이 특허를 인용한 특허 (71)

1. Celikkaya,Ahmet; Anderson,Thomas J., AIO-LaO-YO-MgO ceramics, and methods of making the same.

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2. Woo, Edward J.; Munoz, Juan A.; Fedorova, Nataliya V.; Orlando, Mark W.; Studiner, IV, Charles J.; Manor, Nicholas B., Abrasive article.

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3. Mujumdar,Ashutosh N.; Christianson,Todd J.; Schwabel,Mark G., Abrasive article and methods for grinding glass.

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4. Coad, Eric C.; O'Neill, David G., Abrasive article comprising a structured diamond-like carbon coating and method of using same to mechanically treat a substrate.

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5. David, Moses M.; Culler, Scott R.; Boden, John T., Abrasive article having a plurality of precisely-shaped abrasive composites.

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6. Bruxvoort, Wesley J., Abrasive article suitable for modifying a semiconductor wafer.

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7. Ohishi, Michihiro; Togashi, Yoko; Nagano, Yasuhiko, Abrasive material product, its production method and use method.

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8. Rosenflanz, Anatoly Z., Abrasive particles and methods of making and using the same.

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9. Rosenflanz,Anatoly Z.; Celikkaya,Ahmet; Anderson,Thomas J., Abrasive particles, abrasive articles, and methods of making and using the same.

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10. Rosenflanz,Anatoly Z.; Celikkaya,Ahmet; Anderson,Thomas J., Abrasive particles, and methods of making and using the same.

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11. Wood, William P.; McArdle, James L., Agglomerate abrasive grain and a method of making the same.

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12. Rosenflanz,Anatoly Z., AlO-YO-ZrO/HfOmaterials, and methods of making and using the same.

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13. Rosenflanz, Anatoly Z., AlO-rare earth oxide-ZrO/HfOmaterials, and methods of making and using the same.

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14. Rosenflanz,Anatoly Z.; Celikkaya,Ahmet; Anderson,Thomas J., Alumina-zirconia, and methods of making and using the same.

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15. Lombardo Brian, Belts for polishing semiconductors.

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16. McArdle, James L.; Culler, Scott R.; Wood, William P., Ceramic aggregate particles.

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17. Rosenflanz, Anatoly Z.; Celikkaya, Ahmet; Anderson, Thomas J., Ceramic fibers and composites comprising same.

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18. Rosenflanz, Anatoly Z.; Endres, Berkan K.; Anderson, Thomas J., Ceramic materials and methods of making and using the same.

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19. Rosenflanz,Anatoly Z., Ceramic materials, abrasive particles, abrasive articles, and methods of making and using the same.

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20. Rosenflanz,Anatoly Z.; Schardt,Craig R., Ceramics comprising AIO, YO, ZrOand/or HfO, and NbOand/or TaOand methods of making the same.

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21. Rosenflanz,Anatoly Z.; Schardt,Craig R., Ceramics comprising AlO, REO, ZrOand/or HfO, and NbOand/or TaOand methods of making the same.

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22. Rosenflanz,Anatoly Z.; Schardt,Craig R., Ceramics comprising AlO, REO, ZrOand/or HfO, and NbOand/or TaOand methods of making the same.

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23. Rosenflanz,Anatoly Z.; Schardt,Craig R., Ceramics comprising AlO, YO, ZrOand/or HfO, and NbOand/or TaOand methods of making the same.

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24. Rosenflanz,Anatoly Z.; Endres,Berkan K.; Anderson,Thomas J., Ceramics, and methods of making and using the same.

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25. Adefris, Negus B.; Joseph, William D.; Wagle-Peterson, Kathleen A., Composite abrasive particles and method of manufacture.

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26. Endres,Berkan K.; Anderson,Thomas J.; Rosenflanz,Anatoly Z., Composite articles and methods of making the same.

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27. Dalton Ralph ; Walters Roy J., Device for removing stains.

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28. Walters Roy J., Device for removing stains from swimming pool walls and concrete.

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29. Walters Roy J., Device for removing stains from swimming pool walls and concrete and the method of making the same.

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30. Goetz, Douglas P., Fixed abrasive article for use in modifying a semiconductor wafer.

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31. Goetz,Douglas P., Fixed abrasive article for use in modifying a semiconductor wafer.

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32. Rosenflanz,Anatoly Z., Glass-ceramics.

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33. Petersen, John G.; Minick, Chris A.; Owen, Ian R., Laminated flexible resilient abrasive article.

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34. Homola Andrew M. ; Wong Javier, Mechanical texturing of glass and glass-ceramic substrates.

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35. Rosenflanz, Anatoly Z., Metal oxide ceramic and method of making articles therewith.

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36. Sabde, Gundu M.; Meikle, Scott, Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates with metal compound abrasives.

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37. Sabde, Gundu M.; Meikle, Scott, Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates with metal compound abrasives.

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38. Visser, Robert G., Method for grinding glass.

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39. Woo,Edward J.; Bange,Donna W.; Lamphere,Craig F., Method of abrading a workpiece.

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40. Roy J. Walters, Method of cleaning tile grout.

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41. Walters, Roy J., Method of cleaning tile grout.

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42. Walters,Roy J., Method of cleaning tile grout.

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43. Rosenflanz, Anatoly Z.; Celikkaya, Ahmet; Anderson, Thomas J., Method of making amorphous and ceramics via melt spinning.

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44. Rosenflanz,Anatoly Z.; Celikkaya,Ahmet; Anderson,Thomas J., Method of making amorphous materials and ceramics.

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45. Culler, Scott R.; McArdle, James L.; Nelson, Jeffrey W.; Wallace, John T., Method of making an agglomerate particle.

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46. McArdle, James L.; Nelson, Jeffrey W.; Culler, Scott R.; Wallace, John T., Method of making ceramic aggregate particles.

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47. Rosenflanz, Anatoly Z., Method of making ceramic articles.

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48. Rosenflanz,Anatoly Z., Method of making ceramic articles.

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49. Masuhiro Natsuhara JP; Hirohiko Nakata JP; Motoyuki Tanaka JP; Yasuhisa Yushio JP, Method of polishing a ceramic substrate.

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50. Utashiro Tomoya,JPX, Method of polishing memory disk substrate.

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51. Celikkaya,Ahmet; Anderson,Thomas J., Methods of making AlO-SiOceramics.

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52. Celikkaya,Ahmet; Anderson,Thomas J., Methods of making AlO-SiOceramics.

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53. Celikkaya, Ahmet; Anderson, Thomas J., Methods of making ceramic particles.

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54. Rosenflanz,Anatoly Z., Methods of making ceramics comprising AlO, REO, ZrOand/or HfOand Nb0and/or TaO.

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55. Saldana, Miguel A.; Owczarz, Aleksander A., Oscillating fixed abrasive CMP system and methods for implementing the same.

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56. Rosenflanz,Anatoly Z.; Celikkaya,Ahmet; Anderson,Thomas J., Plasma spraying.

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57. Konishi Nobuo,JPX ; Iwashita Mitsuaki,JPX, Polishing apparatus, polishing member.

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58. Jimin Zhang ; Ken Cummings ; Mike Lojero ; Hector Salcedo ; Zeyang Zhou ; Buu Van ; Shapour Bakhtiari, Polishing memory disk substrates with reclaim slurry.

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59. Miyauchi,Hiroyuki; Shiho,Hiroshi, Polishing pad.

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60. Miyauchi,Hiroyuki; Shiho,Hiroshi, Polishing pad.

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61. Miyauchi,Hiroyuki; Shiho,Hiroshi, Polishing pad.

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62. Okamoto,Takahiro; Shiho,Hiroshi, Polishing pad.

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63. Okamoto,Takahiro; Shiho,Hiroshi, Polishing pad.

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64. Okamoto,Takahiro; Shiho,Hiroshi, Polishing pad.

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65. Okamoto,Takahiro; Shiho,Hiroshi, Polishing pad.

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66. Lukanc Todd ; Sahota Kashmir S., Polishing pad and method for polishing porous materials.

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67. Ouderkirk,Andrew J.; Lugg,Paul S.; Benson, Jr.,Olester; Leatherdale,Catherine A.; Joseph,William D., Process for manufacturing optical and semiconductor elements.

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68. Hollatz, Mark; Römer, Andreas, Process for the abrasive machining of surfaces, in particular of semiconductor wafers.

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69. Woo,Edward J.; Lamphere,Craig F.; Koehnle,Gregory A., Structured abrasive article and method of making and using the same.

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70. Woo, Edward J.; Baran, Jr., Jimmie R.; Culler, Scott R.; Graham, Paul D., Structured abrasive article and method of using the same.

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71. Pribyl, Joseph G; Alahapperuma, Karunasena; Lamphere, Craig F.; Woo, Edward J., Structured abrasive with overlayer, and method of making and using the same.

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