초록 ▼

An anti-blocking agent comprising silicon dioxide or mixtures of silicon dioxide and zeolite is described, which is characterized in that it has a bimodal pore size distribution, the first maximum of the bimodal pore size distribution being in the pore size range6 nm. The anti-blocking agent is obta

An anti-blocking agent comprising silicon dioxide or mixtures of silicon dioxide and zeolite is described, which is characterized in that it has a bimodal pore size distribution, the first maximum of the bimodal pore size distribution being in the pore size range6 nm. The anti-blocking agent is obtainable by micronizing a mixture comprising silicon dioxide of a certain pore size and silicon dioxide and/or zeolite having a different pore size. It can be produced together with lubricating agent as a combined anti-blocking and lubricating agent. Incorporation of the anti-blocking agent or of the combined anti-blocking agent and lubricating agent into a polymer in the form of a master batch is preferable. In addition to a better dispersion and distribution of the anti-blocking agent particles in films and the improved optical properties associated therewith, the particular advantage of the anti-blocking agent according to the invention is that the adsorption of lubricating agent is avoided or greatly reduced, so that less lubricating agent can be used than in the prior art.

대표청구항 ▼

[ What is claimed is:] [1.] A method of reducing blocking tendency in a polymer film composition, said method comprising adding to said composition an antiblocking agent wherein said antiblocking agent contains silicon dioxide or mixtures of silicon dioxide and zeolite, and said antiblocking agent h

[ What is claimed is:] [1.] A method of reducing blocking tendency in a polymer film composition, said method comprising adding to said composition an antiblocking agent wherein said antiblocking agent contains silicon dioxide or mixtures of silicon dioxide and zeolite, and said antiblocking agent has a bimodal pore size distribution in which a first maximum lies in the pore size range6 nm.