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[미국특허] Sputtering system using cylindrical rotating magnetron electrically powered using alternating current 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/34
출원번호 US-0736978 (1996-10-25)
발명자 / 주소
  • Lehan John
  • Byorum Henry
  • Hill Russell J.
  • Rough J. Kirkwood
출원인 / 주소
  • The Boc Group, Inc.
대리인 / 주소
    Draegert
인용정보 피인용 횟수 : 195  인용 특허 : 0

초록

A sputtering system using an AC power supply in the range of 10 kHz to 100 kHz uses two rotatable cylindrical magnetrons. The rotatable cylindrical magnetrons, when used for depositing a dielectric layer onto a substrate, clean off dielectric material that is deposited onto the target. This prevents

대표청구항

[ What is claimed is:] [1.] A sputtering system for forming a dielectric layer on a substrate comprising:an alternating current power supply having a first and a second pole that alternate in polarity;a chamber;a rotatable magnetron in said chamber, said rotatable magnetron including a cylindrical t

이 특허를 인용한 특허 (195) 인용/피인용 타임라인 분석

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