with the robot arm of the transfer robot.

대표청구항 ▼

[ What is claimed is:] [1.] A plasma processing apparatus comprising:a feed line for feeding a cassette which houses a wafer therein;a cassette table mechanism disposed near said feed line for receiving the cassettein operative cooperation with said feed line;a reaction chamber means for processing

[ What is claimed is:] [1.] A plasma processing apparatus comprising:a feed line for feeding a cassette which houses a wafer therein;a cassette table mechanism disposed near said feed line for receiving the cassettein operative cooperation with said feed line;a reaction chamber means for processing the wafer in plasma; anda transfer robot means including an extensible and contractible robot arm for transferring the wafer between said reaction chamber means and said cassette as received by said cassette table mechanism;said cassette table mechanism having means for supporting the cassette thereon, and means for angularly moving the cassette between a position substantially perpendicular to said feed line and a position oriented toward said reaction chamber means; andsaid reaction chamber means includes a reaction chamber which is disposed substantially symmetrically across from said cassette on opposite sides of said transfer robot means when said cassette is supported by said cassette table mechanism.