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Light-sensitive composition and light-sensitive lithographic printing plate containing o-quinonediazide compound, novol 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-070/23
출원번호 US-0567101 (1995-12-04)
우선권정보 JP-0179585 (1995-06-23)
발명자 / 주소
  • Higashino Katuhiko,JPX
  • Ohta Tomohisa,JPX
  • Matsubara Shinichi,JPX
출원인 / 주소
  • Mitsubishi Chemical Corporation, JPX
대리인 / 주소
    Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
인용정보 피인용 횟수 : 123  인용 특허 : 0

초록

and a lithographic printing plate using the same.

대표청구항

[ We claim:] [1.] A light-sensitive composition containing an o-quinonediazide compound, a novolak resin and a polymer,characterized in that the polymer contains 3 to 40 mole % of a constitutional unit selected from the group consisting of constitutional units represented by the formulae (I), (II) a

이 특허를 인용한 특허 (123)

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