초록

which can be used in photolithography or for producing a color filter.

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[ What we claim is:] [1.] A negative working photoresist composition which comprises:(1) a photopolymerizable monomer mixture represented by the following formula (I): [ STR 16 ] wherein n, which is an average repeating number, represents a number of from 0 to 20; R.sub.1 and R.sub.2 each independen

[ What we claim is:] [1.] A negative working photoresist composition which comprises:(1) a photopolymerizable monomer mixture represented by the following formula (I): [ STR 16 ] wherein n, which is an average repeating number, represents a number of from 0 to 20; R.sub.1 and R.sub.2 each independently represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group or a cycloalkyl group; each of Q independently represents --OH or --OROCH.dbd.CH.sub.2 in which R represents an alkylene group having 1-12 carbon atoms, provided that the molar ratio of (--OH)/(--OROCH.dbd.CH.sub.2) is from 10/90 to 90/10; and A represents a divalent hydrocarbon group having 1-30 carbon atoms;(2) a triazine compound represented by the following general formula (II): [ STR 17 ] wherein R.sub.3, R.sub.4 and R.sub.5 each independently represents an alkyl, alkyl substituted with phenyl, aryl, alkenyl, alkenyl substituted with phenyl, alkoxy, aralkyl or alkylthio group, wherein the alkyl, aryl, alkenyl, alkoxy and aralkyl group may be optionally substituted with one or more halogen atoms, and wherein if the aryl group is phenyl or naphthyl then the phenyl or naphthyl may be optionally substituted with C.sub.1 -C.sub.4 alkyl , up to C.sub.4 alkenyl or C.sub.1 -C.sub.4 alkoxy, provided that at least one of R.sub.3, R.sub.4 and R.sub.5 is a methyl group substituted with one, two or three halogen atoms; and(3) a solvent.