초록 ▼

Discloses DNA isolation and purification methods which involve novel washing steps. The disclosed methods provide a means for isolating and purifying DNA from a homogeneous mixture of DNA of other cellular contaminants by treating silica with the homogeneous mixture containing DNA in the presence of

Discloses DNA isolation and purification methods which involve novel washing steps. The disclosed methods provide a means for isolating and purifying DNA from a homogeneous mixture of DNA of other cellular contaminants by treating silica with the homogeneous mixture containing DNA in the presence of a chaotropic salt solution and then washing and separating the washed and treated silica in successive wash steps with aqueous alcohol wash solutions. A first wash step involves washing the treated silica with a first wash solution of at least 95 wt % alcohol in water. A second wash step similarly involves washing the treated and washed silica with second wash solution of less than 95 wt % alcohol in water.

대표청구항 ▼

[ I claim:] [1.] A method for isolating DNA from a homogeneous mixture of DNA and other material, said method comprising the steps of:a) treating silica with said homogeneous mixture in the presence of chaotrope;b) washing said treated silica with a first wash solution comprising at least 95 wt % al

[ I claim:] [1.] A method for isolating DNA from a homogeneous mixture of DNA and other material, said method comprising the steps of:a) treating silica with said homogeneous mixture in the presence of chaotrope;b) washing said treated silica with a first wash solution comprising at least 95 wt % alcohol; andc) washing said treated and washed silica with a second wash solution, said second wash solution comprising from about 65% to about 95 wt % alcohol in water, said isolated DNA located on the surface of said silica.