이 특허를 인용한 특허 (39)

1. Shamouil Shamouilian ; Mehran Moalem ; Tony S. Kaushal, Abatement of fluorine gas from effluent.

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2. Shamouilian, Shamouil; Kaushal, Tony S., Abatement of hazardous gases in effluent.

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3. Sherer, John Michael, Abatement system targeting a by-pass effluent stream of a semiconductor process tool.

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4. Sherer,John Michael, Abatement system targeting a by-pass effluent stream of a semiconductor process tool.

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5. Ferron, Shawn; Kelly, John; Vermeulen, Robbert, Apparatus and method for controlled combustion of gaseous pollutants.

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6. Vinu, Ajayan; Ariga, Katsuhiko; Miyahara, Masahiko; Mori, Toshiyuki, Carbon porous body and adsorbent using the same.

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7. Audette, David M.; Diesing, Philip J.; Gardell, David L., Containment of a wafer-chuck thermal interface fluid.

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8. Yamamoto, Osamu; Kinouchi, Masayuki; Takada, Naoki; Kase, Yoji; Kikuchi, Masao, Device and method for separating and collecting halide gas.

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9. Chevalier Gilbert,FRX ; DuPont Pascal,FRX, Device for supplying a purified gas to a plant purged using this purified gas.

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10. Nozawa Shigeyoshi,JPX ; Tomita Shinji,JPX, Gas recovery unit utilizing dual use of gas.

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11. Abe, Tetsuya; Tanzawa, Sadamitsu; Hiroki, Seiji; Tajima, Yoshinori; Futatsuki, Takashi, Gas separation apparatus.

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12. Abe, Tetsuya; Tanzawa, Sadamitsu; Hiroki, Seiji; Tajima, Yoshinori; Futatsuki, Takashi, Gas separation apparatus.

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13. Steven A. Dunwoody ; Eric C. Hilton ; Richard D. Pace, Germanium-containing particulate capture from an exhaust gas stream of a glass production system.

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14. Rebecca Faller ; Mark Holst, In-situ air oxidation treatment of MOCVD process effluent.

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15. Ju Jin-ho,KRX ; Kim Sang-kyung,KRX ; Kang Sung-chul,KRX, Ion chromatography system for conducting an environmental analysis in semiconductor equipment.

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16. Pittroff, Michael; Schwarze, Thomas; Belt, Heinz-Joachim, Isolation of SF6 from insulating gases in gas-insulated lines.

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17. Chae, Seung-Ki; Lee, Sang-Gon; Chung, Sang-Hyuk; Heo, Seong-Jin, Method and apparatus for reducing PFC emission during semiconductor manufacture.

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18. Fumio Kawasaki JP; Rosuke Matsubayashi JP, Method and apparatus for separating and recovering perfluoro compound.

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19. Clark, Daniel O.; Raoux, Sebastien; Vermeulen, Robert M.; Crawford, Shaun W., Methods and apparatus for sensing characteristics of the contents of a process abatement reactor.

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20. Dunwoody Steven A. ; Jiang Lei ; Powers Dale R. ; Prince Freddie G., Methods for the separation of compounds from acidic aqueous solutions.

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21. Arman, Bayram; Prosser, Neil Mark; Rashad, M. Abdul-Aziz; Howard, Henry Edward, Multicomponent refrigerant fluids for low and cryogenic temperatures.

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22. Rostaing Jean-Christophe,FRX ; Coeuret Fran.cedilla.ois,FRX ; de Saint Etienne Claude,FRX ; Moisan Michel,CAX, Process and apparatus for the treatment of perfluorinated and hydrofluorocarbon gases for the purpose of destroying them.

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23. Li Yao-En ; Paganessi Joseph E. ; Vassallo David ; Fleming Gregory K., Process and system for separation and recovery of perfluorocompound gases.

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24. Li Yao-En ; Paganessi Jospeh E. ; Vassallo David ; Fleming Gregory K., Process and system for separation and recovery of perfluorocompound gases.

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25. Li Yao-En ; Paganessi Jospeh E. ; Vassallo David ; Fleming Gregory K., Process and system for separation and recovery of perfluorocompound gases.

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26. Li Yao-En ; Paganessi Jospeh E. ; Vassallo David ; Fleming Gregory K., Process and system for separation and recovery of perfluorocompound gases.

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27. Li, Yao-En; Paganessi, Joseph E.; Vassallo, David; Fleming, Gregory K., Process and system for separation and recovery of perfluorocompound gases.

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28. Yao-En Li ; Jospeh E. Paganessi ; David Vassallo ; Gregory K. Fleming, Process and system for separation and recovery of perfluorocompound gases.

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29. Brazier, Arnaud, Production method using permeation of at least two gaseous fluxes from a gaseous mixture, and a production installation for implementing this method.

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30. Chiu, Ho-Man Rodney; Clark, Daniel O.; Crawford, Shaun W.; Jung, Jay J.; Todd, Leonard B.; Vermeulen, Robbert, Reactor design to reduce particle deposition during process abatement.

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31. Shamouilian, Shamouil; Lai, Canfeng; Cox, Michael Santiago; Krishnaraj, Padmanabhan; Tanaka, Tsutomu; Raoux, Sebastien; Porshnev, Peter I.; Nowak, Thomas, Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas.

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32. Roh, Young-Seok, Separation and recycling system of perfluorinated compounds.

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33. Michael Pittroff DE; Thomas Schwarze DE; Heinz-Joachim Belt DE; Pierre Barthelemy BE, Separation of gases containing SF6.

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34. Katano,Takayuki; Matsui,Hidefumi; Kitano,Junichi; Suzuki,Yo; Yamashita,Masami; Aoyama,Toru; Iwaki,Hiroyuki; Shimura,Satoru, Substrate processing apparatus and substrate processing method.

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35. Kitano, Junichi; Matsuyama, Yuji, Substrate processing apparatus and substrate processing method.

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36. Kitano,Junichi; Matsuyama,Yuji; Kitano,Takahiro; Katano,Takayuki; Matsui,Hidefumi; Suzuki,Yo; Yamashita,Masami; Aoyama,Toru; Iwaki,Hiroyuki; Shimura,Satoru; Deguchi,Masatoshi; Yoshihara,Kousuke; Iida, Substrate processing apparatus and substrate processing method.

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37. Uchii,Toshiyuki; Suzuki,Katsumi; Shiiki,Motoharu, System and method for gas recycling incorporating gas-insulated electric device.

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38. Cousineau, Shawn M.; Kelso, Robert D.; Olsen, Douglas S.; Stura, David, Temperature-controlled chuck with recovery of circulating temperature control fluid.

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39. Arun Acharya ; Bayram Arman ; Walter Joseph Olszewski ; Dante Patrick Bonaquist ; Joseph Alfred Weber, Variable load refrigeration system particularly for cryogenic temperatures.

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