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[미국특허] Use of focused ion and electron beams for fabricating a sensor on a probe tip used for scanning multiprobe microscopy an 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-037/26
출원번호 US-0732068 (1996-10-16)
발명자 / 주소
  • Majumdar Arunava
  • Lai Jie
  • Luo Ke
출원인 / 주소
  • The Regents of the University of California
대리인 / 주소
    Dawes
인용정보 피인용 횟수 : 32  인용 특허 : 13

초록

Nanometer holes can be reliably and repeatedly defined in the tips of cantilevered probes and used in various types of scanning multiprobe microscopy by defining the hole within a layer disposed on the tip using focused electron or ion beams. The drilling of the hole on the apex of the tip and is st

대표청구항

[ We claim:] [1.] An improvement in a method for forming a sensor comprising:providing a probe with a pointed tip having an apex;disposing a first layer on said probe and on said tip of said probe;disposing a second layer on said first layer;focusing a charged beam on said tip of said probe to defin

이 특허에 인용된 특허 (13) 인용/피인용 타임라인 분석

  1. Thomas Michael E. (Milpitas CA), Apparatus and method for high-accuracy alignment.
  2. Schmidt-Kufeke Klaus-Peter (Bernhardstr. 5 7500 Karlsruhe 1 DEX) Feld Gerhard (Am Erlanger 3 8501 Eckenthal DEX), Arrangement for effecting the superfine perforation of film-like sheeting with the aid of high-voltage pulses.
  3. Watkins James R. (Bristol GB2) El-Menshawy Mohamed F. (Birmingham GB2), Combined EDM and ultrasonic drilling.
  4. Abiko Satoshi (Tamayama JPX) Onodera Toru (Tamayama JPX), Electroerosion boring apparatus.
  5. Ohba Kazuo (2-3 ; Matsubacho 4-chome Higashimatsuyama-shi ; Saitama JPX) Shima Kaori (768-15 ; Ohzenji ; Asou-ku Kawasaki-shi ; Kanagawa JPX) Ohba Akira (12-89 ; Miyado 3-chome Asaka-shi ; Saitama JP, Method for boring small holes in substrate material.
  6. Majumdar Arunava (Santa Barbara CA) Lai Jie (Goleta CA) Luo Ke (Goleta CA), Method for fabricating a sensor on a probe tip used for atomic force microscopy and the like.
  7. Baud ; Christian ; Raverdy ; Yvan ; Hougeot ; Henri, Method for producing microscopic passages in a semiconductor body for electron-multiplication applications.
  8. Inoue Kiyoshi (Tokyo JPX), Method of and apparatus for electrical discharge machining a small and deep hole into or through a workpiece.
  9. Inoue Kiyoshi (Tokyo JPX), Method of discharge coating and an apparatus therefor.
  10. Ohta Yoshinori (Tokyo JPX) Kajimura Hiroshi (Tokyo JPX) Toda Akitoshi (Tokyo JPX) Takase Tsugiko (Tokyo JPX), Probe unit for near-field optical scanning microscope.
  11. Saito Nagao (Nagoya JA) Kobayashi Kazuhiko (Seto JA) Oizumi Toshiro (Nagoya JA), Process and apparatus for electrical discharge shaping using sequential switching.
  12. Matsui Masao (Nagoya JA) Murata Atsunobu (Aichi JA) Isii Masami (Toyota JA) Komai Hiromu (Toyota JA), Process for making a minute hole.
  13. Swengel ; Sr. Robert Charles (Hellam PA) Crumley J. A. (Mechanicsburg PA), Welding method and means using foil electrode.

이 특허를 인용한 특허 (32) 인용/피인용 타임라인 분석

  1. Adderton, Dennis M.; Minne, Stephen C., Active probe for an atomic force microscope and method of use thereof.
  2. Aoki, Yukihiro; Shikata, Shinichi; Uetsuka, Hiroshi; Nakamura, Chikashi; Shimamoto, Nobuo, Cantilever for measuring intra-cellular and inter-cellular microspaces.
  3. Maruyama, Kenichi; Suzuki, Koji; Iyoki, Masato, Cantilever for scanning probe microscope and scanning probe microscope equipped with it.
  4. Benas Sayag,Gerard; Bouchet,Patrick; Corbin,Antoine; Sudraud,Pierre, Column simultaneously focusing a particle beam and an optical beam.
  5. Golovchenko, Jene A.; Schürmann, Gregor M.; King, Gavin M.; Branton, Daniel, Controlled fabrication of gaps in electrically conducting structures.
  6. Chow, Lee; Zhou, Dan; Stevie, Fred, Fabrication of nano-scale temperature sensors and heaters.
  7. Chow,Lee; Zhou,Dan; Stevie,Fred, Fabrication of nano-scale temperature sensors and heaters.
  8. Takahashi, Hiroshi; Shirakawabe, Yoshiharu; Arai, Tadashi, Heated self-detecting type cantilever for atomic force microscope.
  9. Chiou, Jin-Chern; Chang, Chih-Wei, Integration structure of semiconductor circuit and microprobe sensing elements and method for fabricating the same.
  10. Jorgen Rasmussen, Method apparatus for a coaxial optical microscope with focused ion beam.
  11. Park, Byong-Cheon; Jung, Ki-Young; Song, Won-Young; Hong, Jae-Wan; O, Beom-Hoan; Ahn, Sang-Jung, Method for fabricating SPM and CD-SPM nanoneedle probe using ion beam and SPM and CD-SPM nanoneedle probe thereby.
  12. Lugstein,Alois; Bertagnolli,Emmerich; Kranz,Christine; Mizaikoff,Boris, Method for producing a device for simultaneously carrying out an electrochemical and a topographical near-field microscopy.
  13. Bindell Jeffrey B. ; Stevie Frederick A., Method of detecting semiconductor defects.
  14. Minne, Stephen C., Method of fabricating a surface probing device.
  15. Minne, Stephen C., Method of fabricating a surface probing device and probing device produced thereby.
  16. Park, Chul-min; Ko, Hyoung-soo; Hong, Seung-bum, Method of fabricating electric field sensor having electric field shield.
  17. Hirata,Masakazu; Oumi,Manabu, Method of producing near field optical head.
  18. van der Weide, Daniel Warren; Wang, Yaqiang, Microscope probe having an ultra-tall tip.
  19. Lai, Keji; Kelly, Michael; Shen, Zhi-Xun, Modulated microwave microscopy and probes used therewith.
  20. Niwa, Takashi; Kato, Kenji; Kasama, Nobuyuki; Oumi, Manabu; Mitsuoka, Yasuyuki; Ichihara, Susumu, Near-field optical probe having cantilever and probe formed of transparent material, method for manufacturing near-field optical probe, and optical apparatus having near-field optical probe.
  21. Tanioka, Michinobu; Kimura, Takahiro, Probe for inspecting semiconductor device and method of manufacturing the same.
  22. Lutter, Stefan, Process for producing an SPM sensor.
  23. Golovchenko,Jene A.; Stein,Derek M.; Li,Jiali, Pulsed ion beam control of solid state features.
  24. Cordes, Steven Alan; DiMilia, David R.; Doyle, James Patrick; Farinelli, Matthew James; Ghoshal, Snigdha; Ghoshal, Uttam Shyamalindu; McDowell, Chandler Todd; Shi, Li, Scanning heat flow probe.
  25. Cordes, Steven Alan; DiMilia, David R.; Doyle, James Patrick; Farinelli, Matthew James; Ghoshal, Snigdha; Ghoshal, Uttam Shyamalindu; McDowell, Chandler Todd; Shi, Li, Scanning heat flow probe.
  26. Cordes, Steven Alan; DiMilia, David R.; Doyle, James Patrick; Farinelli, Matthew James; Ghoshal, Snigdha; Ghoshal, Uttam Shyamalindu; McDowell, Chandler Todd; Shi, Li, Scanning heat flow probe.
  27. Cordes, Steven Alan; DiMilia, David R.; Doyle, James Patrick; Farinelli, Matthew James; Ghoshal, Snigdha; Ghoshal, Uttam Shyamalindu; McDowell, Chandler Todd; Shi, Li, Scanning heat flow probe and the method of fabricating the same.
  28. Park,Hong Sik; Shin,Hyun Jung; Jung,Ju Hwan, Semiconductor probe with resistive tip and method of fabricating the same, and information recording apparatus, information reproducing apparatus, and information measuring apparatus having the semic.
  29. Park,Hong Sik; Shin,Hyun Jung; Jung,Ju Hwan, Semiconductor probe with resistive tip and method of fabricating the same, and information recording apparatus, information reproducing apparatus, and information measuring apparatus having the semiconductor probe.
  30. Takahashi Hiroshi,JPX ; Shimizu Nobuhiro,JPX ; Shirakawabe Yoshiharu,JPX ; Ichihara Susumu,JPX ; Despont Michel,CHX, Semiconductor strain sensor and scanning probe microscope using the semiconductor strain sensor.
  31. Li,Jiali; Stein,Derek M.; Schurmann,Gregor M.; King,Gavin M.; Golovchenko,Jene; Branton,Daniel; Aziz,Michael, Solid state molecular probe device.
  32. Lindsay Stuart M. ; Jing Tianwei, Vibrating tip conducting probe microscope.

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