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Method for controlling apparatus for supplying steam for ashing process 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • A61M-033/06
  • F22B-029/06
  • B05C-011/00
출원번호 US-0426185 (1995-04-21)
우선권정보 JP-0267986 (1990-10-05)
발명자 / 주소
  • Shinagawa Keisuke,JPX
  • Fujimura Shuzo,JPX
  • Matoba Yuuji,JPX
  • Nakano Yoshimasa,JPX
  • Takeuchi Tatsuya,JPX
  • Miyanaga Takeshi,JPX
출원인 / 주소
  • Shinko Seiki Co., Ltd, JPX
대리인 / 주소
    Staas & Halsey
인용정보 피인용 횟수 : 29  인용 특허 : 13

초록

A method for controlling an apparatus for supplying steam to an ashing process. The apparatus includes a closed water-containing vessel formed from a material having good heat conductive characteristics for evaporating water to provide steam to a vacuum chamber housing an ongoing ashing process. In

대표청구항

[ We claim:] [1.] A method for operating an apparatus for supplying steam to a vacuum chamber, said apparatus comprising a steam generation vessel and a mass-flow controller, said method comprising:supplying heat to said vessel to evaporate water therein and thereby generate steam for introduction i

이 특허에 인용된 특허 (13)

  1. Hillman Joseph T. (Scottsdale AZ) Ramsey W. Chuck (Chandler AZ), Apparatus and method for improved delivery of vaporized reactant gases to a reaction chamber.
  2. Blair Richard F. (Fountain Valley CA) Beazley Ralph (Rancho Palos Verdes CA), Calibratable system for measuring fluid flow.
  3. Roop ; Robert ; Shine ; Carl, Corrosion-resistant liquified gas evaporator.
  4. Vassiliou Eustathios (Newark DE), Fluoropolymer primer having improved scratch resistance.
  5. Ito Atsushi (Yamagata JPX), Gas supply apparatus.
  6. Watanabe Yoshiyuki (Fukaya JPX) Watanabe Junichi (Kumagaya JPX) Jomura Shigeru (Tokyo JPX) Someji Takahiro (Fukaya JPX), High-temperature stacked-type displacement device.
  7. Swan Alan J. (Portland OR), Humidification system.
  8. McCoy James M. (Everett WA) Allen Beverly J. (Seattle WA), Humidifier assembly.
  9. Berleue ; Albert J. ; Dumbaugh ; Jr. ; William H., Liquid level gauge.
  10. Pierce John M. (Palo Alto CA) Lehrer William I. (Los Altos CA), Method and apparatus for low pressure chemical vapor deposition.
  11. Ohnishi Hiroshi (Amagasaki JPX) Hoshinouchi Susumu (Amagasaki JPX), Mixture thin film forming apparatus.
  12. Barbee Steven G. (Dover Plains NY) Devine Gregory P. (Poughguag NY) Patrick William J. (Newburgh NY) Seeley Gerard (Wappingers Falls NY), Vacuum deposition system with improved mass flow control.
  13. Partus Fred P. (Cobbs County GA), Vapor delivery control system and method.

이 특허를 인용한 특허 (29)

  1. Bergman, Eric J.; Hess, Mignon P., Apparatus and method for processing the surface of a workpiece with ozone.
  2. Bergman, Eric J., Apparatus for treating a workpiece with steam and ozone.
  3. Horsky, Thomas N.; Milgate, III, Robert W., Controlling the flow of vapors sublimated from solids.
  4. Sandhu, Gurtej S., Delivery of solid chemical precursors.
  5. Sandhu, Gurtej S., Delivery of solid chemical precursors.
  6. Sandhu,Gurtej S., Delivery of solid chemical precursors.
  7. Sandhu,Gurtej S., Delivery of solid chemical precursors.
  8. Nagashima Naoki,JPX ; Takahashi Natsuki,JPX ; Negishi Toshio,JPX, Evaporation apparatus.
  9. Nagashima Naoki,JPX ; Takahashi Natsuki,JPX ; Negishi Toshio,JPX ; Kashiwabara Izumi,JPX, Evaporation apparatus, organic material evaporation source, and method of manufacturing thin organic film.
  10. Nagashima, Naoki; Takahashi, Natsuki; Negishi, Toshio, Evaporation apparatus, organic material evaporation source, and method of manufacturing thin organic film.
  11. Horie Kuniaki,JPX ; Suzuki Hidenao,JPX ; Nakada Tsutomu,JPX ; Kuriyama Fumio,JPX ; Murakami Takeshi,JPX ; Abe Masahito,JPX ; Araki Yuji,JPX ; Ueyama Hiroyuki,JPX, Liquid feed vaporization system and gas injection device.
  12. Horie Kuniaki,JPX ; Suzuki Hidenao,JPX ; Nakada Tsutomu,JPX ; Kuriyama Fumio,JPX ; Murakami Takeshi,JPX ; Abe Masahito,JPX ; Araki Yuji,JPX ; Ueyama Hiroyuki,JPX, Liquid feed vaporization system and gas injection device.
  13. Horie Kuniaki,JPX ; Suzuki Hidenao,JPX ; Nakada Tsutomu,JPX ; Murakami Takeshi,JPX ; Abe Masahito,JPX ; Araki Yuji,JPX ; Ueyama Hiroyuki,JPX, Liquid feed vaporization system and gas injection device.
  14. Horsky, Thomas N.; Milgate, III, Robert W.; Sacco, Jr., George P.; Jacobson, Dale C.; Krull, Wade A., Method and apparatus for extending equipment uptime in ion implantation.
  15. Horsky, Thomas N.; Milgate, III, Robert W.; Sacco, Jr., George P.; Jacobson, Dale C.; Krull, Wade A., Method and apparatus for extending equipment uptime in ion implantation.
  16. Cook, Kevin S.; Manning, Dennis; McIntyre, Edward K.; Goldberg, Richard, Method for extending equipment uptime in ion implantation.
  17. Bergman, Eric J.; Hess, Mignon P., Method for processing the surface of a workpiece.
  18. Naoki Nagashima JP; Natsuki Takahashi JP; Toshio Negishi JP, Method of manufacturing thin organic film.
  19. Bergman, Eric J., Methods for cleaning semiconductor surfaces.
  20. Bergman, Eric J., Methods for cleaning semiconductor surfaces.
  21. Bergman, Eric J., Methods for processing a workpiece using steam and ozone.
  22. Bergman,Eric J., Methods of thinning a silicon wafer using HF and ozone.
  23. Bergman, Eric J., Process and apparatus for treating a workpiece such as a semiconductor wafer.
  24. Gebhart,Thomas Maximilia; Bergman,Eric J., Process and apparatus for treating a workpiece using ozone.
  25. Bergman,Eric J., Process and apparatus for treating a workpiece with gases.
  26. Bergman,Eric J., Processing a workpiece using water, a base, and ozone.
  27. Groom, Richard C., System and method for heating solid or vapor source vessels and flow paths.
  28. Buchanan, Daryl; Tariq, Faisal; Mei, Hai; Tison, Stuart, System and method for producing and delivering vapor.
  29. Bergman,Eric J.; Gebhart,Thomas Maximilian, System and methods for polishing a wafer.
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