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Method of processing semiconductor device with laser 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/306
출원번호 US-4623614 (1995-06-05)
우선권정보 JP-0309826 (1994-11-18)
발명자 / 주소
  • Kousai Takamasa,JPX
  • Zhang Hongyong,JPX
  • Miyanaga Akiharu,JPX
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd., JPX
대리인 / 주소
    Sixbey, Friedman, Leedom & FergusonFerguson, Jr.
인용정보 피인용 횟수 : 140  인용 특허 : 5

초록 ▼

A method of fabricating a semiconductor device by the use of laser crystallization steps is provided. During these crystallization steps, an amorphous or polycrystalline semiconductor is crystallized by laser irradiation in such a way that generation of ridges is suppressed. Two separate laser cryst

대표청구항

[ We claim:] [1.] A method of processing a semiconductor device with a laser comprising:

이 특허에 인용된 특허 (5)

  1. Zhang Hongyong (Kanagawa JPX) Kusumoto Naoto (Kanagawa JPX), Method of annealing a semiconductor.
    상세보기
  2. Imahashi Issei (Yamanashi JPX) Hama Kiichi (Chino JPX) Hata Jiro (Yamanashi JPX), Method of forming polycrystalling silicon film in process of manufacturing LCD.
    상세보기
  3. Benton Janet L. (Warren NJ) Doherty Charles J. (Westfield NJ) Kimerling Lionel C. (Westfield NJ) Leamy Harry J. (Summit NJ), Passivation of defects in laser annealed semiconductors.
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  4. Sano Masafumi (Nagahama JPX), Process for forming deposited film.
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  5. Zhang Hongyong (Kanagawa JPX) Yamazaki Shunpei (Tokyo JPX) Takemura Yasuhiko (Kanagawa JPX), Process for laser processing and apparatus for use in the same.
    상세보기

이 특허를 인용한 특허 (140)

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    상세보기
  3. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
    상세보기
  4. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
    상세보기
  5. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  6. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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  7. Yamazaki, Shunpei; Ohtani, Hisashi; Takano, Tamae, Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same.
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