초록 ▼

A method for coating a substrate with a relatively thin, uniform film of a fluid with a minimum of waste. A volume of fluid is produced and the size and velocity of the volume of fluid are selected such that the volumes of fluid break up upon impact with the substrate without splashing or rippling.

A method for coating a substrate with a relatively thin, uniform film of a fluid with a minimum of waste. A volume of fluid is produced and the size and velocity of the volume of fluid are selected such that the volumes of fluid break up upon impact with the substrate without splashing or rippling. The apparatus and method are ideal for coating semiconductor wafers with a photoresist solution. The kinetic energy of the volume of fluid is adjusted to overcome the free energy associated with surface tension on impact. The collision of the fluid thus results in a uniform, thin coating of photoresist or other coating solution which may then be further processed by conventional techniques.

대표청구항 ▼

[ What is claimed is:] [1.] A method of coating a thin film on a substrate comprising the steps of:generating a volume of a fluid having a preset surface area;accelerating said volume of fluid by impacting said volume with a pressurized stream of a second fluid to a velocity, whereby said volume of

[ What is claimed is:] [1.] A method of coating a thin film on a substrate comprising the steps of:generating a volume of a fluid having a preset surface area;accelerating said volume of fluid by impacting said volume with a pressurized stream of a second fluid to a velocity, whereby said volume of fluid is accelerated in the direction of said substrate; andcontrolling a ratio of said volume to said surface area of said fluid such that said velocity of said volume of fluid at impact with said substrate results in wetting of said substrate with a film of said fluid but does not cause rippling, splashing or inhomogeneities in said film on said substrate wherein said velocity .nu., volume V and surface area A of said accelerated fluid are such that the ratio ]EQU10 ] is greater than or equal to 1, wherein .rho. is the density of the fluid and .sigma. is the surface tension of the fluid.