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In-situ laser patterning of thin film layers during sequential depositing 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/00
출원번호 US-0681125 (1996-07-22)
발명자 / 주소
  • Bradley
  • Jr. Richard Alan
  • Yamasaki Nancy Lee Schultz
  • Lantman Christopher Wayne
  • Hichwa Bryant
출원인 / 주소
  • Optical Coating Laboratory, Inc.
대리인 / 주소
    Workman, Nydegger & Seeley
인용정보 피인용 횟수 : 106  인용 특허 : 14

초록

The present invention involves in situ laser patterning of thin-film layers during sequential deposition of the different layers. The layers may be applied using any known method of film deposition. The method of the present invention involves laser ablation to remove unwanted portions of the coatin

대표청구항

[ What is claimed and desired to be secured by United States Letters Patent is:] [1.] A method for patterning a plurality of different and sequentially applied coating materials to form a coated substrate, the method comprising steps of:(a) providing a first substrate having a first substrate surfac

이 특허에 인용된 특허 (14)

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