초록 ▼

An epoxy resin composition comprising (A) 20-80 parts by weight of an epoxy resin, (B) 20-80 parts by weight of a curing agent, (C) 0.1-50 parts by weight of a phosphorus-containing flame retardant, and (D) 200-1,200 parts by weight of an inorganic filler cures into products having improved high-tem

An epoxy resin composition comprising (A) 20-80 parts by weight of an epoxy resin, (B) 20-80 parts by weight of a curing agent, (C) 0.1-50 parts by weight of a phosphorus-containing flame retardant, and (D) 200-1,200 parts by weight of an inorganic filler cures into products having improved high-temperature exposure resistance, flame retardancy, and reflow cracking resistance. The composition eliminates blending of antimony trioxide and brominated compounds and is useful in encapsulating semiconductor devices for imparting high-temperature reliability.

대표청구항 ▼

[ We claim:] [1.] A semiconductor encapsulating epoxy resin composition suitable for molding over a semiconductor comprising(A) 20 to 80 parts by weight of an epoxy resin which is a biphenyl epoxy resin or novolak epoxy resin,(B) 20 to 80 parts by weight of a curing agent,(C) 0.1 to 50 parts by weig

[ We claim:] [1.] A semiconductor encapsulating epoxy resin composition suitable for molding over a semiconductor comprising(A) 20 to 80 parts by weight of an epoxy resin which is a biphenyl epoxy resin or novolak epoxy resin,(B) 20 to 80 parts by weight of a curing agent,(C) 0.1 to 50 parts by weight of a compound of the general formula (1), and(D) 200 to 1,200 parts by weight of an inorganic filler,the general formula (1) being: [ STR 9 ] wherein each of R.sup.1 and R.sup.2 is an alkyl radical having 1 to 4 carbon atoms,each of R.sup.3 and R.sup.4 is a hydrogen atom or alkyl radical having 1 to 4 carbon atoms,R.sup.5 is a hydrogen atom, hydroxyl radical or [ STR 10 ] radical, R.sup.6 and R.sup.7 are independently selected from the group consisting of a hydrogen atom, hydroxyl radical, and radicals represented by [ STR 11 ] each of R.sup.8 and R.sup.9 is a hydrogen atom or methyl radical, and letter n is an integer of 0 to 10.