[미국특허]
Radiation-curable acrylates with built-in photoinitiators
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C08G-000/00
C07C-069/96
C08F-018/24
출원번호
US-0674832
(1996-07-03)
우선권정보
DE-0024812 (1995-07-07)
발명자
/ 주소
Reich Wolfgang,DEX
Beck Erich,DEX
Jager Ulrich,DEX
Schwalm Reinhold,DEX
출원인 / 주소
BASF Aktiengesellschaft, DEX
대리인 / 주소
Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
인용정보
피인용 횟수 :
14인용 특허 :
0
초록▼
Radiation-curable (meth)acrylates obtainable by reacting compounds of the formula [ STR 1 ] in which R is C.sub.1 -C.sub.4 -alkyl, aryl or R.sup.1 and R.sup.1 is [ STR 2 ] in which R.sup.2 to R.sup.6 independently of one another are H, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy, OH, phenyl, S
Radiation-curable (meth)acrylates obtainable by reacting compounds of the formula [ STR 1 ] in which R is C.sub.1 -C.sub.4 -alkyl, aryl or R.sup.1 and R.sup.1 is [ STR 2 ] in which R.sup.2 to R.sup.6 independently of one another are H, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy, OH, phenyl, SH, SCH.sub.3, SC.sub.2 H.sub.5, F, Cl, Br, CN, COOH, COO--(C.sub.1 -C.sub.17 -alkyl), COO--(C.sub.5 -C.sub.10 -aryl), CF.sub.3, N(alkyl).sub.2, N(alkyl)(aryl), N(aryl).sub.2, N.sup..sym. (alkyl).sub.3 A.sup..crclbar., N.sup..sym. H(alkyl).sub.2 A.sup..crclbar., A.sup..crclbar. is the anion of an acid, and alkyl or aryl, unless indicated otherwise, is C.sub.1 -C.sub.10 -alkyl or C.sub.5 -C.sub.10 -aryl, respectively, and at least one but not more than 3 of R.sup.2 to R.sup.6 are [ STR 3 ] with hydroxy(meth)acrylates containing at least 1 free hydroxyl group and at least 2 (meth)acrylic groups in the molecule.
대표청구항▼
[ We claim:] [1.] A radiation-curable (meth)acrylate which is the reaction product of a compound of the formula [ STR 9 ] where R is C.sub.1 -C.sub.4 -alkyl, aryl or R.sup.1 and R.sup.1 is [ STR 10 ] wherein R.sup.2 to R.sup.6 independently of one another are H, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.s
[ We claim:] [1.] A radiation-curable (meth)acrylate which is the reaction product of a compound of the formula [ STR 9 ] where R is C.sub.1 -C.sub.4 -alkyl, aryl or R.sup.1 and R.sup.1 is [ STR 10 ] wherein R.sup.2 to R.sup.6 independently of one another are H, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy, OH, phenyl, SH, SCH.sub.3, SC.sub.2 H.sub.5, F, Cl, Br, CN, COOH, COO--(C.sub.1 -C.sub.17 -alkyl), COO--C.sub.5 -C.sub.10 -aryl), CF.sub.3, N(alkyl).sub.2, N(alkyl)(aryl), N(aryl).sub.2, N.sup..sym. (alkyl).sub.3 A.sup..crclbar., N.sup..sym. H(alkyl).sub.2 A.sup..crclbar., A.sup..crclbar. is the anion of an acid, and alkyl or aryl is C.sub.1 -C.sub.10 -alkyl or C.sub.5 -C.sub.10 -aryl, respectively, and at least one but not more than three of R.sup.2 to R.sup.6 are [ STR 11 ] with a hydroxy(meth)acrylate which contains at least 1 free hydroxyl group and at least two (meth)acrylic groups in the molecule. [5.] A process for the preparation of a radiation-curable (meth)acrylate, wherein a compound of the formula I is reacted with hydroxy(meth)acrylates which contain at least one free hydroxyl group and at least two (meth)acrylic groups.
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